Craig Metzner

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer processing hardware for epitaxial deposition with reduced bac...
- Patent number 8,951,351
- Issue date Feb 10, 2015
- Applied Materials, Inc.
- Kailash Kiran Patalay
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing hardware for epitaxial deposition with reduced aut...
- Patent number 8,852,349
- Issue date Oct 7, 2014
- Applied Materials, Inc.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor process chamber vision and monitoring system
- Patent number 8,726,837
- Issue date May 20, 2014
- Applied Materials, Inc.
- Kailash K. Patalay
- G02 - OPTICS
Information Patent Grant
Susceptor with backside area of constant emissivity
- Patent number 8,524,555
- Issue date Sep 3, 2013
- Applied Materials, Inc.
- Errol Sanchez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for the deposition of high dielectric constant films
- Patent number 8,496,780
- Issue date Jul 30, 2013
- Applied Materials, Inc.
- Bobby M. Ronsse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus temperature control and pattern compensation
- Patent number 8,372,203
- Issue date Feb 12, 2013
- Applied Materials, Inc.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatuses for atomic layer deposition
- Patent number 8,343,279
- Issue date Jan 1, 2013
- Applied Materials, Inc.
- Nyi Oo Myo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for atomic layer deposition of hafnium-containing high-K di...
- Patent number 8,282,992
- Issue date Oct 9, 2012
- Applied Materials, Inc.
- Nyi Oo Myo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Susceptor with backside area of constant emissivity
- Patent number 8,226,770
- Issue date Jul 24, 2012
- Applied Materials, Inc.
- Errol Sanchez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface pre-treatment for enhancement of nucleation of high dielect...
- Patent number 8,071,167
- Issue date Dec 6, 2011
- Applied Materials, Inc.
- Shreyas S. Kher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and methods including temperature and emis...
- Patent number 7,691,204
- Issue date Apr 6, 2010
- Applied Materials, Inc.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas manifolds for use during epitaxial film formation
- Patent number 7,674,337
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- David Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD metal oxide deposition process using direct oxidation
- Patent number 7,569,500
- Issue date Aug 4, 2009
- Applied Materials, Inc.
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD metal oxide deposition process using direct oxidation
- Patent number 7,569,501
- Issue date Aug 4, 2009
- Applied Materials, Inc.
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for hafnium nitride deposition
- Patent number 7,547,952
- Issue date Jun 16, 2009
- Applied Materials, Inc.
- Craig Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for forming a gate dielectric
- Patent number 7,531,468
- Issue date May 12, 2009
- Applied Materials, Inc.
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for forming a gate dielectric
- Patent number 7,304,004
- Issue date Dec 4, 2007
- Applied Materials, Inc.
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
ALD metal oxide deposition process using direct oxidation
- Patent number 7,067,439
- Issue date Jun 27, 2006
- Applied Materials, Inc.
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for forming a gate dielectric
- Patent number 6,858,547
- Issue date Feb 22, 2005
- Applied Materials, Inc.
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition reactor having vaporizing, mixing and cleaning capabilities
- Patent number 6,454,860
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR THE DEPOSITION OF HIGH DIELECTRIC CONSTANT FILMS
- Publication number 20130333621
- Publication date Dec 19, 2013
- Bobby M. Ronsse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUSCEPTOR WITH BACKSIDE AREA OF CONSTANT EMISSIVITY
- Publication number 20120282714
- Publication date Nov 8, 2012
- Applied Materials, Inc.
- Errol Sanchez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE PRE-TREATMENT FOR ENHANCEMENT OF NUCLEATION OF HIGH DIELECT...
- Publication number 20100239758
- Publication date Sep 23, 2010
- Shreyas S. Kher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESS CHAMBER VISION AND MONITORING SYSTEM
- Publication number 20090314205
- Publication date Dec 24, 2009
- Kailash K. Patalay
- G02 - OPTICS
Information Patent Application
SUSCEPTOR WITH BACKSIDE AREA OF CONSTANT EMISSIVITY
- Publication number 20080274604
- Publication date Nov 6, 2008
- Errol Sanchez
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULAR CVD EPI 300MM REACTOR
- Publication number 20080072820
- Publication date Mar 27, 2008
- APPLIED MATERIALS, INC.
- Brian H. Burrows
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING HARDWARE FOR EPITAXIAL DEPOSITION WITH REDUCED BAC...
- Publication number 20080066684
- Publication date Mar 20, 2008
- Applied Materials, Inc.
- KAILASH KIRAN PATALAY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Wafer processing hardware for epitaxial deposition with reduced aut...
- Publication number 20080069951
- Publication date Mar 20, 2008
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR FORMING A GATE DIELECTRIC
- Publication number 20080057737
- Publication date Mar 6, 2008
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR ATOMIC LAYER DEPOSITION OF HAFNIUM-CONTAINING HIGH-K DI...
- Publication number 20080044569
- Publication date Feb 21, 2008
- Nyi Oo Myo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS MANIFOLDS FOR USE DURING EPITAXIAL FILM FORMATION
- Publication number 20070259112
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- David Ishikawa
- C30 - CRYSTAL GROWTH
Information Patent Application
Semiconductor process chamber
- Publication number 20070089836
- Publication date Apr 26, 2007
- APPLIED MATERIALS, INC.
- Craig Metzner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film formation apparatus and methods including temperature and emis...
- Publication number 20070077355
- Publication date Apr 5, 2007
- APPLIED MATERIALS, INC.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus temperature control and pattern compensation
- Publication number 20070074665
- Publication date Apr 5, 2007
- APPLIED MATERIALS, INC.
- Juan Chacin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD METAL OXIDE DEPOSITION PROCESS USING DIRECT OXIDATION
- Publication number 20070059948
- Publication date Mar 15, 2007
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE PRE-TREATMENT FOR ENHANCEMENT OF NUCLEATION OF HIGH DIELECT...
- Publication number 20060264067
- Publication date Nov 23, 2006
- Shreyas S. Kher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD METAL OXIDE DEPOSITION PROCESS USING DIRECT OXIDATION
- Publication number 20060223339
- Publication date Oct 5, 2006
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR HAFNIUM NITRIDE DEPOSITION
- Publication number 20060208215
- Publication date Sep 21, 2006
- Craig Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for the deposition of high dielectric constant films
- Publication number 20060196421
- Publication date Sep 7, 2006
- Bobby M. Ronsse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatuses and methods for atomic layer deposition of hafnium-cont...
- Publication number 20050271812
- Publication date Dec 8, 2005
- Nyi Oo Myo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and method for forming a gate dielectric
- Publication number 20050009371
- Publication date Jan 13, 2005
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for hafnium nitride deposition
- Publication number 20040198069
- Publication date Oct 7, 2004
- APPLIED MATERIALS, INC.
- Craig Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cyclical sequential deposition of multicomponent films
- Publication number 20030235961
- Publication date Dec 25, 2003
- APPLIED MATERIALS, INC.
- Craig Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Surface pre-treatment for enhancement of nucleation of high dielect...
- Publication number 20030232501
- Publication date Dec 18, 2003
- Shreyas S. Kher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD metal oxide deposition process using direct oxidation
- Publication number 20030232511
- Publication date Dec 18, 2003
- APPLIED MATERIALS, INC.
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and method for forming a gate dielectric
- Publication number 20030232506
- Publication date Dec 18, 2003
- APPLIED MATERIALS, INC.
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for the deposition of high dielectric constant films
- Publication number 20030101938
- Publication date Jun 5, 2003
- APPLIED MATERIALS, INC.
- Bobby M. Ronsse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition reactor having vaporizing, mixing and cleaning capabilities
- Publication number 20020192370
- Publication date Dec 19, 2002
- Craig R. Metzner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION REACTOR HAVING VAPORIZING, MIXING AND CLEANING CAPABILITIES
- Publication number 20010035127
- Publication date Nov 1, 2001
- CRAIG R. METZNER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Craig Metzner

Person

Patents Grantslast 30 patents

Wafer processing hardware for epitaxial deposition with reduced bac...

Wafer processing hardware for epitaxial deposition with reduced aut...

Semiconductor process chamber vision and monitoring system

Susceptor with backside area of constant emissivity

Apparatus for the deposition of high dielectric constant films

Apparatus temperature control and pattern compensation

Apparatuses for atomic layer deposition

Methods for atomic layer deposition of hafnium-containing high-K di...

Susceptor with backside area of constant emissivity

Surface pre-treatment for enhancement of nucleation of high dielect...

Film formation apparatus and methods including temperature and emis...

Gas manifolds for use during epitaxial film formation

ALD metal oxide deposition process using direct oxidation

ALD metal oxide deposition process using direct oxidation

Method for hafnium nitride deposition

System and method for forming a gate dielectric

System and method for forming a gate dielectric

ALD metal oxide deposition process using direct oxidation

System and method for forming a gate dielectric

Deposition reactor having vaporizing, mixing and cleaning capabilities

Patents Applicationslast 30 patents

APPARATUS FOR THE DEPOSITION OF HIGH DIELECTRIC CONSTANT FILMS

SUSCEPTOR WITH BACKSIDE AREA OF CONSTANT EMISSIVITY

SURFACE PRE-TREATMENT FOR ENHANCEMENT OF NUCLEATION OF HIGH DIELECT...

SEMICONDUCTOR PROCESS CHAMBER VISION AND MONITORING SYSTEM

SUSCEPTOR WITH BACKSIDE AREA OF CONSTANT EMISSIVITY

MODULAR CVD EPI 300MM REACTOR

WAFER PROCESSING HARDWARE FOR EPITAXIAL DEPOSITION WITH REDUCED BAC...

Wafer processing hardware for epitaxial deposition with reduced aut...

SYSTEM AND METHOD FOR FORMING A GATE DIELECTRIC

METHODS FOR ATOMIC LAYER DEPOSITION OF HAFNIUM-CONTAINING HIGH-K DI...

GAS MANIFOLDS FOR USE DURING EPITAXIAL FILM FORMATION

Semiconductor process chamber

Film formation apparatus and methods including temperature and emis...

Apparatus temperature control and pattern compensation

ALD METAL OXIDE DEPOSITION PROCESS USING DIRECT OXIDATION

SURFACE PRE-TREATMENT FOR ENHANCEMENT OF NUCLEATION OF HIGH DIELECT...

ALD METAL OXIDE DEPOSITION PROCESS USING DIRECT OXIDATION

METHOD FOR HAFNIUM NITRIDE DEPOSITION

Apparatus for the deposition of high dielectric constant films

Apparatuses and methods for atomic layer deposition of hafnium-cont...

System and method for forming a gate dielectric

Method for hafnium nitride deposition

Cyclical sequential deposition of multicomponent films

Surface pre-treatment for enhancement of nucleation of high dielect...

ALD metal oxide deposition process using direct oxidation

System and method for forming a gate dielectric

Apparatus for the deposition of high dielectric constant films

Deposition reactor having vaporizing, mixing and cleaning capabilities

DEPOSITION REACTOR HAVING VAPORIZING, MIXING AND CLEANING CAPABILITIES