David Cheung

Person

Foster City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,570
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,571
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 11,694,911
- Issue date Jul 4, 2023
- Lam Research Corporation
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal doped carbon based hard mask removal in semiconductor fabrica...
- Patent number 11,062,897
- Issue date Jul 13, 2021
- Lam Research Corporation
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for detecting oxygen in-situ in a substrate are...
- Patent number 10,267,728
- Issue date Apr 23, 2019
- Lam Research Corporation
- Dengliang Yang
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing method for depositing a barrier layer to preve...
- Patent number 10,109,476
- Issue date Oct 23, 2018
- Lam Research Corporation
- David Cheung
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
High dose implantation strip (HDIS) in H2 base chemistry
- Patent number 9,941,108
- Issue date Apr 10, 2018
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Photoresist strip processes for improved device integrity
- Patent number 9,613,825
- Issue date Apr 4, 2017
- Novellus Systems, Inc.
- Roey Shaviv
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma generator systems and methods of forming plasma
- Patent number 9,591,738
- Issue date Mar 7, 2017
- Novellus Systems, Inc.
- Huatan Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra low silicon loss high dose implant strip
- Patent number 9,564,344
- Issue date Feb 7, 2017
- Novellus Systems, Inc.
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Peroxide-vapor treatment for enhancing photoresist-strip performanc...
- Patent number 9,514,954
- Issue date Dec 6, 2016
- Lam Research Corporation
- Bayu Atmaja Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for reducing copper contamination due to substr...
- Patent number 9,397,011
- Issue date Jul 19, 2016
- Lam Research Corporation
- Haoquan Fang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas flow distribution receptacles, plasma generator systems, and me...
- Patent number 9,209,000
- Issue date Dec 8, 2015
- Novellus Systems, Inc.
- Huatan Qiu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Removal of native oxide with high selectivity
- Patent number 9,034,773
- Issue date May 19, 2015
- Novellus Systems, Inc.
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon etch with high selectivity
- Patent number 8,916,477
- Issue date Dec 23, 2014
- Novellus Systems, Inc.
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator apparatus
- Patent number 8,864,935
- Issue date Oct 21, 2014
- Novellus Systems, Inc.
- James A. Fair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced passivation process to protect silicon prior to high dose...
- Patent number 8,721,797
- Issue date May 13, 2014
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma based photoresist removal system for cleaning post ash residue
- Patent number 8,716,143
- Issue date May 6, 2014
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High dose implantation strip (HDIS) in H2 base chemistry
- Patent number 8,641,862
- Issue date Feb 4, 2014
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Low damage photoresist strip method for low-K dielectrics
- Patent number 8,591,661
- Issue date Nov 26, 2013
- Novellus Systems, Inc.
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous front side ash and backside clean
- Patent number 8,444,869
- Issue date May 21, 2013
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Ashing method
- Patent number 8,273,259
- Issue date Sep 25, 2012
- Novellus Systems, Inc.
- Huatan Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High dose implantation strip (HDIS) in H2 base chemistry
- Patent number 8,193,096
- Issue date Jun 5, 2012
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Plasma based photoresist removal system for cleaning post ash residue
- Patent number 8,129,281
- Issue date Mar 6, 2012
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas flow distribution receptacles, plasma generator systems, and me...
- Patent number 8,110,068
- Issue date Feb 7, 2012
- Novellus Systems, Inc.
- Huatan Qiu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Simultaneous front side ash and backside clean
- Patent number 7,740,768
- Issue date Jun 22, 2010
- Novellus Systems, Inc.
- Haruhiro H Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low dielectric constant film produced from silicon compounds compri...
- Patent number 7,651,725
- Issue date Jan 26, 2010
- Applied Materials, Inc.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 7,560,377
- Issue date Jul 14, 2009
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated low k dielectrics and etch stops
- Patent number 7,227,244
- Issue date Jun 5, 2007
- Applied Materials, Inc.
- Claes H. Bjorkman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258129
- Publication date Aug 1, 2024
- Lam Reseach Corporation
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258131
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258130
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20230369076
- Publication date Nov 16, 2023
- LAM RESEARCH CORPORATION
- Dengliang Yang
- B08 - CLEANING
Information Patent Application
METAL DOPED CARBON BASED HARD MASK REMOVAL IN SEMICONDUCTOR FABRICA...
- Publication number 20180358220
- Publication date Dec 13, 2018
- LAM RESEARCH CORPORATION
- Yongsik Yu
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20180174870
- Publication date Jun 21, 2018
- LAM RESEARCH CORPORATION
- Dengliang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DETECTING OXYGEN IN-SITU IN A SUBSTRATE ARE...
- Publication number 20180088031
- Publication date Mar 29, 2018
- LAM RESEARCH CORPORATION
- Dengliang Yang
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING METHOD FOR DEPOSITING A BARRIER LAYER TO PREVE...
- Publication number 20180005819
- Publication date Jan 4, 2018
- LAM RESEARCH CORPORATION
- David Cheung
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PEROXIDE-VAPOR TREATMENT FOR ENHANCING PHOTORESIST-STRIP PERFORMANC...
- Publication number 20150357202
- Publication date Dec 10, 2015
- LAM RESEARCH CORPORATION
- Bayu Atmaja Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP
- Publication number 20150332933
- Publication date Nov 19, 2015
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILICON ETCH WITH HIGH SELECTIVITY
- Publication number 20150075715
- Publication date Mar 19, 2015
- Novellus Systems, Inc.
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR APPARATUS
- Publication number 20150075718
- Publication date Mar 19, 2015
- Novellus Systems, Inc.
- James A. Fair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY
- Publication number 20140182619
- Publication date Jul 3, 2014
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS
- Publication number 20140120733
- Publication date May 1, 2014
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOVAL OF NATIVE OXIDE WITH HIGH SELECTIVITY
- Publication number 20140004708
- Publication date Jan 2, 2014
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYSILICON ETCH WITH HIGH SELECTIVITY
- Publication number 20140004707
- Publication date Jan 2, 2014
- Bayu Thedjoisworo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST STRIP PROCESSES FOR IMPROVED DEVICE INTEGRITY
- Publication number 20130048014
- Publication date Feb 28, 2013
- Roey Shaviv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR APPARATUS
- Publication number 20120247674
- Publication date Oct 4, 2012
- James A. Fair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY
- Publication number 20120211473
- Publication date Aug 23, 2012
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Application
GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND ME...
- Publication number 20120097331
- Publication date Apr 26, 2012
- Novellus Systems, Inc.
- Huatan QIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENHANCED PASSIVATION PROCESS TO PROTECT SILICON PRIOR TO HIGH DOSE...
- Publication number 20110139175
- Publication date Jun 16, 2011
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS
- Publication number 20110139176
- Publication date Jun 16, 2011
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP
- Publication number 20110143548
- Publication date Jun 16, 2011
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA GENERATOR SYSTEMS AND METHODS OF FORMING PLASMA
- Publication number 20090250334
- Publication date Oct 8, 2009
- Novellus Systems, Inc.
- Huatan Qiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND ME...
- Publication number 20090236313
- Publication date Sep 24, 2009
- Novellus Systems, Inc.
- Huatan QIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Enhanced stripping of low-K films using downstream gas mixing
- Publication number 20090056875
- Publication date Mar 5, 2009
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Application
HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY
- Publication number 20090053901
- Publication date Feb 26, 2009
- NOVELLUS SYSTEMS INC.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHODS UTILIZING ORGANOSILICON COMPOUNDS FOR MANUFACTURING PRE-SEA...
- Publication number 20080216302
- Publication date Sep 11, 2008
- Novellus Systems, Inc.
- David CHEUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Reaction Apparatus Having Pre-Seasoned Showerheads and Metho...
- Publication number 20080216958
- Publication date Sep 11, 2008
- Novellus Systems, Inc.
- Haruhiro Harry GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Generator Apparatus
- Publication number 20080156264
- Publication date Jul 3, 2008
- Novellus Systems, Inc.
- James A. Fair
- H01 - BASIC ELECTRIC ELEMENTS

David Cheung

Person

Patents Grantslast 30 patents

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Metal doped carbon based hard mask removal in semiconductor fabrica...

Systems and methods for detecting oxygen in-situ in a substrate are...

Substrate processing method for depositing a barrier layer to preve...

High dose implantation strip (HDIS) in H2 base chemistry

Photoresist strip processes for improved device integrity

Plasma generator systems and methods of forming plasma

Ultra low silicon loss high dose implant strip

Peroxide-vapor treatment for enhancing photoresist-strip performanc...

Systems and methods for reducing copper contamination due to substr...

Gas flow distribution receptacles, plasma generator systems, and me...

Removal of native oxide with high selectivity

Polysilicon etch with high selectivity

Plasma generator apparatus

Enhanced passivation process to protect silicon prior to high dose...

Plasma based photoresist removal system for cleaning post ash residue

High dose implantation strip (HDIS) in H2 base chemistry

Low damage photoresist strip method for low-K dielectrics

Simultaneous front side ash and backside clean

Ashing method

High dose implantation strip (HDIS) in H2 base chemistry

Plasma based photoresist removal system for cleaning post ash residue

Gas flow distribution receptacles, plasma generator systems, and me...

Simultaneous front side ash and backside clean

Low dielectric constant film produced from silicon compounds compri...

Plasma processes for depositing low dielectric constant films

Integrated low k dielectrics and etch stops

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

METAL DOPED CARBON BASED HARD MASK REMOVAL IN SEMICONDUCTOR FABRICA...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR DETECTING OXYGEN IN-SITU IN A SUBSTRATE ARE...

SUBSTRATE PROCESSING METHOD FOR DEPOSITING A BARRIER LAYER TO PREVE...

PEROXIDE-VAPOR TREATMENT FOR ENHANCING PHOTORESIST-STRIP PERFORMANC...

ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP

POLYSILICON ETCH WITH HIGH SELECTIVITY

PLASMA GENERATOR APPARATUS

HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY

LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS

REMOVAL OF NATIVE OXIDE WITH HIGH SELECTIVITY

POLYSILICON ETCH WITH HIGH SELECTIVITY

PHOTORESIST STRIP PROCESSES FOR IMPROVED DEVICE INTEGRITY

PLASMA GENERATOR APPARATUS

HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY

GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND ME...

ENHANCED PASSIVATION PROCESS TO PROTECT SILICON PRIOR TO HIGH DOSE...

LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS

ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP

PLASMA GENERATOR SYSTEMS AND METHODS OF FORMING PLASMA

GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND ME...

Enhanced stripping of low-K films using downstream gas mixing

HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY

METHODS UTILIZING ORGANOSILICON COMPOUNDS FOR MANUFACTURING PRE-SEA...

Plasma Reaction Apparatus Having Pre-Seasoned Showerheads and Metho...

Plasma Generator Apparatus