Hironobu Kawahara

Person

Kudamatsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,608,162
- Issue date Oct 27, 2009
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen surface processing apparatus and surface processing method
- Patent number 7,354,525
- Issue date Apr 8, 2008
- Hitachi High-Technologies Corporation
- Masatoshi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,288,166
- Issue date Oct 30, 2007
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing samples
- Patent number 7,132,293
- Issue date Nov 7, 2006
- Hitachi, Ltd.
- Yoshimi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing samples
- Patent number 6,989,228
- Issue date Jan 24, 2006
- Hitachi, Ltd.
- Masayuki Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma processing high-speed semiconductor...
- Patent number 6,867,144
- Issue date Mar 15, 2005
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,759,338
- Issue date Jul 6, 2004
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,755,935
- Issue date Jun 29, 2004
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing apparatus and a wafer stage and a wafer processing...
- Patent number 6,677,167
- Issue date Jan 13, 2004
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing samples
- Patent number 6,656,846
- Issue date Dec 2, 2003
- Hitachi, Ltd.
- Masayuki Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for plasma processing high-speed semiconductor...
- Patent number 6,649,021
- Issue date Nov 18, 2003
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing equipment and plasma processing method using the...
- Patent number 6,624,084
- Issue date Sep 23, 2003
- Hitachi, Ltd.
- Kenji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and a vacuum processing system
- Patent number 6,558,100
- Issue date May 6, 2003
- Hitachi, Ltd.
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer processing apparatus and method
- Patent number 6,549,393
- Issue date Apr 15, 2003
- Hitachi, Ltd.
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing samples
- Patent number 6,537,415
- Issue date Mar 25, 2003
- Hitachi, Ltd.
- Masayuki Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for processing samples
- Patent number 6,537,417
- Issue date Mar 25, 2003
- Hitachi, Ltd.
- Masayuki Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and a vacuum processing system
- Patent number 6,537,012
- Issue date Mar 25, 2003
- Hitachi, Ltd.
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device and plasma processing method
- Patent number 6,427,621
- Issue date Aug 6, 2002
- Hitachi, Ltd.
- Masato Ikegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for plasma processing high-speed semiconductor circuits with...
- Patent number 6,413,876
- Issue date Jul 2, 2002
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel-planar plasma processing apparatus
- Patent number 6,388,624
- Issue date May 14, 2002
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating samples
- Patent number 6,329,298
- Issue date Dec 11, 2001
- Hitachi, Ltd.
- Ryooji Fukuyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for processing samples
- Patent number 6,254,721
- Issue date Jul 3, 2001
- Hitachi, Ltd.
- Masayuki Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum treatment system and its stage
- Patent number 6,235,146
- Issue date May 22, 2001
- Hitachi, Ltd.
- Masanori Kadotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and apparatus
- Patent number 6,165,377
- Issue date Dec 26, 2000
- Hitachi, Ltd.
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing samples
- Patent number 6,077,788
- Issue date Jun 20, 2000
- Hitachi, Ltd.
- Yoshinao Kawasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for processing a sample having a metal laminate
- Patent number 6,036,816
- Issue date Mar 14, 2000
- Hitachi, Ltd.
- Masayuki Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing samples
- Patent number 5,952,245
- Issue date Sep 14, 1999
- Hitachi, Ltd.
- Yoshimi Torii
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and apparatus
- Patent number 5,900,162
- Issue date May 4, 1999
- Hitachi, Ltd.
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing samples
- Patent number 5,868,854
- Issue date Feb 9, 1999
- Hitachi, Ltd.
- Masayuki Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma processing apparatus and method
- Patent number 5,861,601
- Issue date Jan 19, 1999
- Hitachi, Ltd.
- Yoshiaki Sato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20080023145
- Publication date Jan 31, 2008
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for processing samples
- Publication number 20070037292
- Publication date Feb 15, 2007
- Masayuki Kojima
- G01 - MEASURING TESTING
Information Patent Application
Specimen surface processing apparatus and surface processing method
- Publication number 20060000804
- Publication date Jan 5, 2006
- Masatoshi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for processing samples
- Publication number 20040219687
- Publication date Nov 4, 2004
- Yoshimi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Specimen surface processing apparatus and surface processing method
- Publication number 20040171273
- Publication date Sep 2, 2004
- Masatoshi Oyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040149385
- Publication date Aug 5, 2004
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer processing apparatus and a wafer stage and a wafer processing...
- Publication number 20040040933
- Publication date Mar 4, 2004
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer processing apparatus and a wafer stage and a wafer processing...
- Publication number 20030164226
- Publication date Sep 4, 2003
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER PROCESSING APPARATUS AND METHOD
- Publication number 20030030960
- Publication date Feb 13, 2003
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor wafer processing apparatus and method
- Publication number 20030029572
- Publication date Feb 13, 2003
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for plasma processing high-speed semiconductor...
- Publication number 20020127858
- Publication date Sep 12, 2002
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and a vacuum processing system
- Publication number 20020081175
- Publication date Jun 27, 2002
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and a vacuum processing system
- Publication number 20020081174
- Publication date Jun 27, 2002
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for processing samples
- Publication number 20020043339
- Publication date Apr 18, 2002
- Masayuki Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for processing samples
- Publication number 20020043340
- Publication date Apr 18, 2002
- Masayuki Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for plasma processing high-speed semiconductor...
- Publication number 20020025686
- Publication date Feb 28, 2002
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for processing samples
- Publication number 20020023720
- Publication date Feb 28, 2002
- Masayuki Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for plasma processing high-speed semiconductor...
- Publication number 20020023716
- Publication date Feb 28, 2002
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for processing samples
- Publication number 20020013063
- Publication date Jan 31, 2002
- Masayuki Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20010023663
- Publication date Sep 27, 2001
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing equipment and plasma processing method using the...
- Publication number 20010022293
- Publication date Sep 20, 2001
- Kenji Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20010019881
- Publication date Sep 6, 2001
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS

Hironobu Kawahara

Person

Patents Grantslast 30 patents

Plasma processing apparatus and method

Specimen surface processing apparatus and surface processing method

Plasma processing apparatus

Method and apparatus for processing samples

Method and apparatus for processing samples

Apparatus and method for plasma processing high-speed semiconductor...

Plasma processing apparatus and method

Plasma processing apparatus

Wafer processing apparatus and a wafer stage and a wafer processing...

Apparatus for processing samples

Apparatus and method for plasma processing high-speed semiconductor...

Plasma processing equipment and plasma processing method using the...

Vacuum processing apparatus and a vacuum processing system

Semiconductor wafer processing apparatus and method

Apparatus for processing samples

Apparatus for processing samples

Vacuum processing apparatus and a vacuum processing system

Plasma processing device and plasma processing method

Method for plasma processing high-speed semiconductor circuits with...

Parallel-planar plasma processing apparatus

Apparatus for treating samples

Method and apparatus for processing samples

Vacuum treatment system and its stage

Plasma etching method and apparatus

Method and apparatus for processing samples

Apparatus for processing a sample having a metal laminate

Method for processing samples

Plasma etching method and apparatus

Method and apparatus for processing samples

Microwave plasma processing apparatus and method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND METHOD

Method and apparatus for processing samples

Specimen surface processing apparatus and surface processing method

Method and apparatus for processing samples

Specimen surface processing apparatus and surface processing method

Plasma processing apparatus

Wafer processing apparatus and a wafer stage and a wafer processing...

Wafer processing apparatus and a wafer stage and a wafer processing...

SEMICONDUCTOR WAFER PROCESSING APPARATUS AND METHOD

Semiconductor wafer processing apparatus and method

Apparatus and method for plasma processing high-speed semiconductor...

Vacuum processing apparatus and a vacuum processing system

Vacuum processing apparatus and a vacuum processing system

Apparatus for processing samples

Apparatus for processing samples

Apparatus and method for plasma processing high-speed semiconductor...

Apparatus for processing samples

Apparatus and method for plasma processing high-speed semiconductor...

Method and apparatus for processing samples

Plasma processing apparatus

Plasma processing equipment and plasma processing method using the...

Plasma processing apparatus and method