Benjamin Szu-Min Lin

Person

Hsin-Chu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Transmission mask with differential attenuation to improve ISO-dens...
- Patent number 8,229,062
- Issue date Jul 24, 2012
- Infineon Technologies AG
- Hang Yip Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmission mask with differential attenuation to improve ISO-dens...
- Patent number 7,807,342
- Issue date Oct 5, 2010
- Infineon Technologies AG
- Hang Yip Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and related operation system for immersion lithography
- Patent number 7,633,601
- Issue date Dec 15, 2009
- United Microelectronics Corp.
- Yong-Fa Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for designing photomask
- Patent number 7,476,472
- Issue date Jan 13, 2009
- United Microelectronics Corp.
- Ming-Feng Shieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Profile improvement method for patterning
- Patent number 7,268,070
- Issue date Sep 11, 2007
- United Microelectronics Corp.
- Hui-Ling Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV reflection mask and lithographic process using the same
- Patent number 7,105,255
- Issue date Sep 12, 2006
- United Microelectronics Corp.
- Benjamin Szu-Min Lin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Effective assist pattern for nested and isolated contacts
- Patent number 7,074,528
- Issue date Jul 11, 2006
- Infineon Technologies AG
- Jochen Schacht
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transmission mask with differential attenuation to improve ISO-dens...
- Patent number 7,052,808
- Issue date May 30, 2006
- Infineon Technologies AG
- Hang Yip Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting lithographic process
- Patent number 7,018,788
- Issue date Mar 28, 2006
- United Microelectronics Corp.
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure of phase shifting mask
- Patent number 6,866,967
- Issue date Mar 15, 2005
- United Microelectronics Corp.
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting lithographic process
- Patent number 6,849,393
- Issue date Feb 1, 2005
- United Microelectronics Corp.
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sandwich photoresist structure in photolithographic process
- Patent number 6,844,143
- Issue date Jan 18, 2005
- United Microelectronics Corp.
- Benjamin Szu-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TRANSMISSION MASK WITH DIFFERENTIAL ATTENUATION TO IMPROVE ISO-DENS...
- Publication number 20100321656
- Publication date Dec 23, 2010
- Infineon Technologies North American Corp.
- Hang Yip Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING A PATTERN
- Publication number 20080160459
- Publication date Jul 3, 2008
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MOVING BUBBLES
- Publication number 20080067335
- Publication date Mar 20, 2008
- Ya-Ching Hou
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR CHARACTERIZING LINE WIDTH ROUGHNESS (LWR) OF PRINTED FEA...
- Publication number 20080055597
- Publication date Mar 6, 2008
- Jie-Wei Sun
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR IMMERSION LITHOGRAPHY
- Publication number 20070224545
- Publication date Sep 27, 2007
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND RELATED OPERATION SYSTEM FOR IMMERSION LITHOGRAPHY
- Publication number 20070215040
- Publication date Sep 20, 2007
- Yong-Fa Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR IMPROVING THE ALIGNMENT ACCURACY OF SEMICONDUCTOR PROCES...
- Publication number 20070190805
- Publication date Aug 16, 2007
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR EXPOSURE METHOD AND METHOD OF CONTROLLING SEMICONDUCT...
- Publication number 20070182948
- Publication date Aug 9, 2007
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DESIGNING PHOTOMASK
- Publication number 20070020532
- Publication date Jan 25, 2007
- Ming-Feng Shieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING COMPOSITE PATTERN INCLUDING DIFFERENT TYPES OF P...
- Publication number 20060257795
- Publication date Nov 16, 2006
- Benjamin Szu-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating etch mask and patterning process using the same
- Publication number 20060191863
- Publication date Aug 31, 2006
- Benjamin Szu-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSION LITHOGRAPHY WITHOUT USING A TOPCOAT
- Publication number 20060194142
- Publication date Aug 31, 2006
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD
- Publication number 20060133222
- Publication date Jun 22, 2006
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING DUAL DAMASCENE STRUCTURES
- Publication number 20050196951
- Publication date Sep 8, 2005
- Benjamin Szu-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASE SHIFTING LITHOGRAPHIC PROCESS
- Publication number 20050074678
- Publication date Apr 7, 2005
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFTING LITHOGRAPHIC PROCESS
- Publication number 20040161675
- Publication date Aug 19, 2004
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SHRINKING CRITICAL DIMENSION OF SEMICONDUCTOR DEVICES
- Publication number 20040106067
- Publication date Jun 3, 2004
- Benjamin Szu-Min Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Benjamin Szu-Min Lin

Person

Patents Grantslast 30 patents

Transmission mask with differential attenuation to improve ISO-dens...

Transmission mask with differential attenuation to improve ISO-dens...

Method and related operation system for immersion lithography

Method for designing photomask

Profile improvement method for patterning

EUV reflection mask and lithographic process using the same

Effective assist pattern for nested and isolated contacts

Transmission mask with differential attenuation to improve ISO-dens...

Phase shifting lithographic process

Structure of phase shifting mask

Phase shifting lithographic process

Sandwich photoresist structure in photolithographic process

Patents Applicationslast 30 patents

TRANSMISSION MASK WITH DIFFERENTIAL ATTENUATION TO IMPROVE ISO-DENS...

METHOD OF FORMING A PATTERN

METHOD OF MOVING BUBBLES

METHOD FOR CHARACTERIZING LINE WIDTH ROUGHNESS (LWR) OF PRINTED FEA...

METHOD FOR IMMERSION LITHOGRAPHY

METHOD AND RELATED OPERATION SYSTEM FOR IMMERSION LITHOGRAPHY

METHOD FOR IMPROVING THE ALIGNMENT ACCURACY OF SEMICONDUCTOR PROCES...

SEMICONDUCTOR EXPOSURE METHOD AND METHOD OF CONTROLLING SEMICONDUCT...

METHOD FOR DESIGNING PHOTOMASK

METHOD FOR FORMING COMPOSITE PATTERN INCLUDING DIFFERENT TYPES OF P...

Method for fabricating etch mask and patterning process using the same

IMMERSION LITHOGRAPHY WITHOUT USING A TOPCOAT

LITHOGRAPHY METHOD

METHOD OF FORMING DUAL DAMASCENE STRUCTURES

PHASE SHIFTING LITHOGRAPHIC PROCESS

PHASE SHIFTING LITHOGRAPHIC PROCESS

METHOD FOR SHRINKING CRITICAL DIMENSION OF SEMICONDUCTOR DEVICES