Anita Madan

Person

Danbury, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Capacitance monitoring using x-ray diffraction
- Patent number 10,008,421
- Issue date Jun 26, 2018
- International Business Machines Corporation
- Donghun Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitance monitoring using X-ray diffraction
- Patent number 9,870,960
- Issue date Jan 16, 2018
- International Business Machines Corporation
- Donghun Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluating semiconductor wafers for pitch walking and/or epitaxial...
- Patent number 9,201,027
- Issue date Dec 1, 2015
- GLOBALFOUNDRIES Inc.
- Kriteshwar K. Kohli
- G01 - MEASURING TESTING
Information Patent Grant
Dislocation engineering using a scanned laser
- Patent number 8,865,571
- Issue date Oct 21, 2014
- International Business Machines Corporation
- Chung Woh Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dislocation engineering using a scanned laser
- Patent number 8,865,572
- Issue date Oct 21, 2014
- International Business Machines Corporation
- Chung Woh Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement of CMOS device channel strain by X-ray diffraction
- Patent number 8,716,037
- Issue date May 6, 2014
- International Business Machines Corporation
- Thomas N. Adam
- G01 - MEASURING TESTING
Information Patent Grant
Dislocation engineering using a scanned laser
- Patent number 8,138,066
- Issue date Mar 20, 2012
- International Business Machines Corporation
- Chung Woh Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit system with carbon and non-carbon silicon
- Patent number 8,105,955
- Issue date Jan 31, 2012
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Jin Ping Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of repairing process induced dielectric damage by the use of...
- Patent number 7,838,428
- Issue date Nov 23, 2010
- International Business Machines Corporation
- Shyng-Tsong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming nitride films with high compressive stress for im...
- Patent number 7,804,136
- Issue date Sep 28, 2010
- International Business Machines Corporation
- Richard A. Conti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring strain of epitaxial films using micro x-ray diffraction f...
- Patent number 7,769,134
- Issue date Aug 3, 2010
- International Business Machines Corporation
- Thomas N. Adam
- G01 - MEASURING TESTING
Information Patent Grant
Method for improved formation of nickel silicide contacts in semico...
- Patent number 7,622,386
- Issue date Nov 24, 2009
- International Business Machines Corporation
- Anita Madan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming nitride films with high compressive stress for im...
- Patent number 7,491,660
- Issue date Feb 17, 2009
- International Business Machines Corporation
- Richard A. Conti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improved formation of cobalt silicide contacts in semico...
- Patent number 7,485,572
- Issue date Feb 3, 2009
- International Business Machines Corporation
- Anita Madan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
N-channel MOSFETs comprising dual stressors, and methods for formin...
- Patent number 7,473,608
- Issue date Jan 6, 2009
- International Business Machines Corporation
- Jinghong H. Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming nitride films with high compressive stress for im...
- Patent number 7,462,527
- Issue date Dec 9, 2008
- International Business Machines Corporation
- Richard A. Conti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistance contact structure and fabrication thereof
- Patent number 7,407,875
- Issue date Aug 5, 2008
- International Business Machines Corporation
- Keith Kwong Hon Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
N-channel MOSFETs comprising dual stressors, and methods for formin...
- Patent number 7,279,758
- Issue date Oct 9, 2007
- International Business Machines Corporation
- Jinghong H. Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polycrystalline silicon layer with nano-grain structure and method...
- Patent number 7,232,774
- Issue date Jun 19, 2007
- International Business Machines Corporation
- Ashima B. Chakravarti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film resistors of different materials
- Patent number 7,193,500
- Issue date Mar 20, 2007
- International Business Machines Corporation
- Anil K. Chinthakindi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of carbon and nitrogen doped poly silicon films, and ret...
- Patent number 7,119,016
- Issue date Oct 10, 2006
- International Business Machines Corporation
- Ashima B. Chakravarti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CAPACITANCE MONITORING USING X-RAY DIFFRACTION
- Publication number 20180096904
- Publication date Apr 5, 2018
- International Business Machines Corporation
- Donghun Kang
- G01 - MEASURING TESTING
Information Patent Application
CAPACITANCE MONITORING USING X-RAY DIFFRACTION
- Publication number 20160178679
- Publication date Jun 23, 2016
- International Business Machines Corporation
- Donghun Kang
- G01 - MEASURING TESTING
Information Patent Application
EVALUATING SEMICONDUCTOR WAFERS FOR PITCH WALKING AND/OR EPITAXIAL...
- Publication number 20150233844
- Publication date Aug 20, 2015
- International Business Machines Corporation
- Kriteshwar K. Kohli
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT OF CMOS DEVICE CHANNEL STRAIN BY X-RAY DIFFRACTION
- Publication number 20140159161
- Publication date Jun 12, 2014
- International Business Machines Corporation
- Thomas N. Adam
- G01 - MEASURING TESTING
Information Patent Application
DISLOCATION ENGINEERING USING A SCANNED LASER
- Publication number 20140154872
- Publication date Jun 5, 2014
- International Business Machines Corporation
- Chung Woh Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISLOCATION ENGINEERING USING A SCANNED LASER
- Publication number 20140154873
- Publication date Jun 5, 2014
- International Business Machines Corporation
- Chung Woh Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dislocation Engineering Using a Scanned Laser
- Publication number 20120294322
- Publication date Nov 22, 2012
- International Business Machines Corporation
- Chung Woh Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT OF CMOS DEVICE CHANNEL STRAIN BY X-RAY DIFFRACTION
- Publication number 20120146050
- Publication date Jun 14, 2012
- International Business Machines Corporation
- THOMAS N. ADAM
- G01 - MEASURING TESTING
Information Patent Application
Dislocation Engineering Using a Scanned Laser
- Publication number 20120138823
- Publication date Jun 7, 2012
- International Business Machines Corporation
- Chung Woh Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING STRAIN OF EPITAXIAL FILMS USING MICRO X-RAY DIFFRACTION F...
- Publication number 20100208869
- Publication date Aug 19, 2010
- International Business Machines Corporation
- Thomas N. Adam
- G01 - MEASURING TESTING
Information Patent Application
DISLOCATION ENGINEERING USING A SCANNED LASER
- Publication number 20100081259
- Publication date Apr 1, 2010
- International Business Machines Corporation
- Chung Woh Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT SYSTEM EMPLOYING DIFFUSED SOURCE/DRAIN EXTENSIONS
- Publication number 20090146181
- Publication date Jun 11, 2009
- Chartered Semiconductor Manufacturing LTD.
- Chung Woh Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPROVED FORMATION OF NICKEL SILICIDE CONTACTS IN SEMICO...
- Publication number 20080138985
- Publication date Jun 12, 2008
- International Business Machines Corporation
- Anita Madan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPROVED FORMATION OF COBALT SILICIDE CONTACTS IN SEMICO...
- Publication number 20080124925
- Publication date May 29, 2008
- International Business Machines Corporation
- Anita Madan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT SYSTEM WITH CARBON AND NON-CARBON SILICON
- Publication number 20080121926
- Publication date May 29, 2008
- Chartered Semiconductor Manufacturing LTD.
- Jin Ping Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW RESISTANCE CONTACT STRUCTURE AND FABRICATION THEREOF
- Publication number 20080054326
- Publication date Mar 6, 2008
- International Business Machines Corporation
- Keith Kwong Hon Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING NITRIDE FILMS WITH HIGH COMPRESSIVE STRESS FOR IM...
- Publication number 20080045039
- Publication date Feb 21, 2008
- International Business Machines Corporation
- Richard A. Conti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING NITRIDE FILMS WITH HIGH COMPRESSIVE STRESS FOR IM...
- Publication number 20080036007
- Publication date Feb 14, 2008
- International Business Machines Corporation
- Richard A. Conti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
N-CHANNEL MOSFETS COMPRISING DUAL STRESSORS, AND METHODS FOR FORMIN...
- Publication number 20070281413
- Publication date Dec 6, 2007
- International Business Machines Corporation
- Jinghong H. Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Epitaxy of Silicon-Carbon Substitutional Solid Solutions by Ultra-F...
- Publication number 20070238267
- Publication date Oct 11, 2007
- International Business Machines Corporation
- Yaocheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF REPAIRING PROCESS INDUCED DIELECTRIC DAMAGE BY THE USE OF...
- Publication number 20070224824
- Publication date Sep 27, 2007
- International Business Machines Corporation
- Shyng-Tsong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor devices and methods of manufacture thereof
- Publication number 20070134861
- Publication date Jun 14, 2007
- Jin-Ping Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING NITRIDE FILMS WITH HIGH COMPRESSIVE STRESS FOR IM...
- Publication number 20070007548
- Publication date Jan 11, 2007
- International Business Machines Corporation
- Richard A. Conti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPED NITRIDE FILM, DOPED OXIDE FILM AND OTHER DOPED FILMS AND DEPO...
- Publication number 20060237846
- Publication date Oct 26, 2006
- International Business Machines Corporation
- Ashima B. Chakravarti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin Film Resistors of Different Materials
- Publication number 20060087400
- Publication date Apr 27, 2006
- International Business Machines Corporation
- Anil K. Chinthakindi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polycrystalline Silicon Layer With Nano-grain Structure and Method...
- Publication number 20050158924
- Publication date Jul 21, 2005
- International Business Machines Corporation
- Ashima B. Chakravarti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of carbon and nitrogen doped poly silicon films, and ret...
- Publication number 20050085054
- Publication date Apr 21, 2005
- Ashima B. Chakravarti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Anita Madan

Person

Patents Grantslast 30 patents

Capacitance monitoring using x-ray diffraction

Capacitance monitoring using X-ray diffraction

Evaluating semiconductor wafers for pitch walking and/or epitaxial...

Dislocation engineering using a scanned laser

Dislocation engineering using a scanned laser

Measurement of CMOS device channel strain by X-ray diffraction

Dislocation engineering using a scanned laser

Integrated circuit system with carbon and non-carbon silicon

Method of repairing process induced dielectric damage by the use of...

Method of forming nitride films with high compressive stress for im...

Measuring strain of epitaxial films using micro x-ray diffraction f...

Method for improved formation of nickel silicide contacts in semico...

Method of forming nitride films with high compressive stress for im...

Method for improved formation of cobalt silicide contacts in semico...

N-channel MOSFETs comprising dual stressors, and methods for formin...

Method of forming nitride films with high compressive stress for im...

Low resistance contact structure and fabrication thereof

N-channel MOSFETs comprising dual stressors, and methods for formin...

Polycrystalline silicon layer with nano-grain structure and method...

Thin film resistors of different materials

Deposition of carbon and nitrogen doped poly silicon films, and ret...

Patents Applicationslast 30 patents

CAPACITANCE MONITORING USING X-RAY DIFFRACTION

CAPACITANCE MONITORING USING X-RAY DIFFRACTION

EVALUATING SEMICONDUCTOR WAFERS FOR PITCH WALKING AND/OR EPITAXIAL...

MEASUREMENT OF CMOS DEVICE CHANNEL STRAIN BY X-RAY DIFFRACTION

DISLOCATION ENGINEERING USING A SCANNED LASER

DISLOCATION ENGINEERING USING A SCANNED LASER

Dislocation Engineering Using a Scanned Laser

MEASUREMENT OF CMOS DEVICE CHANNEL STRAIN BY X-RAY DIFFRACTION

Dislocation Engineering Using a Scanned Laser

MEASURING STRAIN OF EPITAXIAL FILMS USING MICRO X-RAY DIFFRACTION F...

DISLOCATION ENGINEERING USING A SCANNED LASER

INTEGRATED CIRCUIT SYSTEM EMPLOYING DIFFUSED SOURCE/DRAIN EXTENSIONS

METHOD FOR IMPROVED FORMATION OF NICKEL SILICIDE CONTACTS IN SEMICO...

METHOD FOR IMPROVED FORMATION OF COBALT SILICIDE CONTACTS IN SEMICO...

INTEGRATED CIRCUIT SYSTEM WITH CARBON AND NON-CARBON SILICON

LOW RESISTANCE CONTACT STRUCTURE AND FABRICATION THEREOF

METHOD OF FORMING NITRIDE FILMS WITH HIGH COMPRESSIVE STRESS FOR IM...

METHOD OF FORMING NITRIDE FILMS WITH HIGH COMPRESSIVE STRESS FOR IM...

N-CHANNEL MOSFETS COMPRISING DUAL STRESSORS, AND METHODS FOR FORMIN...

Epitaxy of Silicon-Carbon Substitutional Solid Solutions by Ultra-F...

METHOD OF REPAIRING PROCESS INDUCED DIELECTRIC DAMAGE BY THE USE OF...

Semiconductor devices and methods of manufacture thereof

METHOD OF FORMING NITRIDE FILMS WITH HIGH COMPRESSIVE STRESS FOR IM...

DOPED NITRIDE FILM, DOPED OXIDE FILM AND OTHER DOPED FILMS AND DEPO...

Thin Film Resistors of Different Materials

Polycrystalline Silicon Layer With Nano-grain Structure and Method...

Deposition of carbon and nitrogen doped poly silicon films, and ret...