Haruyoshi Osaki

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition
- Patent number 6,383,708
- Issue date May 7, 2002
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Succinimide derivative, process for production and use thereof
- Patent number 5,965,748
- Issue date Oct 12, 1999
- Sumitomo Chemical Company, Limited
- Akira Kamabuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and photosensitizers
- Patent number 5,866,724
- Issue date Feb 2, 1999
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive positive resist composition comprising a 1,2-qu...
- Patent number 5,861,229
- Issue date Jan 19, 1999
- Sumitomo Chemical Company, Limited
- Haruyoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,843,616
- Issue date Dec 1, 1998
- Sumitomo Chemical Company, Ltd.
- Kunishige Edamatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyhydroxy compound and a positive photoresist containing the same
- Patent number 5,807,656
- Issue date Sep 15, 1998
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition comprising a novolac resin made from a...
- Patent number 5,792,586
- Issue date Aug 11, 1998
- Sumitomo Chemical Company, Limited
- Kazuhiko Hashimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive positive resist composition
- Patent number 5,792,585
- Issue date Aug 11, 1998
- Sumitomo Chemical Company, Limited
- Ayako Ida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive positive resist composition
- Patent number 5,783,355
- Issue date Jul 21, 1998
- Sumitomo Chemical Company, Limited
- Ayako Ida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive positive resist composition comprising an alkal...
- Patent number 5,736,292
- Issue date Apr 7, 1998
- Sumitomo Chemical Company, Limited
- Ayako Ida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tetraphenol compounds and process for producing the same
- Patent number 5,726,217
- Issue date Mar 10, 1998
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition
- Patent number 5,468,590
- Issue date Nov 21, 1995
- Sumitomo Chemical Company, Limited
- Kazuhiko Hashimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition
- Patent number 5,451,484
- Issue date Sep 19, 1995
- Sumitomo Chemical Company, Ltd.
- Kyoko Nagase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,429,904
- Issue date Jul 4, 1995
- Sumitomo Chemical Company, Ltd.
- Kyoko Nagase
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition containing a novolak resin made from an...
- Patent number 5,395,727
- Issue date Mar 7, 1995
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive quinonediazide resist composition utilizing mixed solvent...
- Patent number 5,336,583
- Issue date Aug 9, 1994
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition
- Patent number 5,326,665
- Issue date Jul 5, 1994
- Sumitomo Chemical Company, Limited
- Haruyoshi Osaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive positive resist composition comprising an o-qui...
- Patent number 5,288,587
- Issue date Feb 22, 1994
- Sumitomo Chemical Co., Ltd.
- Haruyoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition containing 1,2-quinone diazide compound...
- Patent number 5,188,920
- Issue date Feb 23, 1993
- Sumitomo Chemical Company, Limited
- Hiroshi Moriuma
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Novolak resin for positive photoresist
- Patent number 4,812,551
- Issue date Mar 14, 1989
- Sumitomo Chemical Company, Limited
- Fumio Oi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Haruyoshi Osaki

Person

Patents Grantslast 30 patents

Positive resist composition

Succinimide derivative, process for production and use thereof

Positive resist composition and photosensitizers

Radiation-sensitive positive resist composition comprising a 1,2-qu...

Positive resist composition

Polyhydroxy compound and a positive photoresist containing the same

Positive resist composition comprising a novolac resin made from a...

Radiation-sensitive positive resist composition

Radiation-sensitive positive resist composition

Radiation-sensitive positive resist composition comprising an alkal...

Tetraphenol compounds and process for producing the same

Positive resist composition

Positive resist composition

Positive resist composition

Positive resist composition containing a novolak resin made from an...

Positive quinonediazide resist composition utilizing mixed solvent...

Positive type resist composition

Radiation-sensitive positive resist composition comprising an o-qui...

Positive resist composition containing 1,2-quinone diazide compound...

Novolak resin for positive photoresist