Hiroko NAKAMURA

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam pattern forming device and charged particle b...
- Patent number 12,347,641
- Issue date Jul 1, 2025
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molecular detection apparatus and molecular detection method
- Patent number 10,761,051
- Issue date Sep 1, 2020
- Kabushiki Kaisha Toshiba
- Ko Yamada
- G01 - MEASURING TESTING
Information Patent Grant
Molecular detection apparatus, molecular detection method, and mole...
- Patent number 10,677,770
- Issue date Jun 9, 2020
- Kabushiki Kaisha Toshiba
- Ko Yamada
- G01 - MEASURING TESTING
Information Patent Grant
Molecular detection apparatus, molecular detection method, and orga...
- Patent number 10,527,581
- Issue date Jan 7, 2020
- Kabushiki Kaisha Toshiba
- Ko Yamada
- G01 - MEASURING TESTING
Information Patent Grant
Gas detection apparatus
- Patent number 9,709,523
- Issue date Jul 18, 2017
- Kabushiki Kaisha Toshiba
- Norikazu Osada
- G01 - MEASURING TESTING
Information Patent Grant
Method of forming pattern and laminate
- Patent number 9,291,908
- Issue date Mar 22, 2016
- Kabushiki Kaisha Toshiba
- Atsushi Hieno
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method
- Patent number 9,207,531
- Issue date Dec 8, 2015
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pattern formation method and block copolymer
- Patent number 9,177,818
- Issue date Nov 3, 2015
- Kabushiki Kaisha Toshiba
- Atsushi Hieno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming pattern and laminate
- Patent number 9,073,284
- Issue date Jul 7, 2015
- Kabushiki Kaisha Toshiba
- Atsushi Hieno
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern formation method and guide pattern material
- Patent number 9,017,930
- Issue date Apr 28, 2015
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern formation method and polymer alloy base material
- Patent number 8,986,488
- Issue date Mar 24, 2015
- Kabushiki Kaisha Toshiba
- Shigeki Hattori
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Substrate polishing method, semiconductor device and fabrication me...
- Patent number 8,980,748
- Issue date Mar 17, 2015
- Sony Corporation
- Hiroko Nakamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of forming pattern
- Patent number 8,808,973
- Issue date Aug 19, 2014
- Kabushiki Kaisha Toshiba
- Satoshi Mikoshiba
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of forming pattern
- Patent number 8,636,914
- Issue date Jan 28, 2014
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method
- Patent number 8,182,981
- Issue date May 22, 2012
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming contact hole pattern in semiconductor integrated...
- Patent number 8,101,516
- Issue date Jan 24, 2012
- Kabushiki Kaisha Toshiba
- Toshiya Kotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mark forming method and method for manufacturing semiconductor device
- Patent number 7,972,932
- Issue date Jul 5, 2011
- Kabushiki Kaisha Toshiba
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor device, reticle correcting me...
- Patent number 7,816,060
- Issue date Oct 19, 2010
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method used in semiconductor device manufacturing a...
- Patent number 7,749,687
- Issue date Jul 6, 2010
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask pattern data producing method, patterning method, reticle corr...
- Patent number 7,560,197
- Issue date Jul 14, 2009
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for a predicting a pattern shape by using an actual measured...
- Patent number 7,319,944
- Issue date Jan 15, 2008
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming contact hole and method of manufacturing semicond...
- Patent number 7,148,138
- Issue date Dec 12, 2006
- Kabushiki Kaisha Toshiba
- Shoji Mimotogi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and method for manufacturing semiconductor d...
- Patent number 7,026,099
- Issue date Apr 11, 2006
- Kabushiki Kaisha Toshiba
- Hirokazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,632,476
- Issue date Oct 14, 2003
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing method and apparatus
- Patent number 6,265,323
- Issue date Jul 24, 2001
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect repair system and method which controls a dose of a par...
- Patent number 6,028,953
- Issue date Feb 22, 2000
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask and apparatus for repairing photo mask
- Patent number 5,807,650
- Issue date Sep 15, 1998
- Kabushiki Kaisha Toshiba
- Haruki Komano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask defect repair system and method
- Patent number 5,799,104
- Issue date Aug 25, 1998
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focused ion beam deposition using TMCTS
- Patent number 5,639,699
- Issue date Jun 17, 1997
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged beam apparatus
- Patent number 5,591,970
- Issue date Jan 7, 1997
- Kabushiki Kaisha Toshiba
- Haruki Komano
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240321545
- Publication date Sep 26, 2024
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE B...
- Publication number 20230298848
- Publication date Sep 21, 2023
- Kabushiki Kaisha Toshiba
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE
- Publication number 20210141310
- Publication date May 13, 2021
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SENSING METHOD, GAS SENSOR, AND GAS SENSING SYSTEM
- Publication number 20190293596
- Publication date Sep 26, 2019
- KABUSHIKI KAISHA TOSHIBA
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE
- Publication number 20190086804
- Publication date Mar 21, 2019
- Kabushiki Kaisha Toshiba
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOLECULAR DETECTION APPARATUS AND METHOD OF DETECTING MOLECULES
- Publication number 20190086327
- Publication date Mar 21, 2019
- KABUSHIKI KAISHA TOSHIBA
- Masaki Atsuta
- G01 - MEASURING TESTING
Information Patent Application
MOLECULAR DETECTION APPARATUS AND MOLECULAR DETECTION METHOD
- Publication number 20190086359
- Publication date Mar 21, 2019
- KABUSHIKI KAISHA TOSHIBA
- Ko Yamada
- G01 - MEASURING TESTING
Information Patent Application
MOLECULAR DETECTION APPARATUS, MOLECULAR DETECTION METHOD, AND MOLE...
- Publication number 20180080911
- Publication date Mar 22, 2018
- KABUSHIKI KAISHA TOSHIBA
- Ko YAMADA
- G01 - MEASURING TESTING
Information Patent Application
MOLECULAR DETECTION APPARATUS, MOLECULAR DETECTION METHOD, AND ORGA...
- Publication number 20180059053
- Publication date Mar 1, 2018
- KABUSHIKI KAISHA TOSHIBA
- Ko YAMADA
- G01 - MEASURING TESTING
Information Patent Application
MOLECULAR DETECTION APPARATUS AND MOLECULAR DETECTION METHOD
- Publication number 20170248566
- Publication date Aug 31, 2017
- KABUSHIKI KAISHA TOSHIBA
- Ko YAMADA
- G01 - MEASURING TESTING
Information Patent Application
MOLECULAR DETECTION APPARATUS AND MOLECULAR DETECTION METHOD
- Publication number 20170248565
- Publication date Aug 31, 2017
- KABUSHIKI KAISHA TOSHIBA
- Ko YAMADA
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF FORMING PATTERN AND LAMINATE
- Publication number 20150261092
- Publication date Sep 17, 2015
- Kabushiki Kaisha Toshiba
- Atsushi HIENO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD AND BLOCK COPOLYMER
- Publication number 20140127910
- Publication date May 8, 2014
- KABUSHIKI KAISHA TOSHIBA
- Atsushi HIENO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION METHOD AND GUIDE PATTERN MATERIAL
- Publication number 20130183828
- Publication date Jul 18, 2013
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION METHOD AND POLYMER ALLOY BASE MATERIAL
- Publication number 20130133825
- Publication date May 30, 2013
- Kabushiki Kaisha Toshiba
- Shigeki HATTORI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD OF FORMING PATTERN AND LAMINATE
- Publication number 20130078570
- Publication date Mar 28, 2013
- Atsushi HIENO
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20130075360
- Publication date Mar 28, 2013
- Hiroko NAKAMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20120214094
- Publication date Aug 23, 2012
- Satoshi MIKOSHIBA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20120127454
- Publication date May 24, 2012
- Hiroko NAKAMURA
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100317196
- Publication date Dec 16, 2010
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20100021850
- Publication date Jan 28, 2010
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MARK FORMING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090246891
- Publication date Oct 1, 2009
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD USING TWO LAYERS OF RESIST PATTERNS STACKED...
- Publication number 20090011370
- Publication date Jan 8, 2009
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD USING RELACS PROCESS
- Publication number 20080305443
- Publication date Dec 11, 2008
- Hiroko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate polishing method, semiconductor device and fabrication me...
- Publication number 20080197456
- Publication date Aug 21, 2008
- SONY CORPORATION
- Hiroko Nakamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of Forming Contact Hole Pattern in Semiconductor Integrated...
- Publication number 20080070402
- Publication date Mar 20, 2008
- Toshiya Kotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern forming method used in semiconductor device manufacturing a...
- Publication number 20070269746
- Publication date Nov 22, 2007
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of semiconductor device, reticle correcting me...
- Publication number 20070218673
- Publication date Sep 20, 2007
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask pattern data producing method, patterning method, reticle corr...
- Publication number 20050196684
- Publication date Sep 8, 2005
- Hiroko Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming contact hole and method of manufacturing semicond...
- Publication number 20050153540
- Publication date Jul 14, 2005
- Shoji Mimotogi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiroko NAKAMURA

Person

Patents Grantslast 30 patents

Charged particle beam pattern forming device and charged particle b...

Molecular detection apparatus and molecular detection method

Molecular detection apparatus, molecular detection method, and mole...

Molecular detection apparatus, molecular detection method, and orga...

Gas detection apparatus

Method of forming pattern and laminate

Pattern forming method

Pattern formation method and block copolymer

Method of forming pattern and laminate

Pattern formation method and guide pattern material

Pattern formation method and polymer alloy base material

Substrate polishing method, semiconductor device and fabrication me...

Method of forming pattern

Method of forming pattern

Pattern forming method

Method of forming contact hole pattern in semiconductor integrated...

Mark forming method and method for manufacturing semiconductor device

Manufacturing method of semiconductor device, reticle correcting me...

Pattern forming method used in semiconductor device manufacturing a...

Mask pattern data producing method, patterning method, reticle corr...

Method for a predicting a pattern shape by using an actual measured...

Method of forming contact hole and method of manufacturing semicond...

Pattern forming method and method for manufacturing semiconductor d...

Substrate processing method and substrate processing apparatus

Substrate processing method and apparatus

Mask defect repair system and method which controls a dose of a par...

Photo mask and apparatus for repairing photo mask

Mask defect repair system and method

Focused ion beam deposition using TMCTS

Charged beam apparatus

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE

CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE B...

PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE

GAS SENSING METHOD, GAS SENSOR, AND GAS SENSING SYSTEM

PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE

MOLECULAR DETECTION APPARATUS AND METHOD OF DETECTING MOLECULES

MOLECULAR DETECTION APPARATUS AND MOLECULAR DETECTION METHOD

MOLECULAR DETECTION APPARATUS, MOLECULAR DETECTION METHOD, AND MOLE...

MOLECULAR DETECTION APPARATUS, MOLECULAR DETECTION METHOD, AND ORGA...

MOLECULAR DETECTION APPARATUS AND MOLECULAR DETECTION METHOD

MOLECULAR DETECTION APPARATUS AND MOLECULAR DETECTION METHOD

METHOD OF FORMING PATTERN AND LAMINATE

PATTERN FORMATION METHOD AND BLOCK COPOLYMER

PATTERN FORMATION METHOD AND GUIDE PATTERN MATERIAL

PATTERN FORMATION METHOD AND POLYMER ALLOY BASE MATERIAL

METHOD OF FORMING PATTERN AND LAMINATE

METHOD OF FORMING PATTERN

METHOD OF FORMING PATTERN

PATTERN FORMING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PATTERN FORMING METHOD

MARK FORMING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PATTERN FORMING METHOD USING TWO LAYERS OF RESIST PATTERNS STACKED...

PATTERN FORMING METHOD USING RELACS PROCESS

Substrate polishing method, semiconductor device and fabrication me...

Method of Forming Contact Hole Pattern in Semiconductor Integrated...

Pattern forming method used in semiconductor device manufacturing a...

Manufacturing method of semiconductor device, reticle correcting me...

Mask pattern data producing method, patterning method, reticle corr...

Method of forming contact hole and method of manufacturing semicond...