David E. Kotecki

Person

Hopewell Junction, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Contact plug formation for devices with stacked capacitors
- Patent number 6,753,252
- Issue date Jun 22, 2004
- Infineon Technologies AG
- Youngjin Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a dual-diameter electrical conductor
- Patent number 6,727,174
- Issue date Apr 27, 2004
- International Business Machines Corporation
- David Edward Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a stack capacitor DRAM
- Patent number 6,544,832
- Issue date Apr 8, 2003
- International Business Machines Corporation
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage-capacitor electrode and interconnect
- Patent number 6,429,474
- Issue date Aug 6, 2002
- International Business Machines Corporation
- Jeffrey P. Gambino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removal of hard mask used to define noble metal electrode
- Patent number 6,420,272
- Issue date Jul 16, 2002
- Infineon Technologies A G
- Hua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for simultaneously forming a storage-capacitor electrode and...
- Patent number 6,395,594
- Issue date May 28, 2002
- International Business Machines Corporation
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen peroxide and acid etchant for a wet etch process
- Patent number 6,379,577
- Issue date Apr 30, 2002
- International Business Machines Corporation
- Hiroyuki Akatsu
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Semiconductor structure and manufacturing method
- Patent number 6,365,328
- Issue date Apr 2, 2002
- Infineon Technologies North America Corp.
- Hua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Retrograde openings in thin films
- Patent number 6,355,567
- Issue date Mar 12, 2002
- International Business Machines Corporation
- Scott D. Halle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor stack structure and method of fabricating description
- Patent number 6,339,007
- Issue date Jan 15, 2002
- International Business Machines Corporation
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor formed with Pt electrodes having a 3D cup-like shape with...
- Patent number 6,323,127
- Issue date Nov 27, 2001
- International Business Machines Corporation
- Panayotis Andricacos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overhanging separator for self-defining stacked capacitor
- Patent number 6,268,259
- Issue date Jul 31, 2001
- International Business Machines Corporation
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DRAM stack capacitor with vias and conductive connection extending...
- Patent number 6,262,450
- Issue date Jul 17, 2001
- International Business Machines Corporation
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Easy to remove hard mask layer for semiconductor device fabrication
- Patent number 6,261,967
- Issue date Jul 17, 2001
- Infineon Technologies North America Corp.
- Satish D. Athavale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a ferroelectric capacitor under the bit line
- Patent number 6,255,157
- Issue date Jul 3, 2001
- International Business Machines Corporation
- Louis L. Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and fabrication method for non-planar memory elements
- Patent number 6,242,321
- Issue date Jun 5, 2001
- International Business Machines Corporation
- Raul Edmundo Acosta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Crown capacitor using a tapered etch of a damascene lower electrode
- Patent number 6,222,219
- Issue date Apr 24, 2001
- International Business Machines Corporation
- Jeffrey P. Gambino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High dielectric constant material deposition to achieve high capaci...
- Patent number 6,207,584
- Issue date Mar 27, 2001
- International Business Machines Corp.
- Hua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for simultaneously forming a storage-capacitor electrode and...
- Patent number 6,201,272
- Issue date Mar 13, 2001
- International Business Machines Corporation
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overhanging separator for self-defining discontinuous film
- Patent number 6,191,469
- Issue date Feb 20, 2001
- International Business Machines Corporation
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature, conductive thin film diffusion barrier for cerami...
- Patent number 6,178,082
- Issue date Jan 23, 2001
- International Business Machines Corporation
- Mukta S. Farooq
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit having a via and a capacitor
- Patent number 6,166,423
- Issue date Dec 26, 2000
- International Business Machines Corporation
- Jeffrey P. Gambino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tapered electrode for stacked capacitors
- Patent number 6,165,864
- Issue date Dec 26, 2000
- Siemens Aktiengesellschaft
- Hua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overhanging separator for self-defining discontinuous film
- Patent number 6,153,491
- Issue date Nov 28, 2000
- International Business Machines Corporation
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench separator for self-defining discontinuous film
- Patent number 6,150,230
- Issue date Nov 21, 2000
- International Business Machines Corporation
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filling of high aspect ratio trench isolation
- Patent number 6,136,664
- Issue date Oct 24, 2000
- International Business Machines Corporation
- Laertis Economikos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sidewall capacitor with L-shaped dielectric
- Patent number 6,131,258
- Issue date Oct 17, 2000
- International Business Machines Corporation
- Katherine Lynn Saenger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for simultaneously forming a storage-capacitor electrode and...
- Patent number 6,124,199
- Issue date Sep 26, 2000
- International Business Machines Corporation
- Jeffrey P. Gambino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning the surface of a dielectric
- Patent number 6,054,328
- Issue date Apr 25, 2000
- International Business Machines Corporation
- Peter R. Duncombe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolated sidewall capacitor
- Patent number 6,027,966
- Issue date Feb 22, 2000
- International Business Machines Corporation
- Katherine Lynn Saenger
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for forming a (111) oriented BSTO thin film layer for high d...
- Publication number 20050196917
- Publication date Sep 8, 2005
- Jingyu Lian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact plug formation for devices with stacked capacitors
- Publication number 20020173094
- Publication date Nov 21, 2002
- Youngjin Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for simultaneously forming a storage-capacitor electrode and...
- Publication number 20010050385
- Publication date Dec 13, 2001
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN PEROXIDE AND ACID ETCHANT FOR A WET ETCH PROCESS
- Publication number 20010037995
- Publication date Nov 8, 2001
- HIROYUKI AKATSU
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Method of fabricating a stack capacitor DRAM
- Publication number 20010035551
- Publication date Nov 1, 2001
- David E. Kotecki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for preparing the surface of a dielectric
- Publication number 20010016226
- Publication date Aug 23, 2001
- International Business Machines Corporation
- Wesley Natzle
- H01 - BASIC ELECTRIC ELEMENTS

David E. Kotecki

Person

Patents Grantslast 30 patents

Contact plug formation for devices with stacked capacitors

Method for fabricating a dual-diameter electrical conductor

Method of fabricating a stack capacitor DRAM

Storage-capacitor electrode and interconnect

Method for removal of hard mask used to define noble metal electrode

Method for simultaneously forming a storage-capacitor electrode and...

Hydrogen peroxide and acid etchant for a wet etch process

Semiconductor structure and manufacturing method

Retrograde openings in thin films

Capacitor stack structure and method of fabricating description

Capacitor formed with Pt electrodes having a 3D cup-like shape with...

Overhanging separator for self-defining stacked capacitor

DRAM stack capacitor with vias and conductive connection extending...

Easy to remove hard mask layer for semiconductor device fabrication

Method for forming a ferroelectric capacitor under the bit line

Structure and fabrication method for non-planar memory elements

Crown capacitor using a tapered etch of a damascene lower electrode

High dielectric constant material deposition to achieve high capaci...

Method for simultaneously forming a storage-capacitor electrode and...

Overhanging separator for self-defining discontinuous film

High temperature, conductive thin film diffusion barrier for cerami...

Integrated circuit having a via and a capacitor

Tapered electrode for stacked capacitors

Overhanging separator for self-defining discontinuous film

Trench separator for self-defining discontinuous film

Filling of high aspect ratio trench isolation

Sidewall capacitor with L-shaped dielectric

Method for simultaneously forming a storage-capacitor electrode and...

Method for cleaning the surface of a dielectric

Isolated sidewall capacitor

Patents Applicationslast 30 patents

Method for forming a (111) oriented BSTO thin film layer for high d...

Contact plug formation for devices with stacked capacitors

Method for simultaneously forming a storage-capacitor electrode and...

HYDROGEN PEROXIDE AND ACID ETCHANT FOR A WET ETCH PROCESS

Method of fabricating a stack capacitor DRAM

Method for preparing the surface of a dielectric