Etsuko Iguchi

Person

Machida, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Protective coating composition for dual damascene process
- Patent number 6,734,258
- Issue date May 11, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for filling fine hole
- Patent number 6,693,049
- Issue date Feb 17, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-reflective coating composition, multilayer photoresist materia...
- Patent number 6,689,535
- Issue date Feb 10, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a finely patterned photoresist layer
- Patent number 6,599,682
- Issue date Jul 29, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Undercoating composition for photolithographic resist
- Patent number 6,544,717
- Issue date Apr 8, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Hirosaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Electric wiring forming method with use of embedding material
- Patent number 6,319,815
- Issue date Nov 20, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the formation of a planarizing coating film on substrate...
- Patent number 6,297,174
- Issue date Oct 2, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Undercoating composition for photolithographic resist
- Patent number 6,284,428
- Issue date Sep 4, 2001
- Tokyo Ohka Kogyo Co., Ltd,
- Takako Hirosaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming antireflective coating film and method for...
- Patent number 6,268,108
- Issue date Jul 31, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 6,159,652
- Issue date Dec 12, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithographic resist
- Patent number 6,087,068
- Issue date Jul 11, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist laminate and method for patterning using the same
- Patent number 6,083,665
- Issue date Jul 4, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the formation of resist pattern
- Patent number 6,071,673
- Issue date Jun 6, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-amplification-type negative resist composition
- Patent number 6,042,988
- Issue date Mar 28, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithographic patterning
- Patent number 5,948,847
- Issue date Sep 7, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithographic resist
- Patent number 5,939,510
- Issue date Aug 17, 1999
- Tokyo Ohka Kogya Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist laminate and method for patterning using the same
- Patent number 5,925,495
- Issue date Jul 20, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithography
- Patent number 5,908,738
- Issue date Jun 1, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the production of polyhydroxstyrene
- Patent number 5,854,357
- Issue date Dec 29, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 5,789,136
- Issue date Aug 4, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithography
- Patent number 5,756,255
- Issue date May 26, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition comprising a mixture of two polyhydroxy...
- Patent number 5,736,296
- Issue date Apr 7, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 5,700,625
- Issue date Dec 23, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method for filling fine hole
- Publication number 20030032280
- Publication date Feb 13, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Protective coating composition for dual damascene process
- Publication number 20020077426
- Publication date Jun 20, 2002
- Etsuko Iguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Anti-reflective coating composition, multilayer photoresist materia...
- Publication number 20020055064
- Publication date May 9, 2002
- Etsuko Iguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Undercoating composition for photolithographic resist
- Publication number 20010049072
- Publication date Dec 6, 2001
- Takako Hirosaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method for forming a finely patterned photoresist layer
- Publication number 20010044080
- Publication date Nov 22, 2001
- Etsuko Iguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Undercoating composition for photolithographic resist
- Publication number 20010018163
- Publication date Aug 30, 2001
- Takako Hirosaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method for the formation of a planarizing coating film on substrate...
- Publication number 20010003068
- Publication date Jun 7, 2001
- Etsuko Iguchi
- H01 - BASIC ELECTRIC ELEMENTS

Etsuko Iguchi

Person

Patents Grantslast 30 patents

Protective coating composition for dual damascene process

Method for filling fine hole

Anti-reflective coating composition, multilayer photoresist materia...

Method for forming a finely patterned photoresist layer

Undercoating composition for photolithographic resist

Electric wiring forming method with use of embedding material

Method for the formation of a planarizing coating film on substrate...

Undercoating composition for photolithographic resist

Composition for forming antireflective coating film and method for...

Positive resist composition

Undercoating composition for photolithographic resist

Photoresist laminate and method for patterning using the same

Method for the formation of resist pattern

Chemical-amplification-type negative resist composition

Undercoating composition for photolithographic patterning

Undercoating composition for photolithographic resist

Photoresist laminate and method for patterning using the same

Undercoating composition for photolithography

Process for the production of polyhydroxstyrene

Negative-working photoresist composition

Undercoating composition for photolithography

Positive resist composition comprising a mixture of two polyhydroxy...

Negative-working photoresist composition

Patents Applicationslast 30 patents

Method for filling fine hole

Protective coating composition for dual damascene process

Anti-reflective coating composition, multilayer photoresist materia...

Undercoating composition for photolithographic resist

Method for forming a finely patterned photoresist layer

Undercoating composition for photolithographic resist

Method for the formation of a planarizing coating film on substrate...