Haruhiro Harry Goto

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High dose implantation strip (HDIS) in H2 base chemistry
- Patent number 9,941,108
- Issue date Apr 10, 2018
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Methods for stripping photoresist and/or cleaning metal regions
- Patent number 9,373,497
- Issue date Jun 21, 2016
- Novellus Systems, Inc.
- David Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High dose implantation strip (HDIS) in H2 base chemistry
- Patent number 8,641,862
- Issue date Feb 4, 2014
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Simultaneous front side ash and backside clean
- Patent number 8,444,869
- Issue date May 21, 2013
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Methods for stripping photoresist and/or cleaning metal regions
- Patent number 8,435,895
- Issue date May 7, 2013
- Novellus Systems, Inc.
- David Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High dose implantation strip (HDIS) in H2 base chemistry
- Patent number 8,193,096
- Issue date Jun 5, 2012
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Photoresist strip method for low-k dielectrics
- Patent number 8,058,178
- Issue date Nov 15, 2011
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous front side ash and backside clean
- Patent number 7,740,768
- Issue date Jun 22, 2010
- Novellus Systems, Inc.
- Haruhiro H Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist strip method for low-k dielectrics
- Patent number 7,585,777
- Issue date Sep 8, 2009
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist strip method for low-k dielectrics
- Patent number 7,288,484
- Issue date Oct 30, 2007
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced stripping of low-k films using downstream gas mixing
- Patent number 7,202,176
- Issue date Apr 10, 2007
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for gas distribution in a dry etch process
- Patent number 7,105,100
- Issue date Sep 12, 2006
- Applied Materials, Inc.
- Haruhiro H. Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine process for cleaning semiconductor process chamber
- Patent number 6,880,561
- Issue date Apr 19, 2005
- Applied Materials, Inc.
- Haruhiro Harry Goto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selectively etching silicon using fluorine without plasma
- Patent number 6,500,356
- Issue date Dec 31, 2002
- Applied Materials, Inc.
- Haruhiro Harry Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching aluminum over refractory metal with successive plasmas
- Patent number 6,472,329
- Issue date Oct 29, 2002
- Applied Komatsu Technology, Inc.
- Haruhiro Harry Goto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of TEOS oxide using pulsed RF plasma
- Patent number 6,451,390
- Issue date Sep 17, 2002
- Applied Materials, Inc.
- Haruhiro H. Goto
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
System and method for gas distribution in a dry etch process
- Patent number 5,980,686
- Issue date Nov 9, 1999
- Applied Komatsu Technology, Inc.
- Haruhiro H. Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching film layers on large substrates
- Patent number 5,895,549
- Issue date Apr 20, 1999
- Applied Komatsu Technology, Inc.
- Haruhiro Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tapered dielectric etch in semiconductor devices
- Patent number 5,895,937
- Issue date Apr 20, 1999
- Applied Komatsu Technology, Inc.
- Yuh-Jia (Jim) Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry-etch of indium and tin oxides with C2H5I gas
- Patent number 5,843,277
- Issue date Dec 1, 1998
- Applied Komatsu Technology, Inc.
- Haruhiro Harry Goto
- G02 - OPTICS
Information Patent Grant
Tapered dielectric etch in semiconductor devices
- Patent number 5,728,608
- Issue date Mar 17, 1998
- Applied Komatsu Technology, Inc.
- Yuh-Jia (Jim) Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-rate dry-etch of indium and tin oxides by hydrogen and halogen...
- Patent number 5,607,602
- Issue date Mar 4, 1997
- Applied Komatsu Technology, Inc.
- Yuh-Jia Su
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY
- Publication number 20140182619
- Publication date Jul 3, 2014
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR STRIPPING PHOTORESIST AND/OR CLEANING METAL REGIONS
- Publication number 20130157465
- Publication date Jun 20, 2013
- David Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY
- Publication number 20120211473
- Publication date Aug 23, 2012
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Enhanced stripping of low-K films using downstream gas mixing
- Publication number 20090056875
- Publication date Mar 5, 2009
- Novellus Systems, Inc.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Application
HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY
- Publication number 20090053901
- Publication date Feb 26, 2009
- NOVELLUS SYSTEMS INC.
- Haruhiro Harry Goto
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHODS FOR STRIPPING PHOTORESIST AND/OR CLEANING METAL REGIONS
- Publication number 20080248656
- Publication date Oct 9, 2008
- Novellus Systems, Inc.
- David Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Reaction Apparatus Having Pre-Seasoned Showerheads and Metho...
- Publication number 20080216958
- Publication date Sep 11, 2008
- Novellus Systems, Inc.
- Haruhiro Harry GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR REMOVING PHOTORESIST FROM A SEMICONDUCTOR SUBSTRATE
- Publication number 20080102644
- Publication date May 1, 2008
- Novellus Systems, Inc.
- Haruhiro Harry GOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the recovery of ash rate following metal etching
- Publication number 20060032516
- Publication date Feb 16, 2006
- Infineon Technologies AG
- Srivatsa Kundalgurki
- B08 - CLEANING
Information Patent Application
System and method for gas distribution in a dry etch process
- Publication number 20050077010
- Publication date Apr 14, 2005
- APPLIED MATERIALS, INC.
- Haruhiro H. Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluorine process for cleaning semiconductor process chamber
- Publication number 20030192569
- Publication date Oct 16, 2003
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selectively etching silicon using fluorine without plasma
- Publication number 20030109144
- Publication date Jun 12, 2003
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE PROCESS FOR CLEANING SEMICONDUCTOR PROCESS CHAMBER
- Publication number 20030010354
- Publication date Jan 16, 2003
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of TEOS oxide using pulsed RF plasma
- Publication number 20020192475
- Publication date Dec 19, 2002
- Haruhiro H. Goto
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
SELECTIVELY ETCHING SILICON USING FLUORINE WITHOUT PLASMA
- Publication number 20020134755
- Publication date Sep 26, 2002
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- H01 - BASIC ELECTRIC ELEMENTS

Haruhiro Harry Goto

Person

Patents Grantslast 30 patents

High dose implantation strip (HDIS) in H2 base chemistry

Methods for stripping photoresist and/or cleaning metal regions

High dose implantation strip (HDIS) in H2 base chemistry

Simultaneous front side ash and backside clean

Methods for stripping photoresist and/or cleaning metal regions

High dose implantation strip (HDIS) in H2 base chemistry

Photoresist strip method for low-k dielectrics

Simultaneous front side ash and backside clean

Photoresist strip method for low-k dielectrics

Photoresist strip method for low-k dielectrics

Enhanced stripping of low-k films using downstream gas mixing

System and method for gas distribution in a dry etch process

Fluorine process for cleaning semiconductor process chamber

Selectively etching silicon using fluorine without plasma

Etching aluminum over refractory metal with successive plasmas

Deposition of TEOS oxide using pulsed RF plasma

System and method for gas distribution in a dry etch process

Method and apparatus for etching film layers on large substrates

Tapered dielectric etch in semiconductor devices

Dry-etch of indium and tin oxides with C2H5I gas

Tapered dielectric etch in semiconductor devices

High-rate dry-etch of indium and tin oxides by hydrogen and halogen...

Patents Applicationslast 30 patents

HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY

METHODS FOR STRIPPING PHOTORESIST AND/OR CLEANING METAL REGIONS

HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY

Enhanced stripping of low-K films using downstream gas mixing

HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY

METHODS FOR STRIPPING PHOTORESIST AND/OR CLEANING METAL REGIONS

Plasma Reaction Apparatus Having Pre-Seasoned Showerheads and Metho...

METHODS FOR REMOVING PHOTORESIST FROM A SEMICONDUCTOR SUBSTRATE

Method for the recovery of ash rate following metal etching

System and method for gas distribution in a dry etch process

Fluorine process for cleaning semiconductor process chamber

Selectively etching silicon using fluorine without plasma

FLUORINE PROCESS FOR CLEANING SEMICONDUCTOR PROCESS CHAMBER

Deposition of TEOS oxide using pulsed RF plasma

SELECTIVELY ETCHING SILICON USING FLUORINE WITHOUT PLASMA