Christoph Spengler

Person

Innsbruck, AT

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern data processing for programmable direct-write apparatus
- Patent number 12,040,157
- Issue date Jul 16, 2024
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle source
- Patent number 11,735,391
- Issue date Aug 22, 2023
- IMS Nanofabrication GmbH
- Stefan Gerhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for irradiating a target using restricted placement grids
- Patent number 11,569,064
- Issue date Jan 31, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adapting the duration of exposure slots in multi-beam writers
- Patent number 11,099,482
- Issue date Aug 24, 2021
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle source and method for cleaning a charged-particle...
- Patent number 10,840,054
- Issue date Nov 17, 2020
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-linear dose- and blur-dependent edge placement correction
- Patent number 10,651,010
- Issue date May 12, 2020
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dose-related feature reshaping in an exposure pattern to be exposed...
- Patent number 10,522,329
- Issue date Dec 31, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced dose-level quantization of multibeam-writers
- Patent number 10,325,757
- Issue date Jun 18, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction of short-range dislocations in a multi-beam writer
- Patent number 9,568,907
- Issue date Feb 14, 2017
- IMS Nanofabrication AG
- Elmar Platzgummer
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
Optimizing Image Distortion in a Multi Beam Charged Particle Proces...
- Publication number 20240304413
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Determining Focal Properties in a Target Beam Field of a...
- Publication number 20240304415
- Publication date Sep 12, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Magnetic Lens Having Permanent-Magnetic and Electromagne...
- Publication number 20240212970
- Publication date Jun 27, 2024
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Beam Pattern Definition Device
- Publication number 20230360880
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Stefan Eder-Kapl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adjustable Permanent Magnetic Lens Having Shunting Device
- Publication number 20230360878
- Publication date Nov 9, 2023
- IMS Nanofabrication GmbH
- Dietmar Puchberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction of Thermal Expansion in a Lithographic Device
- Publication number 20230296989
- Publication date Sep 21, 2023
- IMS Nanofabrication GmbH
- Matthias Liertzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electromagnetic Lens
- Publication number 20230015805
- Publication date Jan 19, 2023
- IMS Nanofabrication GmbH
- Christoph Spengler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Data Processing For Programmable Direct-Write Apparatus
- Publication number 20220384143
- Publication date Dec 1, 2022
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-Particle Source
- Publication number 20210335573
- Publication date Oct 28, 2021
- IMS Nanofabrication GmbH
- Stefan Gerhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction of Blur Variation in a Multi-Beam Writer
- Publication number 20210240074
- Publication date Aug 5, 2021
- IMS Nanofabrication GmbH
- Christoph Spengler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adapting the Duration of Exposure Slots in Multi-Beam Writers
- Publication number 20200348597
- Publication date Nov 5, 2020
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged-Particle Source and Method for Cleaning a Charged-Particle...
- Publication number 20190237288
- Publication date Aug 1, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Non-linear Dose- and Blur-Dependent Edge Placement Correction
- Publication number 20190214226
- Publication date Jul 11, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Irradiating a Target Using Restricted Placement Grids
- Publication number 20190088448
- Publication date Mar 21, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed...
- Publication number 20190066976
- Publication date Feb 28, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced Dose-Level Quantization for Multibeam-Writers
- Publication number 20180218879
- Publication date Aug 2, 2018
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Correction of Short-Range Dislocations in a Multi-Beam Writer
- Publication number 20160071684
- Publication date Mar 10, 2016
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS

Christoph Spengler

Person

Patents Grantslast 30 patents

Pattern data processing for programmable direct-write apparatus

Charged-particle source

Method for irradiating a target using restricted placement grids

Adapting the duration of exposure slots in multi-beam writers

Charged-particle source and method for cleaning a charged-particle...

Non-linear dose- and blur-dependent edge placement correction

Dose-related feature reshaping in an exposure pattern to be exposed...

Advanced dose-level quantization of multibeam-writers

Correction of short-range dislocations in a multi-beam writer

Patents Applicationslast 30 patents

Optimizing Image Distortion in a Multi Beam Charged Particle Proces...

Method for Determining Focal Properties in a Target Beam Field of a...

Adjustable Magnetic Lens Having Permanent-Magnetic and Electromagne...

Multi-Beam Pattern Definition Device

Adjustable Permanent Magnetic Lens Having Shunting Device

Correction of Thermal Expansion in a Lithographic Device

Electromagnetic Lens

Pattern Data Processing For Programmable Direct-Write Apparatus

Charged-Particle Source

Correction of Blur Variation in a Multi-Beam Writer

Adapting the Duration of Exposure Slots in Multi-Beam Writers

Charged-Particle Source and Method for Cleaning a Charged-Particle...

Non-linear Dose- and Blur-Dependent Edge Placement Correction

Method for Irradiating a Target Using Restricted Placement Grids

Dose-Related Feature Reshaping in an Exposure Pattern to be Exposed...

Advanced Dose-Level Quantization for Multibeam-Writers

Correction of Short-Range Dislocations in a Multi-Beam Writer