Anand N. Iyer

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Spray system for slurry reduction during chemical mechanical polish...
- Patent number 11,819,976
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Chih Chung Chou
- B24 - GRINDING POLISHING
Information Patent Grant
Platen surface modification and high-performance pad conditioning t...
- Patent number 11,794,305
- Issue date Oct 24, 2023
- Applied Materials, Inc.
- Christopher Heung-Gyun Lee
- B24 - GRINDING POLISHING
Information Patent Grant
Retaining ring for CMP
- Patent number 11,673,226
- Issue date Jun 13, 2023
- Applied Materials, Inc.
- Andrew J. Nagengast
- B24 - GRINDING POLISHING
Information Patent Grant
Retaining ring for CMP
- Patent number 10,322,492
- Issue date Jun 18, 2019
- Applied Materials, Inc.
- Andrew J. Nagengast
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing article with integrated window stripe
- Patent number 7,841,925
- Issue date Nov 30, 2010
- Applied Materials, Inc.
- Gregory E. Menk
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus with grooved subpad
- Patent number 7,601,050
- Issue date Oct 13, 2009
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing article with integrated window stripe
- Patent number 7,553,214
- Issue date Jun 30, 2009
- Applied Materials, Inc.
- Gregory E. Menk
- B24 - GRINDING POLISHING
Information Patent Grant
Materials for chemical mechanical polishing
- Patent number 7,429,210
- Issue date Sep 30, 2008
- Applied Materials, Inc.
- Benjamin A. Bonner
- B24 - GRINDING POLISHING
Information Patent Grant
Materials for chemical mechanical polishing
- Patent number 7,179,159
- Issue date Feb 20, 2007
- Applied Materials, Inc.
- Benjamin A. Bonner
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and compositions for chemical mechanical polishing shallow...
- Patent number 6,811,470
- Issue date Nov 2, 2004
- Applied Materials Inc.
- Benjamin A. Bonner
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SPRAY SYSTEM FOR SLURRY REDUCTION DURING CHEMICAL MECHANICAL POLISH...
- Publication number 20240042571
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- Chih Chung CHOU
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SLURRY DISPENSE NOZZLE
- Publication number 20230130235
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Chih Chung Chou
- B24 - GRINDING POLISHING
Information Patent Application
SPRAY SYSTEM FOR SLURRY REDUCTION DURING CHEMICAL MECHANICAL POLISH...
- Publication number 20220410336
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Chih Chung Chou
- B24 - GRINDING POLISHING
Information Patent Application
SLURRY-BASED TEMPERATURE CONTROL FOR CMP
- Publication number 20220281070
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Ekaterina A. Mikhaylichenko
- B24 - GRINDING POLISHING
Information Patent Application
TEMPERATURE CONTROL WITH INTRA-LAYER TRANSITION DURING CMP
- Publication number 20220281061
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Ekaterina A. Mikhaylichenko
- B24 - GRINDING POLISHING
Information Patent Application
PLATEN SURFACE MODIFICATION AND HIGH-PERFORMANCE PAD CONDITIONING T...
- Publication number 20220097206
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Christopher Heung-Gyun LEE
- B24 - GRINDING POLISHING
Information Patent Application
RETAINING RING FOR CMP
- Publication number 20190291238
- Publication date Sep 26, 2019
- Applied Materials, Inc.
- Andrew J. Nagengast
- B24 - GRINDING POLISHING
Information Patent Application
RETAINING RING FOR CMP
- Publication number 20180021918
- Publication date Jan 25, 2018
- Andrew J. Nagengast
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING POLISHING SHEET
- Publication number 20140237905
- Publication date Aug 28, 2014
- Applied Materials, Inc.
- Benjamin A. Bonner
- B24 - GRINDING POLISHING
Information Patent Application
MONOLITHIC LINEAR POLISHING SHEET
- Publication number 20100112919
- Publication date May 6, 2010
- APPLIED MATERIALS, INC.
- Benjamin A. Bonner
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING ARTICLE WITH INTEGRATED WINDOW STRIPE
- Publication number 20090253358
- Publication date Oct 8, 2009
- Applied Materials, Inc.
- Gregory E. Menk
- B24 - GRINDING POLISHING
Information Patent Application
SELECTIVE CHEMISTRY FOR FIXED ABRASIVE CMP
- Publication number 20080182413
- Publication date Jul 31, 2008
- GREGORY E. MENK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HIGH SELECTIVITY SLURRY COMPOSITIONS FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20070218693
- Publication date Sep 20, 2007
- Applied Materials, Inc.
- Benjamin A. Bonner
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Smart polishing media assembly for planarizing substrates
- Publication number 20070212976
- Publication date Sep 13, 2007
- APPLIED MATERIALS, INC.
- Peter McReynolds
- B24 - GRINDING POLISHING
Information Patent Application
Polishing article with window stripe
- Publication number 20070197145
- Publication date Aug 23, 2007
- Applied Materials, Inc.
- Gregory E. Menk
- B24 - GRINDING POLISHING
Information Patent Application
Polishing article with integrated window stripe
- Publication number 20070197134
- Publication date Aug 23, 2007
- Applied Materials, Inc.
- Gregory E. Menk
- B24 - GRINDING POLISHING
Information Patent Application
Polishing apparatus with grooved subpad
- Publication number 20070197141
- Publication date Aug 23, 2007
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Application
Polishing system with spiral-grooved subpad
- Publication number 20070197147
- Publication date Aug 23, 2007
- Applied Materials, Inc.
- Erik S. Rondum
- B24 - GRINDING POLISHING
Information Patent Application
Polishing article with integrated window stripe
- Publication number 20070197133
- Publication date Aug 23, 2007
- Applied Materials, Inc.
- Gregory E. Menk
- B24 - GRINDING POLISHING
Information Patent Application
Dechuck using subpad with recess
- Publication number 20070197132
- Publication date Aug 23, 2007
- Applied Materials, Inc.
- Gregory E. Menk
- B24 - GRINDING POLISHING
Information Patent Application
MATERIALS FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20070117500
- Publication date May 24, 2007
- APPLIED MATERIALS, INC.
- BENJAMIN A. BONNER
- B24 - GRINDING POLISHING
Information Patent Application
Materials for chemical mechanical polishing
- Publication number 20060246831
- Publication date Nov 2, 2006
- Benjamin A. Bonner
- B24 - GRINDING POLISHING
Information Patent Application
High selectivity slurry compositions for chemical mechanical polishing
- Publication number 20060097219
- Publication date May 11, 2006
- Applied Materials, Inc.
- Benjamin A. Bonner
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Methods and compositions for chemical mechanical polishing shallow...
- Publication number 20030036339
- Publication date Feb 20, 2003
- APPLIED MATERIALS, INC.
- Benjamin A. Bonner
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Anand N. Iyer

Person

Patents Grantslast 30 patents

Spray system for slurry reduction during chemical mechanical polish...

Platen surface modification and high-performance pad conditioning t...

Retaining ring for CMP

Retaining ring for CMP

Polishing article with integrated window stripe

Polishing apparatus with grooved subpad

Polishing article with integrated window stripe

Materials for chemical mechanical polishing

Materials for chemical mechanical polishing

Methods and compositions for chemical mechanical polishing shallow...

Patents Applicationslast 30 patents

SPRAY SYSTEM FOR SLURRY REDUCTION DURING CHEMICAL MECHANICAL POLISH...

POLISHING SLURRY DISPENSE NOZZLE

SPRAY SYSTEM FOR SLURRY REDUCTION DURING CHEMICAL MECHANICAL POLISH...

SLURRY-BASED TEMPERATURE CONTROL FOR CMP

TEMPERATURE CONTROL WITH INTRA-LAYER TRANSITION DURING CMP

PLATEN SURFACE MODIFICATION AND HIGH-PERFORMANCE PAD CONDITIONING T...

RETAINING RING FOR CMP

RETAINING RING FOR CMP

METHOD OF FORMING POLISHING SHEET

MONOLITHIC LINEAR POLISHING SHEET

POLISHING ARTICLE WITH INTEGRATED WINDOW STRIPE

SELECTIVE CHEMISTRY FOR FIXED ABRASIVE CMP

HIGH SELECTIVITY SLURRY COMPOSITIONS FOR CHEMICAL MECHANICAL POLISHING

Smart polishing media assembly for planarizing substrates

Polishing article with window stripe

Polishing article with integrated window stripe

Polishing apparatus with grooved subpad

Polishing system with spiral-grooved subpad

Polishing article with integrated window stripe

Dechuck using subpad with recess

MATERIALS FOR CHEMICAL MECHANICAL POLISHING

Materials for chemical mechanical polishing

High selectivity slurry compositions for chemical mechanical polishing

Methods and compositions for chemical mechanical polishing shallow...