Amir Al-Bayati

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for substrate clamping in a plasma chamber
- Patent number 9,337,072
- Issue date May 10, 2016
- Applied Materials, Inc.
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process and apparatus for measuring the crystal fraction of crystal...
- Patent number 8,902,428
- Issue date Dec 2, 2014
- Applied Materials, Inc.
- Asaf Schlezinger
- G01 - MEASURING TESTING
Information Patent Grant
Plasma immersion ion implantation reactor with extended cathode pro...
- Patent number 8,900,405
- Issue date Dec 2, 2014
- Applied Materials, Inc.
- Peter I. Porshnev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High quality TCO-silicon interface contact structure for high effic...
- Patent number 8,895,842
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Shuran Sheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal flux annealing influence of buried species
- Patent number 8,796,769
- Issue date Aug 5, 2014
- Applied Matierials, Inc.
- Dean C. Jennings
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of forming flash memory with ultraviolet treatment
- Patent number 8,501,568
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to minimize wet etch undercuts and provide pore sealing of e...
- Patent number 8,445,075
- Issue date May 21, 2013
- Applied Materials, Inc.
- Huiwen Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal flux annealing influence of buried species
- Patent number 8,288,239
- Issue date Oct 16, 2012
- Applied Materials, Inc.
- Dean C. Jennings
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of forming a non-volatile memory having a silicon nitride ch...
- Patent number 8,252,653
- Issue date Aug 28, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for plasma enhanced chemical vapor deposition and bevel edg...
- Patent number 8,197,636
- Issue date Jun 12, 2012
- Applied Materials, Inc.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation reactor having multiple ion showe...
- Patent number 8,058,156
- Issue date Nov 15, 2011
- Applied Materials, Inc.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus of creating airgap in dielectric layers for t...
- Patent number 7,879,683
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Amir Al-Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming non-volatile memory having charge trap layer with...
- Patent number 7,816,205
- Issue date Oct 19, 2010
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum reaction chamber with x-lamp heater
- Patent number 7,777,197
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Amir Al-Bayati
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma immersion ion implantation reactor having an ion shower grid
- Patent number 7,767,561
- Issue date Aug 3, 2010
- Applied Materials, Inc.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma immersion ion implantation process using a plasma source hav...
- Patent number 7,700,465
- Issue date Apr 20, 2010
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition plasma reactor having plural ion shower g...
- Patent number 7,695,590
- Issue date Apr 13, 2010
- Applied Materials, Inc.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF measurement feedback control and diagnostics for a plasma immers...
- Patent number 7,666,464
- Issue date Feb 23, 2010
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor on insulator vertical transistor fabrication and dopi...
- Patent number 7,642,180
- Issue date Jan 5, 2010
- Applied Materials, Inc.
- Amir Al-Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration process for fabricating stressed transistor structure
- Patent number 7,566,655
- Issue date Jul 28, 2009
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of ion implantation to reduce transient enhanced diffusion
- Patent number 7,482,255
- Issue date Jan 27, 2009
- Houda Graoui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gasless high voltage high contact force wafer contact-cooling elect...
- Patent number 7,479,456
- Issue date Jan 20, 2009
- Applied Materials, Inc.
- Douglas A. Buchberger, Jr.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma immersion ion implantation process
- Patent number 7,465,478
- Issue date Dec 16, 2008
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate process using an optically writable carbon-...
- Patent number 7,429,532
- Issue date Sep 30, 2008
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
O-ringless tandem throttle valve for a plasma reactor chamber
- Patent number 7,428,915
- Issue date Sep 30, 2008
- Applied Materials, Inc.
- Andrew Nguyen
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Process for low temperature plasma deposition of an optical absorpt...
- Patent number 7,422,775
- Issue date Sep 9, 2008
- Applied Materials, Inc.
- Kartik Ramaswamy
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Low temperature CVD process with selected stress of the CVD layer o...
- Patent number 7,393,765
- Issue date Jul 1, 2008
- Applied Materials, Inc.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Copper conductor annealing process employing high speed optical ann...
- Patent number 7,335,611
- Issue date Feb 26, 2008
- Applied Materials, Inc.
- Kartik Ramaswamy
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor substrate process using a low temperature deposited c...
- Patent number 7,323,401
- Issue date Jan 29, 2008
- Applied Materials, Inc.
- Kartik Ramaswamy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma immersion ion implantation system including a plasma source...
- Patent number 7,320,734
- Issue date Jan 22, 2008
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Process and Apparatus for Measuring the Crystal Fraction of Crystal...
- Publication number 20130242287
- Publication date Sep 19, 2013
- Applied Materials, Inc.
- Asaf Schlezinger
- G01 - MEASURING TESTING
Information Patent Application
THERMAL FLUX ANNEALING INFLUENCE OF BURIED SPECIES
- Publication number 20130008878
- Publication date Jan 10, 2013
- Applied Materials, Inc.
- Dean C. Jennings
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...
- Publication number 20120211164
- Publication date Aug 23, 2012
- Applied Materials, Inc.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IMMERSION CHAMBER
- Publication number 20120199071
- Publication date Aug 9, 2012
- Applied Materials, Inc.
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR REDUCING LIGHT INDUCED DAMAGE IN THIN FIL...
- Publication number 20110263074
- Publication date Oct 27, 2011
- Applied Materials, Inc.
- Amir Al-Bayati
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS OF CREATING AIRGAP IN DIELECTRIC LAYERS FOR T...
- Publication number 20110104891
- Publication date May 5, 2011
- AMIR AL-BAYATI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SUBSTRATE CLAMPING IN A PLASMA CHAMBER
- Publication number 20110090613
- Publication date Apr 21, 2011
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF E...
- Publication number 20110092077
- Publication date Apr 21, 2011
- Huiwen Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NON-VOLATILE MEMORY HAVING SILICON NITRIDE CHARGE TRAP LAYER
- Publication number 20100096687
- Publication date Apr 22, 2010
- APPLIED MATERIALS, INC.
- Mihaela BALSEANU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-VOLATILE MEMORY HAVING CHARGE TRAP LAYER WITH COMPOSITIONAL GRA...
- Publication number 20100096688
- Publication date Apr 22, 2010
- APPLIED MATERIALS, INC.
- Mihaela BALSEANU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLASH MEMORY WITH TREATED CHARGE TRAP LAYER
- Publication number 20100099247
- Publication date Apr 22, 2010
- Applied Materials Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH QUALITY TCO-SILICON INTERFACE CONTACT STRUCTURE FOR HIGH EFFIC...
- Publication number 20100051098
- Publication date Mar 4, 2010
- Applied Materials, Inc.
- Shuran Sheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma immersion ion implantation reactor with extended cathode pro...
- Publication number 20090120367
- Publication date May 14, 2009
- Applied Materials, Inc.
- Peter I. Porshnev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS OF CREATING AIRGAP IN DIELECTRIC LAYERS FOR T...
- Publication number 20090093112
- Publication date Apr 9, 2009
- APPLIED MATERIALS, INC.
- AMIR AL-BAYATI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR HIGH TEMPERATURE DEPOSITION OF AN AMORPHOUS CARBON LAYER
- Publication number 20090093128
- Publication date Apr 9, 2009
- MARTIN JAY SEAMONS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE EDGE REGION
- Publication number 20090017635
- Publication date Jan 15, 2009
- APPLIED MATERIALS, INC.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...
- Publication number 20090014127
- Publication date Jan 15, 2009
- APPLIED MATERIALS, INC.
- Ashish Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA-INDUCED CHARGE DAMAGE CONTROL FOR PLASMA ENHANCED CHEMICAL V...
- Publication number 20080254233
- Publication date Oct 16, 2008
- KWANGDUK DOUGLAS LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Immersion Chamber
- Publication number 20080173237
- Publication date Jul 24, 2008
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SUBSTRATE CLAMPING IN A PLASMA CHAMBER
- Publication number 20080084650
- Publication date Apr 10, 2008
- APPLIED MATERIALS, INC.
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor on insulator vertical transistor fabrication and dopi...
- Publication number 20080044960
- Publication date Feb 21, 2008
- APPLIED MATERIALS, INC.
- Amir Al-Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma processing
- Publication number 20080008842
- Publication date Jan 10, 2008
- APPLIED MATERIALS, INC.
- Jyr Hong Soo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF E...
- Publication number 20070287301
- Publication date Dec 13, 2007
- Huiwen Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD, SYSTEM AND MEDIUM FOR CONTROLLING SEMICONDUCTOR WAFER PROCE...
- Publication number 20070288116
- Publication date Dec 13, 2007
- Amir Al-Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low temperature CVD process with selected stress of the CVD layer o...
- Publication number 20070212811
- Publication date Sep 13, 2007
- APPLIED MATERIALS, INC.
- Hiroji Hanawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low-k spacer integration into CMOS transistors
- Publication number 20070202640
- Publication date Aug 30, 2007
- Applied Materials, Inc.
- Amir Al-Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma immersion ion implantation apparatus including a capacitivel...
- Publication number 20070119546
- Publication date May 31, 2007
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTED INSULATOR MATERIAL WITH REDUCED DIELECTRIC CONSTANT
- Publication number 20070042580
- Publication date Feb 22, 2007
- Amir Al-Bayati
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Copper barrier reflow process employing high speed optical annealing
- Publication number 20070032004
- Publication date Feb 8, 2007
- APPLIED MATERIALS, INC.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor substrate process using a low temperature deposited c...
- Publication number 20070032054
- Publication date Feb 8, 2007
- APPLIED MATERIALS, INC.
- Kartik Ramaswamy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Amir Al-Bayati

Person

Patents Grantslast 30 patents

Apparatus and method for substrate clamping in a plasma chamber

Process and apparatus for measuring the crystal fraction of crystal...

Plasma immersion ion implantation reactor with extended cathode pro...

High quality TCO-silicon interface contact structure for high effic...

Thermal flux annealing influence of buried species

Method of forming flash memory with ultraviolet treatment

Method to minimize wet etch undercuts and provide pore sealing of e...

Thermal flux annealing influence of buried species

Method of forming a non-volatile memory having a silicon nitride ch...

Systems for plasma enhanced chemical vapor deposition and bevel edg...

Plasma immersion ion implantation reactor having multiple ion showe...

Methods and apparatus of creating airgap in dielectric layers for t...

Method of forming non-volatile memory having charge trap layer with...

Vacuum reaction chamber with x-lamp heater

Plasma immersion ion implantation reactor having an ion shower grid

Plasma immersion ion implantation process using a plasma source hav...

Chemical vapor deposition plasma reactor having plural ion shower g...

RF measurement feedback control and diagnostics for a plasma immers...

Semiconductor on insulator vertical transistor fabrication and dopi...

Integration process for fabricating stressed transistor structure

Method of ion implantation to reduce transient enhanced diffusion

Gasless high voltage high contact force wafer contact-cooling elect...

Plasma immersion ion implantation process

Semiconductor substrate process using an optically writable carbon-...

O-ringless tandem throttle valve for a plasma reactor chamber

Process for low temperature plasma deposition of an optical absorpt...

Low temperature CVD process with selected stress of the CVD layer o...

Copper conductor annealing process employing high speed optical ann...

Semiconductor substrate process using a low temperature deposited c...

Plasma immersion ion implantation system including a plasma source...

Patents Applicationslast 30 patents

Process and Apparatus for Measuring the Crystal Fraction of Crystal...

THERMAL FLUX ANNEALING INFLUENCE OF BURIED SPECIES

SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...

PLASMA IMMERSION CHAMBER

APPARATUS AND METHODS FOR REDUCING LIGHT INDUCED DAMAGE IN THIN FIL...

METHODS AND APPARATUS OF CREATING AIRGAP IN DIELECTRIC LAYERS FOR T...

APPARATUS AND METHOD FOR SUBSTRATE CLAMPING IN A PLASMA CHAMBER

METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF E...

NON-VOLATILE MEMORY HAVING SILICON NITRIDE CHARGE TRAP LAYER

NON-VOLATILE MEMORY HAVING CHARGE TRAP LAYER WITH COMPOSITIONAL GRA...

FLASH MEMORY WITH TREATED CHARGE TRAP LAYER

HIGH QUALITY TCO-SILICON INTERFACE CONTACT STRUCTURE FOR HIGH EFFIC...

Plasma immersion ion implantation reactor with extended cathode pro...

METHODS AND APPARATUS OF CREATING AIRGAP IN DIELECTRIC LAYERS FOR T...

METHODS FOR HIGH TEMPERATURE DEPOSITION OF AN AMORPHOUS CARBON LAYER

APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE EDGE REGION

SYSTEMS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AND BEVEL EDG...

PLASMA-INDUCED CHARGE DAMAGE CONTROL FOR PLASMA ENHANCED CHEMICAL V...

Plasma Immersion Chamber

APPARATUS AND METHOD FOR SUBSTRATE CLAMPING IN A PLASMA CHAMBER

Semiconductor on insulator vertical transistor fabrication and dopi...

Method for plasma processing

METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF E...

METHOD, SYSTEM AND MEDIUM FOR CONTROLLING SEMICONDUCTOR WAFER PROCE...

Low temperature CVD process with selected stress of the CVD layer o...

Low-k spacer integration into CMOS transistors

Plasma immersion ion implantation apparatus including a capacitivel...

ION IMPLANTED INSULATOR MATERIAL WITH REDUCED DIELECTRIC CONSTANT

Copper barrier reflow process employing high speed optical annealing

Semiconductor substrate process using a low temperature deposited c...