Hideo Hagiwara

Person

Hitachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern-forming process using photosensitive resin composition
- Patent number 7,153,631
- Issue date Dec 26, 2006
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursor, polyimide and their use
- Patent number 6,309,791
- Issue date Oct 30, 2001
- Hitachi Chemical Co.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type photosensitive resin composition containing an alkali...
- Patent number 6,197,475
- Issue date Mar 6, 2001
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming process using photosensitive resin composition
- Patent number 6,194,126
- Issue date Feb 27, 2001
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursor, polyimide and their use
- Patent number 6,143,475
- Issue date Nov 7, 2000
- Hitachi Chemical Co.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition containing a photosensitive polyam...
- Patent number 6,071,667
- Issue date Jun 6, 2000
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition
- Patent number 5,856,059
- Issue date Jan 5, 1999
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition
- Patent number 5,847,071
- Issue date Dec 8, 1998
- Hitachi, Chemical Co., Ltd.
- Hideo Hagiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoinitiator compositions including amino acids, coumarin and tit...
- Patent number 5,811,218
- Issue date Sep 22, 1998
- Hitachi Chemical Company, Ltd.
- Makoto Kaji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 5,668,248
- Issue date Sep 16, 1997
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Naphthalocyanine derivatives, production thereof, optical recording...
- Patent number 5,484,685
- Issue date Jan 16, 1996
- Hitachi, Ltd.
- Seiji Tai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive resin composition
- Patent number 5,472,823
- Issue date Dec 5, 1995
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tatraazaporphin, process for producing the same, as well as optical...
- Patent number 5,284,943
- Issue date Feb 8, 1994
- Hitachi Chemical Company, Co.
- Seiji Tai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Naphthalocyanine derivatives, production thereof and optical record...
- Patent number 5,268,485
- Issue date Dec 7, 1993
- Hitachi Chemical Company, Ltd.
- Mitsuo Katayose
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tetraazaporphin, process for producing the same, as well as optical...
- Patent number 5,217,856
- Issue date Jun 8, 1993
- Hitachi Chemical Co., Ltd.
- Seiji Tai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
2,3-dicyanonaphthalene derivatives
- Patent number 5,214,188
- Issue date May 25, 1993
- Hitachi, Ltd.
- Seiji Tai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Naphthalocyanine derivatives, production thereof, optical recording...
- Patent number 5,110,968
- Issue date May 5, 1992
- Hitachi, Chemical Company Ltd.
- Seiji Tai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Naphthalocyanine derivatives, production thereof and optical record...
- Patent number 5,075,203
- Issue date Dec 24, 1991
- Hitachi Chemical Company, Ltd.
- Mitsuo Katayose
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Naphthalocyanine derivatives, production thereof, optical recording...
- Patent number 5,039,600
- Issue date Aug 13, 1991
- Hitachi Chemical Company, Ltd.
- Seiji Tai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Naphthalocyanine derivatives and their use in optical recording medium
- Patent number 5,034,309
- Issue date Jul 23, 1991
- Hitachi Chemical Co., Ltd.
- Seiji Tai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
Pattern-forming process using photosensitive resin composition
- Publication number 20040106066
- Publication date Jun 3, 2004
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive resin composition
- Publication number 20020004177
- Publication date Jan 10, 2002
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hideo Hagiwara

Person

Patents Grantslast 30 patents

Pattern-forming process using photosensitive resin composition

Polyimide precursor, polyimide and their use

Positive type photosensitive resin composition containing an alkali...

Pattern-forming process using photosensitive resin composition

Polyimide precursor, polyimide and their use

Photosensitive resin composition containing a photosensitive polyam...

Photosensitive resin composition

Photosensitive resin composition

Photoinitiator compositions including amino acids, coumarin and tit...

Photosensitive resin composition

Naphthalocyanine derivatives, production thereof, optical recording...

Photosensitive resin composition

Tatraazaporphin, process for producing the same, as well as optical...

Naphthalocyanine derivatives, production thereof and optical record...

Tetraazaporphin, process for producing the same, as well as optical...

2,3-dicyanonaphthalene derivatives

Naphthalocyanine derivatives, production thereof, optical recording...

Naphthalocyanine derivatives, production thereof and optical record...

Naphthalocyanine derivatives, production thereof, optical recording...

Naphthalocyanine derivatives and their use in optical recording medium

Patents Applicationslast 30 patents

Pattern-forming process using photosensitive resin composition

Photosensitive resin composition