Hirofumi Watatani

Person

Yokkaichi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of making a three-dimensional memory array with etch stop
- Patent number 9,437,606
- Issue date Sep 6, 2016
- SanDisk Technologies LLC
- Raghuveer S. Makala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing semiconductor device
- Patent number 9,123,728
- Issue date Sep 1, 2015
- Fujitsu Semiconductor Limited
- Takahiro Kono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an active area with floating gate negative offset...
- Patent number 9,099,496
- Issue date Aug 4, 2015
- SanDisk Technologies Inc.
- Ming Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer passivation for high aspect ratio etching of multilayer stac...
- Patent number 9,093,480
- Issue date Jul 28, 2015
- SanDisk Technologies Inc.
- Raghuveer S. Makala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing semiconductor device
- Patent number 8,669,177
- Issue date Mar 11, 2014
- Fujitsu Semiconductor Limited
- Takahiro Kouno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating semiconductor device
- Patent number 8,604,552
- Issue date Dec 10, 2013
- Fujitsu Semiconductor Limited
- Tamotsu Owada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device and semiconductor de...
- Patent number 8,536,708
- Issue date Sep 17, 2013
- Fujitsu Semiconductor Limited
- Shinichi Akiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...
- Patent number 8,349,722
- Issue date Jan 8, 2013
- Fujitsu Semiconductor Limited
- Tamotsu Owada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and semiconductor de...
- Patent number 8,338,953
- Issue date Dec 25, 2012
- Fujitsu Semiconductor Limited
- Shinichi Akiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 8,105,935
- Issue date Jan 31, 2012
- Fujitsu Semiconductor Limited
- Naoki Ohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and semiconductor de...
- Patent number 8,030,207
- Issue date Oct 4, 2011
- Fujitsu Semiconductor Limited
- Shinichi Akiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device having device characte...
- Patent number 7,951,686
- Issue date May 31, 2011
- Fujitsu Limited
- Sadahiro Kishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 7,749,897
- Issue date Jul 6, 2010
- Fujitsu Semiconductor Limited
- Ken Sugimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having device characteristics improved by stra...
- Patent number 7,701,016
- Issue date Apr 20, 2010
- Fujitsu Limited
- Sadahiro Kishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating film forming method capable of enhancing adhesion of sil...
- Patent number 7,642,185
- Issue date Jan 5, 2010
- Fujitsu Microelectronics Limited
- Tamotsu Owada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulating film, method for forming multilayer s...
- Patent number 7,541,296
- Issue date Jun 2, 2009
- Fujitsu Microelectronics Limited
- Tamotsu Owada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...
- Patent number 7,485,570
- Issue date Feb 3, 2009
- Fujitsu Limited
- Tamotsu Owada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insulating film forming method capable of enhancing adhesion of sil...
- Patent number 7,208,405
- Issue date Apr 24, 2007
- Fujitsu Limited
- Tamotsu Owada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro pattern forming method and semiconductor device manufacturing...
- Patent number 7,001,847
- Issue date Feb 21, 2006
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...
- Patent number 6,949,830
- Issue date Sep 27, 2005
- Fujitsu Limited
- Tamotsu Owada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 6,852,587
- Issue date Feb 8, 2005
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with multilevel wiring layers
- Patent number 6,707,156
- Issue date Mar 16, 2004
- Fujitsu Limited
- Takashi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 6,632,739
- Issue date Oct 14, 2003
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with both memories and logic circuits and its...
- Patent number 6,605,510
- Issue date Aug 12, 2003
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 6,602,748
- Issue date Aug 5, 2003
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a semiconductor device having a multilayered...
- Patent number 6,514,878
- Issue date Feb 4, 2003
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with both memories and logic circuits and its...
- Patent number 6,483,150
- Issue date Nov 19, 2002
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a multilayered interconnection structure
- Patent number 6,337,519
- Issue date Jan 8, 2002
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a multilayered interconnection structure
- Patent number 6,153,511
- Issue date Nov 28, 2000
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an insulation film of low permittivity...
- Patent number 5,905,298
- Issue date May 18, 1999
- Fujitsu Limited
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ETCHING BOTTOM PUNCH-THROUGH OPENING IN A MEMORY FILM OF...
- Publication number 20210005627
- Publication date Jan 7, 2021
- SANDISK TECHNOLOGIES LLC
- Tatsuya HINOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Making A Three-Dimensional Memory Array With Etch Stop
- Publication number 20150008503
- Publication date Jan 8, 2015
- SanDisk Technologies, Inc.
- Raghuveer S. MAKALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN ACTIVE AREA WITH FLOATING GATE NEGATIVE OFFSET...
- Publication number 20140367762
- Publication date Dec 18, 2014
- Ming Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER PASSIVATION FOR HIGH ASPECT RATIO ETCHING OF MULTILAYER STAC...
- Publication number 20140295636
- Publication date Oct 2, 2014
- SanDisk Technologies, Inc.
- Raghuveer S. Makala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140131873
- Publication date May 15, 2014
- FUJITSU SEMICONDUCTOR LIMITED
- Takahiro Kouno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON OXYCARBIDE, GROWTH METHOD OF SILICON OXYCARBIDE LAYER, SEMI...
- Publication number 20130330912
- Publication date Dec 12, 2013
- FUJITSU SEMICONDUCTOR LIMITED
- Tamotsu Owada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...
- Publication number 20120326315
- Publication date Dec 27, 2012
- FUJITSU SEMICONDUCTOR LIMITED
- Shinichi AKIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20120322272
- Publication date Dec 20, 2012
- FUJITSU SEMICONDUCTOR LIMITED
- Tamotsu Owada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON OXYCARBIDE, GROWTH METHOD OF SILICON OXYCARBIDE LAYER, SEMI...
- Publication number 20120252227
- Publication date Oct 4, 2012
- FUJITSU SEMICONDUCTOR LIMITED
- Tamotsu Owada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...
- Publication number 20110241211
- Publication date Oct 6, 2011
- FUJITSU SEMICONDUCTOR LIMITED
- Shinichi AKIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having device characteristics improved by stra...
- Publication number 20100144117
- Publication date Jun 10, 2010
- Fujitsu Limited
- Sadahiro Kishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20100012991
- Publication date Jan 21, 2010
- Fujitsu Microelectronics Limited
- Tamotsu OWADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090278259
- Publication date Nov 12, 2009
- Fujitsu Microelectronics Limited
- Takahiro KOUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of making a semiconductor device with residual amine group f...
- Publication number 20090149031
- Publication date Jun 11, 2009
- Fujitsu Limited
- Katsumi Kakamu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...
- Publication number 20090093130
- Publication date Apr 9, 2009
- Fujitsu Limited
- Tamotsu Owada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20080305645
- Publication date Dec 11, 2008
- FUJITSU LIMITED
- Ken Sugimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...
- Publication number 20080284027
- Publication date Nov 20, 2008
- Fujitsu Limited
- Shinichi AKIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20080233734
- Publication date Sep 25, 2008
- FUJITSU LIMITED
- Naoki OHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20080057717
- Publication date Mar 6, 2008
- Fujitsu Limited
- Tamotsu OWADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having device characteristics improved by stra...
- Publication number 20070228488
- Publication date Oct 4, 2007
- FUJITSU LIMITED
- Sadahiro Kishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication process of semiconductor device and semiconductor device
- Publication number 20070181966
- Publication date Aug 9, 2007
- FUJITSU LIMITED
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Insulating film forming method capable of enhancing adhesion of sil...
- Publication number 20070173054
- Publication date Jul 26, 2007
- FUJITSU LIMITED
- Tamotsu Owada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20070123035
- Publication date May 31, 2007
- FUJITSU LIMITED
- Ken Sugimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming SiC-based film and method for fabricating semico...
- Publication number 20060205193
- Publication date Sep 14, 2006
- FUJITSU LIMITED
- Ken Sugimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for forming insulating film, method for forming multilayer s...
- Publication number 20060178017
- Publication date Aug 10, 2006
- FUJITSU LIMITED
- Tamotsu Owada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...
- Publication number 20050287790
- Publication date Dec 29, 2005
- FUJITSU LIMITED
- Tamotsu Owada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Insulating film forming method capable of enhancing adhesion of sil...
- Publication number 20050242440
- Publication date Nov 3, 2005
- FUJITSU LIMITED
- Tamotsu Owada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...
- Publication number 20040155340
- Publication date Aug 12, 2004
- FUJITSU LIMITED
- Tamotsu Owada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Micro pattern forming method and semiconductor device manufacturing...
- Publication number 20040082173
- Publication date Apr 29, 2004
- FUJITSU LIMITED
- Hirofumi Watatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20030227087
- Publication date Dec 11, 2003
- FUJITSU LIMITED
- Katsumi Kakamu
- H01 - BASIC ELECTRIC ELEMENTS

Hirofumi Watatani

Person

Patents Grantslast 30 patents

Method of making a three-dimensional memory array with etch stop

Semiconductor device and method for manufacturing semiconductor device

Method of forming an active area with floating gate negative offset...

Spacer passivation for high aspect ratio etching of multilayer stac...

Semiconductor device and method for manufacturing semiconductor device

Semiconductor device and method for fabricating semiconductor device

Method of manufacturing a semiconductor device and semiconductor de...

Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...

Method of manufacturing a semiconductor device and semiconductor de...

Method of manufacturing a semiconductor device

Method of manufacturing a semiconductor device and semiconductor de...

Method of manufacturing semiconductor device having device characte...

Method of manufacturing semiconductor device

Semiconductor device having device characteristics improved by stra...

Insulating film forming method capable of enhancing adhesion of sil...

Method for forming insulating film, method for forming multilayer s...

Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...

Insulating film forming method capable of enhancing adhesion of sil...

Micro pattern forming method and semiconductor device manufacturing...

Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...

Method for fabricating a semiconductor device

Semiconductor device with multilevel wiring layers

Method for fabricating a semiconductor device

Semiconductor device with both memories and logic circuits and its...

Method for fabricating a semiconductor device

Method of fabricating a semiconductor device having a multilayered...

Semiconductor device with both memories and logic circuits and its...

Semiconductor device having a multilayered interconnection structure

Semiconductor device having a multilayered interconnection structure

Semiconductor device having an insulation film of low permittivity...

Patents Applicationslast 30 patents

METHOD FOR ETCHING BOTTOM PUNCH-THROUGH OPENING IN A MEMORY FILM OF...

Method Of Making A Three-Dimensional Memory Array With Etch Stop

METHOD OF FORMING AN ACTIVE AREA WITH FLOATING GATE NEGATIVE OFFSET...

SPACER PASSIVATION FOR HIGH ASPECT RATIO ETCHING OF MULTILAYER STAC...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SILICON OXYCARBIDE, GROWTH METHOD OF SILICON OXYCARBIDE LAYER, SEMI...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SILICON OXYCARBIDE, GROWTH METHOD OF SILICON OXYCARBIDE LAYER, SEMI...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...

Semiconductor device having device characteristics improved by stra...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Method of making a semiconductor device with residual amine group f...

Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...

Method of manufacturing semiconductor device

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DE...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Semiconductor device having device characteristics improved by stra...

Fabrication process of semiconductor device and semiconductor device

Insulating film forming method capable of enhancing adhesion of sil...

Method of manufacturing semiconductor device

Method for forming SiC-based film and method for fabricating semico...

Method for forming insulating film, method for forming multilayer s...

Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...

Insulating film forming method capable of enhancing adhesion of sil...

Silicon oxycarbide, growth method of silicon oxycarbide layer, semi...

Micro pattern forming method and semiconductor device manufacturing...

Semiconductor device and method of manufacturing the same