Gerhard Buhr

Person

Konigstein, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive mixture
- Patent number 5,998,567
- Issue date Dec 7, 1999
- Clariant GmbH
- Mathias Eichhorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,879,852
- Issue date Mar 9, 1999
- AGFA-Gevaert A.G.
- Mathias Eichhorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
2-acylamino-9-arylacridines, process for their preparation and phot...
- Patent number 5,834,157
- Issue date Nov 10, 1998
- AGFA-Gevaert A.G.
- Siegfried Scheler
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Aromatic hexafluoropropanesulfonate diazonium salts and their use i...
- Patent number 5,776,652
- Issue date Jul 7, 1998
- AGFA-Gevaert A.G.
- Mathias Eichhorn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working recording material containing aluminum base and ma...
- Patent number 5,753,405
- Issue date May 19, 1998
- AGFA-Gevaert A.G.
- Andreas Elsaesser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the production of a multicolored image and photosensiti...
- Patent number 5,725,992
- Issue date Mar 10, 1998
- AGFA-Gevaert A.G.
- Stephan J. W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive mixture
- Patent number 5,705,317
- Issue date Jan 6, 1998
- AGFA-Gevaert A.G.
- Mathias Eichhorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the production of a multicolored image and photosensiti...
- Patent number 5,693,449
- Issue date Dec 2, 1997
- AGFA-Gevaert A.G.
- Stephan J. W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,654,121
- Issue date Aug 5, 1997
- AGFA-Gevaert A.G.
- Mathias Eichhorn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
N,N-disubstituted sulfonamides and radiation-sensitive mixture prep...
- Patent number 5,612,169
- Issue date Mar 18, 1997
- Hoechst Aktiengesellschaft
- Mathias Eichhorn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sens...
- Patent number 5,563,018
- Issue date Oct 8, 1996
- Hoechst Aktiengesellschaft
- Gerhard Buhr
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Peel-apart process for the production of a colored image and imaged...
- Patent number 5,534,373
- Issue date Jul 9, 1996
- AGFA-Gevaert A.G.
- Stephan J. W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive material for the production of a colored image utili...
- Patent number 5,529,883
- Issue date Jun 25, 1996
- Hoechst Aktiengesellschaft
- Stephan J. W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers having N,N-disubstituted sulfonamide pendent groups and us...
- Patent number 5,529,886
- Issue date Jun 25, 1996
- Hoechst Aktiengesellschaft
- Mathias Eichhorn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-acting radiation-sensitive mixture and recording material...
- Patent number 5,498,506
- Issue date Mar 12, 1996
- Hoechst Aktiengesellschaft
- Horst Wengenroth
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers having N,N-disubstituted sulfonamide pendent groups and us...
- Patent number 5,442,087
- Issue date Aug 15, 1995
- Hoechst Aktiengesellschaft
- Mathias Eichhorn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfo...
- Patent number 5,413,899
- Issue date May 9, 1995
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing organic compounds carrying tert-butyloxycarbo...
- Patent number 5,397,846
- Issue date Mar 14, 1995
- Hoechst Aktiengesellschaft
- Mathias Eichhorn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photopolymerizable material and process for the production of a col...
- Patent number 5,374,184
- Issue date Dec 20, 1994
- Hoeschst Aktiengesellschaft
- Stephan J. W. Platzer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working 1,2-quinone diazide radiation-sensitive mixture an...
- Patent number 5,368,975
- Issue date Nov 29, 1994
- Hoechst Aktiengesellschaft
- Andreas Elsaessser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition containing naphthoquinone diazide sulfonic acid mixed e...
- Patent number 5,306,595
- Issue date Apr 26, 1994
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer composition for irradiated, radiation-sensitive positive-...
- Patent number 5,292,626
- Issue date Mar 8, 1994
- Hoechst Aktiengesellschaft
- Gerhard Buhr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive ester and process for its preparation
- Patent number 5,268,252
- Issue date Dec 7, 1993
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Binders soluble in aqueous alkali and containing silanyl groups in...
- Patent number 5,206,111
- Issue date Apr 27, 1993
- Hoechst Aktiengesellschaft
- Peter Wilharm
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photopolymerizable mixture, copying material containing same and pr...
- Patent number 5,198,325
- Issue date Mar 30, 1993
- Hoechst Aktiengesellschaft
- Bernd Hupfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulf...
- Patent number 5,192,640
- Issue date Mar 9, 1993
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitiv...
- Patent number 5,162,190
- Issue date Nov 10, 1992
- Hoechst Aktiengesellschaft
- Wolfgang Zahn
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive compounds, radiation-sensitive mixture prepared...
- Patent number 5,114,816
- Issue date May 19, 1992
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and proce...
- Patent number 5,077,395
- Issue date Dec 31, 1991
- Hoechst Aktiengesellschaft
- Siegfried Scheler
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Image reversal process utilizing a positive-working photosensitive...
- Patent number 5,066,567
- Issue date Nov 19, 1991
- Hoechst Aktiengesellschaft
- Hans-Joachim Merrem
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Gerhard Buhr

Person

Patents Grantslast 30 patents

Radiation-sensitive mixture

Positive-working radiation-sensitive mixture

2-acylamino-9-arylacridines, process for their preparation and phot...

Aromatic hexafluoropropanesulfonate diazonium salts and their use i...

Positive-working recording material containing aluminum base and ma...

Process for the production of a multicolored image and photosensiti...

Radiation-sensitive mixture

Process for the production of a multicolored image and photosensiti...

Positive-working radiation-sensitive mixture

N,N-disubstituted sulfonamides and radiation-sensitive mixture prep...

(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sens...

Peel-apart process for the production of a colored image and imaged...

Photosensitive material for the production of a colored image utili...

Polymers having N,N-disubstituted sulfonamide pendent groups and us...

Positive-acting radiation-sensitive mixture and recording material...

Polymers having N,N-disubstituted sulfonamide pendent groups and us...

Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfo...

Process for preparing organic compounds carrying tert-butyloxycarbo...

Photopolymerizable material and process for the production of a col...

Positive-working 1,2-quinone diazide radiation-sensitive mixture an...

Composition containing naphthoquinone diazide sulfonic acid mixed e...

Developer composition for irradiated, radiation-sensitive positive-...

Radiation-sensitive ester and process for its preparation

Binders soluble in aqueous alkali and containing silanyl groups in...

Photopolymerizable mixture, copying material containing same and pr...

Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulf...

1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitiv...

Radiation-sensitive compounds, radiation-sensitive mixture prepared...

Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and proce...

Image reversal process utilizing a positive-working photosensitive...