Guoqiang Xing

Person

Dallas, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated circuit and method
- Patent number 7,361,599
- Issue date Apr 22, 2008
- Texas Instruments Incorporated
- Theodore S. Moise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for photoresist strip, sidewall polymer removal and passivat...
- Patent number 6,958,294
- Issue date Oct 25, 2005
- Texas Instruments Incorporated
- Patricia B. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit and method
- Patent number 6,902,939
- Issue date Jun 7, 2005
- Texas Instruments Incorporated
- Theodore S. Moise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process flow for dual damescene interconnect structures
- Patent number 6,872,665
- Issue date Mar 29, 2005
- Texas Instruments Incorporated
- Francis G. Celii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric capacitor plasma charging monitor
- Patent number 6,806,101
- Issue date Oct 19, 2004
- Texas Instruments Incorporated
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-etch cleaning treatment
- Patent number 6,692,976
- Issue date Feb 17, 2004
- Agilent Technologies, Inc.
- Laura Wills Mirkarimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment of low-k dielectric films to improve patterning
- Patent number 6,620,560
- Issue date Sep 16, 2003
- Texax Instruments Incorporated
- Ping Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment of low-k dielectric films to enable patterning of deep su...
- Patent number 6,605,536
- Issue date Aug 12, 2003
- Texas Instruments Incorporated
- Mona Eissa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for photoresist strip, sidewall polymer removal and passivat...
- Patent number 6,599,829
- Issue date Jul 29, 2003
- Texas Instruments Incorporated
- Patricia B. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric capacitor plasma charging monitor
- Patent number 6,576,922
- Issue date Jun 10, 2003
- Texas Instruments Incorporated
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using a carbon film as an etch hardmask for hard-to-etch materials
- Patent number 6,573,167
- Issue date Jun 3, 2003
- Texas Instruments Incorporated
- Guoqiang Xing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming integrated circuit capacitor and memory
- Patent number 6,555,431
- Issue date Apr 29, 2003
- Texas Instruments Incorporated
- Guoqiang Xing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a ferroelectric memory cell
- Patent number 6,548,343
- Issue date Apr 15, 2003
- Agilent Technologies Texas Instruments Incorporated
- Scott R. Summerfelt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardmask designs for dry etching FeRAM capacitor stacks
- Patent number 6,534,809
- Issue date Mar 18, 2003
- Agilent Technologies, Inc.
- Theodore Moise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of dry etching PZT capacitor stack to form high-density ferr...
- Patent number 6,492,222
- Issue date Dec 10, 2002
- Texas Instruments Incorporated
- Guoqiang Xing
- G11 - INFORMATION STORAGE
Information Patent Grant
Hydrogen-free contact etch for ferroelectric capacitor formation
- Patent number 6,485,988
- Issue date Nov 26, 2002
- Texas Instruments Incorporated
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit and method
- Patent number 6,444,542
- Issue date Sep 3, 2002
- Texas Instruments Incorporated
- Theodore S. Moise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration of fluorinated dielectrics in multi-level metallizations
- Patent number 6,424,040
- Issue date Jul 23, 2002
- Texas Instruments Incorporated
- Somnath S. Nag
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damascene cap layer process for integrated circuit interconnects
- Patent number 6,410,426
- Issue date Jun 25, 2002
- Texas Instruments Incorporated
- Guoqiang Xing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit and method
- Patent number 6,211,035
- Issue date Apr 3, 2001
- Texas Instruments Incorporated
- Theodore S. Moise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing recess for the formation of local interconnect...
- Patent number 6,194,313
- Issue date Feb 27, 2001
- Texas Instruments Incorporated
- Abha R. Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming high-density integrated circuit capacitors
- Patent number 6,171,970
- Issue date Jan 9, 2001
- Texas Instruments Incorporated
- Guoqiang Xing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming integrated circuit capacitor and memory
- Patent number 6,153,490
- Issue date Nov 28, 2000
- Texas Instruments Incorporated
- Guoqiang Xing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etchstop for integrated circuits
- Patent number 6,090,697
- Issue date Jul 18, 2000
- Texas Instruments Incorporated
- Guoqiang Xing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for air gap formation by plasma treatment of aluminum interc...
- Patent number 5,880,026
- Issue date Mar 9, 1999
- Texas Instruments Incorporated
- Guoqiang Xing
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Integrated circuit and method
- Publication number 20050227378
- Publication date Oct 13, 2005
- Theodore S. Moise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for photoresist strip, sidewall polymer removal and passivat...
- Publication number 20030207563
- Publication date Nov 6, 2003
- Patricia B. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for photoresist strip, sidewall polymer removal and passivat...
- Publication number 20030203642
- Publication date Oct 30, 2003
- Patricia B. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ferroelectric capacitor plasma charging monitor
- Publication number 20030197167
- Publication date Oct 23, 2003
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FERROELECTRIC CAPACITOR PLASMA CHARGING MONITOR
- Publication number 20030116761
- Publication date Jun 26, 2003
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated circuit and method
- Publication number 20030068846
- Publication date Apr 10, 2003
- Theodore S. Moise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual hardmask process for the formation of copper/low-k interconnects
- Publication number 20030008490
- Publication date Jan 9, 2003
- Guoqiang Xing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for photoresist strip, sidewall polymer removal and passivat...
- Publication number 20020127840
- Publication date Sep 12, 2002
- Patricia B. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treatment of low-k dielectric films to enable patterning of deep su...
- Publication number 20020127876
- Publication date Sep 12, 2002
- Mona Eissa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma treatment of low-k dielectric films to improve patterning
- Publication number 20020090822
- Publication date Jul 11, 2002
- Ping Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treatment of low-k dielectric films to enable patterning of deep su...
- Publication number 20020064951
- Publication date May 30, 2002
- Mona M. Eissa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Using a carbon film as an etch hardmask for hard-to-etch materials
- Publication number 20020037637
- Publication date Mar 28, 2002
- Guoqiang Xing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hydrogen-free contact etch for ferroelectric capacitor formation
- Publication number 20020006674
- Publication date Jan 17, 2002
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated circuit and method
- Publication number 20010055852
- Publication date Dec 27, 2001
- Theodore S. Moise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hardmask designs for dry etching FeRAM capacitor stacks
- Publication number 20010034106
- Publication date Oct 25, 2001
- Theodore Moise
- H01 - BASIC ELECTRIC ELEMENTS

Guoqiang Xing

Person

Patents Grantslast 30 patents

Integrated circuit and method

Method for photoresist strip, sidewall polymer removal and passivat...

Integrated circuit and method

Process flow for dual damescene interconnect structures

Ferroelectric capacitor plasma charging monitor

Post-etch cleaning treatment

Plasma treatment of low-k dielectric films to improve patterning

Treatment of low-k dielectric films to enable patterning of deep su...

Method for photoresist strip, sidewall polymer removal and passivat...

Ferroelectric capacitor plasma charging monitor

Using a carbon film as an etch hardmask for hard-to-etch materials

Method for forming integrated circuit capacitor and memory

Method of fabricating a ferroelectric memory cell

Hardmask designs for dry etching FeRAM capacitor stacks

Method of dry etching PZT capacitor stack to form high-density ferr...

Hydrogen-free contact etch for ferroelectric capacitor formation

Integrated circuit and method

Integration of fluorinated dielectrics in multi-level metallizations

Damascene cap layer process for integrated circuit interconnects

Integrated circuit and method

Method for reducing recess for the formation of local interconnect...

Method for forming high-density integrated circuit capacitors

Method for forming integrated circuit capacitor and memory

Etchstop for integrated circuits

Method for air gap formation by plasma treatment of aluminum interc...

Patents Applicationslast 30 patents

Integrated circuit and method

Method for photoresist strip, sidewall polymer removal and passivat...

Method for photoresist strip, sidewall polymer removal and passivat...

Ferroelectric capacitor plasma charging monitor

FERROELECTRIC CAPACITOR PLASMA CHARGING MONITOR

Integrated circuit and method

Dual hardmask process for the formation of copper/low-k interconnects

Method for photoresist strip, sidewall polymer removal and passivat...

Treatment of low-k dielectric films to enable patterning of deep su...

Plasma treatment of low-k dielectric films to improve patterning

Treatment of low-k dielectric films to enable patterning of deep su...

Using a carbon film as an etch hardmask for hard-to-etch materials

Hydrogen-free contact etch for ferroelectric capacitor formation

Integrated circuit and method

Hardmask designs for dry etching FeRAM capacitor stacks