Hisashi Maejima

Person

Higashiyamato, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer having chamfered bend portions in the joint regions between t...
- Patent number RE40139
- Issue date Mar 4, 2008
- Renesas Technology Corp.
- Hisashi Maejima
- 438 - Semiconductor device manufacturing: process
Information Patent Grant
Process for fabrication of semiconductor device, semiconductor wafe...
- Patent number 6,174,222
- Issue date Jan 16, 2001
- Hitachi, Ltd.
- Tomomi Sato
- B24 - GRINDING POLISHING
Information Patent Grant
Semiconductor integrated circuit device fabrication method and its...
- Patent number 5,497,331
- Issue date Mar 5, 1996
- Hitachi, Ltd.
- Nobuyuki Iriki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing a wafer having a curved notch
- Patent number 5,279,992
- Issue date Jan 18, 1994
- Hitachi, Ltd.
- Hisashi Maejima
- C30 - CRYSTAL GROWTH
Information Patent Grant
Wafer having chamfered bend portions in the joint regions between t...
- Patent number 5,230,747
- Issue date Jul 27, 1993
- Hitachi, Ltd.
- Hisashi Maejima
- C30 - CRYSTAL GROWTH
Information Patent Grant
Exposure method and exposure apparatus
- Patent number 5,025,284
- Issue date Jun 18, 1991
- Hitachi, Ltd.
- Susumu Komoriya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and exposure apparatus
- Patent number 4,974,018
- Issue date Nov 27, 1990
- Hitachi, Ltd.
- Susumu Komoriya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer and method of working the same
- Patent number 4,783,225
- Issue date Nov 8, 1988
- Hitachi, Ltd.
- Hisashi Maejima
- C30 - CRYSTAL GROWTH
Information Patent Grant
Exposure method and exposure apparatus
- Patent number 4,699,505
- Issue date Oct 13, 1987
- Hitachi, Ltd.
- Susumu Komoriya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing system
- Patent number 4,544,318
- Issue date Oct 1, 1985
- Hitachi, Ltd.
- Hiroto Nagatomo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern exposing apparatus
- Patent number 4,477,182
- Issue date Oct 16, 1984
- Hitachi, Ltd.
- Akihiro Takanashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and apparatus for aligning photomask
- Patent number 4,218,136
- Issue date Aug 19, 1980
- Hitachi, Ltd.
- Susumu Komoriya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hisashi Maejima

Person

Patents Grantslast 30 patents

Wafer having chamfered bend portions in the joint regions between t...

Process for fabrication of semiconductor device, semiconductor wafe...

Semiconductor integrated circuit device fabrication method and its...

Method of producing a wafer having a curved notch

Wafer having chamfered bend portions in the joint regions between t...

Exposure method and exposure apparatus

Exposure method and exposure apparatus

Wafer and method of working the same

Exposure method and exposure apparatus

Manufacturing system

Pattern exposing apparatus

Method of and apparatus for aligning photomask