Brian K. Hatcher

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Combinatorial high power coaxial switching matrix
- Patent number 8,858,766
- Issue date Oct 14, 2014
- Intermolecular, Inc.
- Brian K. Hatcher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with center-fed multiple zone gas distribution for i...
- Patent number 8,236,133
- Issue date Aug 7, 2012
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to control uniformity using tri-zone showerhead
- Patent number 8,066,895
- Issue date Nov 29, 2011
- Applied Materials, Inc.
- Rodolfo P. Belen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate profile control through effective frequency of dual HF/VHF sou...
- Patent number 8,017,526
- Issue date Sep 13, 2011
- Applied Materials, Inc.
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process using combined capacitively and inductively coupled plasma...
- Patent number 7,780,864
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High AC current high RF power AC-RF decoupling filter for plasma re...
- Patent number 7,777,152
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Valentin N. Todorov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Dual plasma source process using a variable frequency capacitively...
- Patent number 7,727,413
- Issue date Jun 1, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process for inductively coupling power through a gas distrib...
- Patent number 7,674,394
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- Alexander Paterson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor apparatus with a VHF capacitively coupled plasma sou...
- Patent number 7,645,357
- Issue date Jan 12, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor apparatus with independent capacitive and toroidal p...
- Patent number 7,264,688
- Issue date Sep 4, 2007
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment of etching chambers using activated cleaning gas
- Patent number 6,379,575
- Issue date Apr 30, 2002
- Applied Materials, Inc.
- Gerald Zheyao Yin
- B08 - CLEANING
Information Patent Grant
Closed-loop dome thermal control apparatus for a semiconductor wafe...
- Patent number 6,367,410
- Issue date Apr 9, 2002
- Applied Materials, Inc.
- Patrick Leahey
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH EFFICIENCY MICROWAVE PLASMA APPLICATOR
- Publication number 20240379329
- Publication date Nov 14, 2024
- Applied Materials, Inc,
- Thai Cheng Chua
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH INTEGRATED OPTICAL SENSORS
- Publication number 20240153795
- Publication date May 9, 2024
- Applied Materials, Inc.
- Adam Fischbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Sputter Deposition And RF Plasma Sputter Etch Combinator...
- Publication number 20130168231
- Publication date Jul 4, 2013
- INTERMOLECULAR INC.
- Hong Sheng Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Combinatorial High Power Coaxial Switching Matrix
- Publication number 20130160708
- Publication date Jun 27, 2013
- INTERMOLECULAR INC.
- Brian K. Hatcher
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
Combinatorial High Power Coaxial Switching Matrix
- Publication number 20130166088
- Publication date Jun 27, 2013
- INTERMOLECULAR INC.
- Brian K. Hatcher
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
PLASMA REACTOR ELECTROSTATIC CHUCK HAVING A COAXIAL RF FEED AND MUL...
- Publication number 20090274590
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- MICHAEL D. WILLWERTH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVE...
- Publication number 20090275206
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO CONTROL UNIFORMITY USING TRI-ZONE SHOWERHEAD
- Publication number 20090218317
- Publication date Sep 3, 2009
- RODOLFO P. BELEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of controlling CD bias and CD microloading by changing the c...
- Publication number 20090156011
- Publication date Jun 18, 2009
- Rodolfo P. Belen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate profile control through effective frequency of dual HF/VHF sou...
- Publication number 20090142930
- Publication date Jun 4, 2009
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD G...
- Publication number 20080236490
- Publication date Oct 2, 2008
- ALEXANDER PATERSON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SPECIES AND UNIFORMITY CONTROL THROUGH PULSED VHF OPERATION
- Publication number 20080230008
- Publication date Sep 25, 2008
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS FOR INDUCTIVELY COUPLING POWER THROUGH A GAS...
- Publication number 20080206483
- Publication date Aug 28, 2008
- ALEXANDER PATERSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of processing a workpiece using a mid-chamber gas distributi...
- Publication number 20080193673
- Publication date Aug 14, 2008
- APPLIED MATERIALS, INC.
- Alexander M. Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mid-chamber gas distribution plate, tuned plasma flow control grid...
- Publication number 20080178805
- Publication date Jul 31, 2008
- APPLIED MATERIALS, INC.
- Alexander M. Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etch process for controlling line edge roughness
- Publication number 20080149592
- Publication date Jun 26, 2008
- Rodolfo P. Belen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING ASYMMETRICAL PLASMA GENERATION IN A PROCESS CHAMBER
- Publication number 20080023443
- Publication date Jan 31, 2008
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA RE...
- Publication number 20070284344
- Publication date Dec 13, 2007
- Valentin N. Todorov
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245961
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with a toroidal plasma source and a VHF ca...
- Publication number 20070246161
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070246443
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070247074
- Publication date Oct 25, 2007
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245959
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process using combined capacitively and inductively coupled plasma...
- Publication number 20070245960
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with independent capacitive and inductive...
- Publication number 20070246163
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma reactor apparatus with a VHF capacitively coupled plasma sou...
- Publication number 20070247073
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor apparatus with an inductive plasma source and a VHF...
- Publication number 20070246162
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual plasma source process using a variable frequency capacitively...
- Publication number 20070245958
- Publication date Oct 25, 2007
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Alternating asymmetrical plasma generation in a process chamber
- Publication number 20050241762
- Publication date Nov 3, 2005
- APPLIED MATERIALS, INC.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS

Brian K. Hatcher

Person

Patents Grantslast 30 patents

Combinatorial high power coaxial switching matrix

Plasma reactor with center-fed multiple zone gas distribution for i...

Method to control uniformity using tri-zone showerhead

Gate profile control through effective frequency of dual HF/VHF sou...

Process using combined capacitively and inductively coupled plasma...

High AC current high RF power AC-RF decoupling filter for plasma re...

Dual plasma source process using a variable frequency capacitively...

Plasma process for inductively coupling power through a gas distrib...

Plasma reactor apparatus with a VHF capacitively coupled plasma sou...

Plasma reactor apparatus with independent capacitive and toroidal p...

Treatment of etching chambers using activated cleaning gas

Closed-loop dome thermal control apparatus for a semiconductor wafe...

Patents Applicationslast 30 patents

HIGH EFFICIENCY MICROWAVE PLASMA APPLICATOR

MODULAR MICROWAVE SOURCE WITH INTEGRATED OPTICAL SENSORS

Method For Sputter Deposition And RF Plasma Sputter Etch Combinator...

Combinatorial High Power Coaxial Switching Matrix

Combinatorial High Power Coaxial Switching Matrix

PLASMA REACTOR ELECTROSTATIC CHUCK HAVING A COAXIAL RF FEED AND MUL...

PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVE...

METHOD TO CONTROL UNIFORMITY USING TRI-ZONE SHOWERHEAD

Method of controlling CD bias and CD microloading by changing the c...

Gate profile control through effective frequency of dual HF/VHF sou...

PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD G...

PLASMA SPECIES AND UNIFORMITY CONTROL THROUGH PULSED VHF OPERATION

PLASMA PROCESS FOR INDUCTIVELY COUPLING POWER THROUGH A GAS...

Method of processing a workpiece using a mid-chamber gas distributi...

Mid-chamber gas distribution plate, tuned plasma flow control grid...

Plasma etch process for controlling line edge roughness

ALTERNATING ASYMMETRICAL PLASMA GENERATION IN A PROCESS CHAMBER

HIGH AC CURRENT HIGH RF POWER AC-RF DECOUPLING FILTER FOR PLASMA RE...

Dual plasma source process using a variable frequency capacitively...

Plasma reactor apparatus with a toroidal plasma source and a VHF ca...

Process using combined capacitively and inductively coupled plasma...

Process using combined capacitively and inductively coupled plasma...

Dual plasma source process using a variable frequency capacitively...

Process using combined capacitively and inductively coupled plasma...

Plasma reactor apparatus with independent capacitive and inductive...

Plasma reactor apparatus with a VHF capacitively coupled plasma sou...

Plasma reactor apparatus with an inductive plasma source and a VHF...

Dual plasma source process using a variable frequency capacitively...

Alternating asymmetrical plasma generation in a process chamber