Hiroyuki Matsuura

Person

Iwate, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition method and plasma processing apparatus
- Patent number 12,170,198
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,692,269
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,688,585
- Issue date Jun 27, 2023
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method for plasma processing
- Patent number 11,355,320
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus, heat treatment method, and program
- Patent number 10,186,429
- Issue date Jan 22, 2019
- Tokyo Electron Limited
- Yuichi Takenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus having ground electrode
- Patent number 9,970,111
- Issue date May 15, 2018
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treatment apparatus
- Patent number 9,105,672
- Issue date Aug 11, 2015
- Tokyo Electron Limited
- Hiroyuki Matsuura
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Film formation apparatus for semiconductor process and method for u...
- Patent number 8,646,407
- Issue date Feb 11, 2014
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,608,902
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical plasma processing apparatus for semiconductor process
- Patent number 8,394,200
- Issue date Mar 12, 2013
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treatment apparatus, treatment method, and storage medium
- Patent number 8,354,623
- Issue date Jan 15, 2013
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,336,490
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treating apparatus
- Patent number 8,267,041
- Issue date Sep 18, 2012
- Tokyo Electron Limited
- Toshiji Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure reduction process device, pressure reduction process metho...
- Patent number 8,051,870
- Issue date Nov 8, 2011
- Tokyo Electron Limited
- Hiroyuki Matsuura
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
CVD method in vertical CVD apparatus using different reactive gases
- Patent number 7,927,662
- Issue date Apr 19, 2011
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interferometer for demodulating differential M-phase shift keying s...
- Patent number 7,860,408
- Issue date Dec 28, 2010
- Fujitsu Limited
- Akihiko Isomura
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Delay interferometer and demodulator
- Patent number 7,848,662
- Issue date Dec 7, 2010
- Yokogawa Electric Corporation
- Yasuyuki Suzuki
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Vertical batch processing apparatus
- Patent number 7,815,739
- Issue date Oct 19, 2010
- Tokyo Electron Limited
- Hiroyuki Matsuura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,807,587
- Issue date Oct 5, 2010
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming silicon oxynitride film
- Patent number 7,632,757
- Issue date Dec 15, 2009
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of silicon nitride film
- Patent number 7,625,609
- Issue date Dec 1, 2009
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process tube for manufacturing semiconductor wafers
- Patent number D600659
- Issue date Sep 22, 2009
- Tokyo Electron Limited
- Hiroyuki Matsuura
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Pulse pattern generating apparatus
- Patent number 7,522,660
- Issue date Apr 21, 2009
- Yokogawa Electric Corporation
- Chie Sato
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for forming silicon oxide film
- Patent number 7,442,656
- Issue date Oct 28, 2008
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF electrode for a process tube of semiconductor manufacturing appa...
- Patent number D564462
- Issue date Mar 18, 2008
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Light modulation apparatus and light modulator control method
- Patent number 7,245,413
- Issue date Jul 17, 2007
- Yokogawa Electric Corporation
- Akira Miura
- G02 - OPTICS
Information Patent Grant
Method and apparatus for inspecting optical modules
- Patent number 7,102,738
- Issue date Sep 5, 2006
- The Furukawa Electric Co., Ltd.
- Hiroyuki Matsuura
- G01 - MEASURING TESTING
Information Patent Grant
Process tube for semiconductor device manufacturing apparatus
- Patent number D521464
- Issue date May 23, 2006
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Process tube for semiconductor device manufacturing apparatus
- Patent number D521465
- Issue date May 23, 2006
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Process tube for semiconductor device manufacturing apparatus
- Patent number D520467
- Issue date May 9, 2006
- Tokyo Electron Limited
- Katsutoshi Ishii
- D13 - Equipment for production, distribution, or transformation of energy

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240170265
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240018660
- Publication date Jan 18, 2024
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240014005
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240014013
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Nobuo MATSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230245870
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD
- Publication number 20230053083
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220223403
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220020572
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE SENSOR AND PLASMA PROCESSING APPARATUS
- Publication number 20220020571
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210142988
- Publication date May 13, 2021
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS
- Publication number 20210057217
- Publication date Feb 25, 2021
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200378005
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20190362946
- Publication date Nov 28, 2019
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND PROGRAM
- Publication number 20170154786
- Publication date Jun 1, 2017
- TOKYO ELECTRON LIMITED
- Yuichi Takenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150007772
- Publication date Jan 8, 2015
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING METHOD AND PROCESSING APPARATUS
- Publication number 20140290752
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT TREATMENT APPARATUS
- Publication number 20130034820
- Publication date Feb 7, 2013
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS AND METHOD FOR U...
- Publication number 20120263888
- Publication date Oct 18, 2012
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT INSTRUMENT, AND VERTICAL HEAT TREATMENT APPARATUS...
- Publication number 20120258414
- Publication date Oct 11, 2012
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE TRANSFER METHOD
- Publication number 20120249992
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOADING UNIT AND PROCESSING SYSTEM
- Publication number 20120251967
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120103525
- Publication date May 3, 2012
- TOKYO ELECTON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING APPARATUS AND FILM-FORMING METHOD
- Publication number 20100209624
- Publication date Aug 19, 2010
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100186898
- Publication date Jul 29, 2010
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20090305512
- Publication date Dec 10, 2009
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing apparatus and process method
- Publication number 20090184109
- Publication date Jul 23, 2009
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treatment apparatus, treatment method, and storage medium
- Publication number 20090145890
- Publication date Jun 11, 2009
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20090078201
- Publication date Mar 26, 2009
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20090056877
- Publication date Mar 5, 2009
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL CVD APPARATUS AND CVD METHOD USING THE SAME
- Publication number 20080213478
- Publication date Sep 4, 2008
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hiroyuki Matsuura

Person

Patents Grantslast 30 patents

Deposition method and plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method for plasma processing

Heat treatment apparatus, heat treatment method, and program

Substrate processing apparatus having ground electrode

Heat treatment apparatus

Film formation apparatus for semiconductor process and method for u...

Plasma processing apparatus

Vertical plasma processing apparatus for semiconductor process

Treatment apparatus, treatment method, and storage medium

Plasma processing apparatus

Plasma treating apparatus

Pressure reduction process device, pressure reduction process metho...

CVD method in vertical CVD apparatus using different reactive gases

Interferometer for demodulating differential M-phase shift keying s...

Delay interferometer and demodulator

Vertical batch processing apparatus

Substrate processing apparatus and substrate processing method

Method for forming silicon oxynitride film

Formation of silicon nitride film

Process tube for manufacturing semiconductor wafers

Pulse pattern generating apparatus

Method and apparatus for forming silicon oxide film

RF electrode for a process tube of semiconductor manufacturing appa...

Light modulation apparatus and light modulator control method

Method and apparatus for inspecting optical modules

Process tube for semiconductor device manufacturing apparatus

Process tube for semiconductor device manufacturing apparatus

Process tube for semiconductor device manufacturing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD

DEPOSITION METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

TEMPERATURE SENSOR AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA PROCESSING

HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND PROGRAM

SUBSTRATE PROCESSING APPARATUS

PROCESSING METHOD AND PROCESSING APPARATUS

HEAT TREATMENT APPARATUS

FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS AND METHOD FOR U...

SUBSTRATE SUPPORT INSTRUMENT, AND VERTICAL HEAT TREATMENT APPARATUS...

SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE TRANSFER METHOD

LOADING UNIT AND PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS

FILM-FORMING APPARATUS AND FILM-FORMING METHOD

PLASMA PROCESSING APPARATUS

Substrate Processing Apparatus and Substrate Processing Method

Processing apparatus and process method

Treatment apparatus, treatment method, and storage medium

VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS

Plasma processing apparatus

VERTICAL CVD APPARATUS AND CVD METHOD USING THE SAME