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Gerald Yin
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San Jose, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Integrated low k dielectrics and etch stops
Patent number
7,227,244
Issue date
Jun 5, 2007
Applied Materials, Inc.
Claes H. Bjorkman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma reactor with overhead RF electrode tuned to the plasma with...
Patent number
7,030,335
Issue date
Apr 18, 2006
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
System level in-situ integrated dielectric etch process particularl...
Patent number
6,949,203
Issue date
Sep 27, 2005
Applied Materials, Inc.
Chang-Lin Hsieh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Integrated low K dielectrics and etch stops
Patent number
6,858,153
Issue date
Feb 22, 2005
Applied Materials Inc.
Claes H. Bjorkman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Highly selective process for etching oxide over nitride using hexaf...
Patent number
6,849,193
Issue date
Feb 1, 2005
Hoiman Hung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with overhead RF electrode tuned to the plasma
Patent number
6,838,635
Issue date
Jan 4, 2005
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
System level in-situ integrated dielectric etch process particularl...
Patent number
6,793,835
Issue date
Sep 21, 2004
Lee Luo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Self-cleaning etch process
Patent number
6,699,399
Issue date
Mar 2, 2004
Applied Materials, Inc.
Xue-Yu Qian
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Integrated low k dielectrics and etch stops
Patent number
6,669,858
Issue date
Dec 30, 2003
Applied Materials Inc.
Claes H. Bjorkman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Highly selective oxide etch process using hexafluorobutadiene
Patent number
6,613,691
Issue date
Sep 2, 2003
Applied Materials, Inc.
Raymond Hung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process for etching oxide using hexafluorobutadiene or related fluo...
Patent number
6,602,434
Issue date
Aug 5, 2003
Applied Materials, Inc.
Hoiman (Raymond) Hung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with overhead RF electrode tuned to the plasma
Patent number
6,528,751
Issue date
Mar 4, 2003
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor using inductive RF coupling, and processes
Patent number
6,518,195
Issue date
Feb 11, 2003
Applied Materials, Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Magnetically enhanced inductively coupled plasma reactor with magne...
Patent number
6,503,367
Issue date
Jan 7, 2003
Applied Materials Inc.
Peter K. Loewenhardt
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
System level in-situ integrated dielectric etch process particularl...
Patent number
6,500,357
Issue date
Dec 31, 2002
Applied Materials Inc.
Lee Luo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etched patterned copper features free from etch process residue
Patent number
6,488,862
Issue date
Dec 3, 2002
Applied Materials Inc.
Yan Ye
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Magnetic confinement in a plasma reactor having an RF bias electrode
Patent number
6,488,807
Issue date
Dec 3, 2002
Applied Materials, Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
RF plasma reactor with hybrid conductor and multi-radius dome ceiling
Patent number
6,475,335
Issue date
Nov 5, 2002
Applied Materials, Inc.
Gerald Yin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Magnetically enhanced inductively coupled plasma reactor with magne...
Patent number
6,471,822
Issue date
Oct 29, 2002
Applied Materials, Inc.
Gerald Yin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Inductively coupled RF Plasma reactor having an overhead solenoidal...
Patent number
6,454,898
Issue date
Sep 24, 2002
Applied Materials, Inc.
Kenneth Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
Patent number
6,440,866
Issue date
Aug 27, 2002
Applied Materials, Inc.
Kenneth S. Collins
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Magnetically enhanced inductively coupled plasma reactor with magne...
Patent number
6,402,885
Issue date
Jun 11, 2002
Applied Materials, Inc.
Peter K. Loewenhardt
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process for etching oxide using a hexafluorobutadiene and manifesti...
Patent number
6,387,287
Issue date
May 14, 2002
Applied Materials, Inc.
Hoiman Hung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Treatment of etching chambers using activated cleaning gas
Patent number
6,379,575
Issue date
Apr 30, 2002
Applied Materials, Inc.
Gerald Zheyao Yin
B08 - CLEANING
Information
Patent Grant
Plasma process for selectively etching oxide using fluoropropane or...
Patent number
6,361,705
Issue date
Mar 26, 2002
Applied Materials, Inc.
Ruiping Wang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma assisted processing chamber with separate control of species...
Patent number
6,352,049
Issue date
Mar 5, 2002
Applied Materials, Inc.
Gerald Yin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Integrated low K dielectrics and etch stops
Patent number
6,340,435
Issue date
Jan 22, 2002
Applied Materials, Inc.
Claes H. Bjorkman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Inductively coupled parallel-plate plasma reactor with a conical dome
Patent number
6,308,654
Issue date
Oct 30, 2001
Applied Materials, Inc.
Gerhard Schneider
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
RF plasma reactor with hybrid conductor and multi-radius dome ceiling
Patent number
6,270,617
Issue date
Aug 7, 2001
Applied Materials, Inc.
Gerald Yin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
RF plasma method
Patent number
6,270,687
Issue date
Aug 7, 2001
Applied Materials, Inc.
Yan Ye
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Integrated low k dielectrics and etch stops
Publication number
20050023694
Publication date
Feb 3, 2005
Claes H. Bjorkman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Coated silicon carbide cermet used in a plasma reactor
Publication number
20030198749
Publication date
Oct 23, 2003
APPLIED MATERIALS, INC.
Ananda H. Kumar
C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information
Patent Application
System level in-situ integrated dielectric etch process particularl...
Publication number
20030164354
Publication date
Sep 4, 2003
Applied Materials, Inc.
Chang-Lin Hsieh
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor with overhead RF electrode tuned to the plasma
Publication number
20030062344
Publication date
Apr 3, 2003
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
System level in-situ integrated dielectric etch process particularl...
Publication number
20030057179
Publication date
Mar 27, 2003
Applied Materials, Inc.
Lee Luo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Highly selective process for etching oxide over nitride using hexaf...
Publication number
20030000913
Publication date
Jan 2, 2003
Hoiman Hung
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor with overhead RF electrode tuned to the plasma with...
Publication number
20020108933
Publication date
Aug 15, 2002
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Intergrated low k dielectrics and etch stops
Publication number
20020084257
Publication date
Jul 4, 2002
APPLIED MATERIALS, INC.
Claes H. Bjorkman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Integrated low k dielectrics and etch stops
Publication number
20020074309
Publication date
Jun 20, 2002
APPLIED MATERIALS, INC.
Claes H. Bjorkman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Magnetically enhanced inductively coupled plasma reactor with magne...
Publication number
20010004920
Publication date
Jun 28, 2001
APPLIED MATERIALS, INC.
Peter K. Loewenhardt
H01 - BASIC ELECTRIC ELEMENTS