John V. Jensen

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Pseudo low volume reticle (PLVR) design for ASIC manufacturing
- Patent number 7,763,414
- Issue date Jul 27, 2010
- LSI Corporation
- John Jensen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for verifying the post-optical proximity corre...
- Patent number 7,325,222
- Issue date Jan 29, 2008
- LSI Logic Corporation
- Nadya G. Strelkova
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reducing reticle set cost
- Patent number 7,127,698
- Issue date Oct 24, 2006
- LSI Logic Corporation
- John Jensen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mixed LVR and HVR reticle set design for the processing of gate arr...
- Patent number 7,057,261
- Issue date Jun 6, 2006
- LSI Logic Corporation
- John Jensen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chromeless phase shift mask
- Patent number 7,005,217
- Issue date Feb 28, 2006
- LSI Logic Corporation
- George E. Bailey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mixed LVR and HVR reticle set design for the processing of gate arr...
- Patent number 6,900,075
- Issue date May 31, 2005
- LSI Logic Corporation
- John Jensen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for application of proximity correction with r...
- Patent number 6,532,585
- Issue date Mar 11, 2003
- LSI Logic Corporation
- Dusan Petranovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for application of proximity correction with u...
- Patent number 6,499,003
- Issue date Dec 24, 2002
- LSI Logic Corporation
- Edwin Jones
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Performing optical proximity correction with the aid of design rule...
- Patent number 6,282,696
- Issue date Aug 28, 2001
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction method and apparatus
- Patent number 6,269,472
- Issue date Jul 31, 2001
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for general systematic application of proximit...
- Patent number 6,175,953
- Issue date Jan 16, 2001
- LSI Logic Corporation
- Ranko Scepanovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of proximity correction with relative segmentation
- Patent number 6,174,630
- Issue date Jan 16, 2001
- LSI Logic Corporation
- Dusan Petranovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Performing optical proximity correction with the aid of design rule...
- Patent number 5,900,338
- Issue date May 4, 1999
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Performing optical proximity correction with the aid of design rule...
- Patent number 5,705,301
- Issue date Jan 6, 1998
- LSI Logic Corporation
- Mario Garza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-level resolution lithography
- Patent number 5,703,376
- Issue date Dec 30, 1997
- LSI Logic Corporation
- John V. Jensen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PSEUDO LOW VOLUME RETICLE (PLVR) DESIGN FOR ASIC MANUFACTURING
- Publication number 20090034830
- Publication date Feb 5, 2009
- LSI Corporation
- John Jensen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pseudo low volume reticle (PLVR) design for asic manufacturing
- Publication number 20060063076
- Publication date Mar 23, 2006
- John Jensen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for verifying ret latent image sensitivity to mask manufactu...
- Publication number 20050204328
- Publication date Sep 15, 2005
- Nadya G. Strelkova
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mixed LVR and HVR reticle set design for the processing of gate arr...
- Publication number 20050147913
- Publication date Jul 7, 2005
- LSI Logic Corporation
- John Jensen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIXED LVR AND HVR RETICLE SET DESIGN FOR THE PROCESSING OF GATE ARR...
- Publication number 20050093102
- Publication date May 5, 2005
- John Jensen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for reducing reticle set cost
- Publication number 20040210595
- Publication date Oct 21, 2004
- John Jensen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Chromeless phase shift mask
- Publication number 20040197674
- Publication date Oct 7, 2004
- George E. Bailey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR APPLICATION OF PROXIMITY CORRECTION WITH U...
- Publication number 20020004714
- Publication date Jan 10, 2002
- EDWIN JONES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

John V. Jensen

Person

Patents Grantslast 30 patents

Pseudo low volume reticle (PLVR) design for ASIC manufacturing

Method and apparatus for verifying the post-optical proximity corre...

Method for reducing reticle set cost

Mixed LVR and HVR reticle set design for the processing of gate arr...

Chromeless phase shift mask

Mixed LVR and HVR reticle set design for the processing of gate arr...

Method and apparatus for application of proximity correction with r...

Method and apparatus for application of proximity correction with u...

Performing optical proximity correction with the aid of design rule...

Optical proximity correction method and apparatus

Method and apparatus for general systematic application of proximit...

Method of proximity correction with relative segmentation

Performing optical proximity correction with the aid of design rule...

Performing optical proximity correction with the aid of design rule...

Multi-level resolution lithography

Patents Applicationslast 30 patents

PSEUDO LOW VOLUME RETICLE (PLVR) DESIGN FOR ASIC MANUFACTURING

Pseudo low volume reticle (PLVR) design for asic manufacturing

Method for verifying ret latent image sensitivity to mask manufactu...

Mixed LVR and HVR reticle set design for the processing of gate arr...

MIXED LVR AND HVR RETICLE SET DESIGN FOR THE PROCESSING OF GATE ARR...

Method for reducing reticle set cost

Chromeless phase shift mask

METHOD AND APPARATUS FOR APPLICATION OF PROXIMITY CORRECTION WITH U...