Jon Henri

Person

Linn, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective deposition of etch-stop layer for enhanced patterning
- Patent number 11,869,770
- Issue date Jan 9, 2024
- Lam Research Corporation
- Nagraj Shankar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective growth of metal-containing hardmask thin films
- Patent number 11,107,683
- Issue date Aug 31, 2021
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of etch-stop layer for enhanced patterning
- Patent number 11,094,542
- Issue date Aug 17, 2021
- Lam Research Corporation
- Nagraj Shankar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Suppressing interfacial reactions by varying the wafer temperature...
- Patent number 11,075,127
- Issue date Jul 27, 2021
- Lam Research Corporation
- Seshasayee Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective inhibition in atomic layer deposition of silicon-containi...
- Patent number 10,804,099
- Issue date Oct 13, 2020
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing films on sensitive substrates
- Patent number 10,741,458
- Issue date Aug 11, 2020
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective growth of metal-containing hardmask thin films
- Patent number 10,643,846
- Issue date May 5, 2020
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of etch-stop layer for enhanced patterning
- Patent number 10,566,194
- Issue date Feb 18, 2020
- Lam Research Corporation
- Nagraj Shankar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Suppressing interfacial reactions by varying the wafer temperature...
- Patent number 10,347,547
- Issue date Jul 9, 2019
- Lam Research Corporation
- Seshasayee Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 10,043,655
- Issue date Aug 7, 2018
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing ALD films using halide-based precursors
- Patent number 10,020,188
- Issue date Jul 10, 2018
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing films on sensitive substrates
- Patent number 10,008,428
- Issue date Jun 26, 2018
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective inhibition in atomic layer deposition of silicon-containi...
- Patent number 9,875,891
- Issue date Jan 23, 2018
- Lam Research Corporation
- Jon Henri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing metals free ald silicon nitride films using h...
- Patent number 9,824,884
- Issue date Nov 21, 2017
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing films on sensitive substrates
- Patent number 9,786,570
- Issue date Oct 10, 2017
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a chlorine-free conformal SiN film
- Patent number 9,670,579
- Issue date Jun 6, 2017
- Novellus Systems, Inc.
- Dennis Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for encapsulating a chalcogenide material
- Patent number 9,601,693
- Issue date Mar 21, 2017
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing ammonia free and chlorine free conformal silic...
- Patent number 9,589,790
- Issue date Mar 7, 2017
- Lam Research Corporation
- Jon Henri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 9,570,274
- Issue date Feb 14, 2017
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective inhibition in atomic layer deposition of silicon-containi...
- Patent number 9,564,312
- Issue date Feb 7, 2017
- Lam Research Corporation
- Jon Henri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of conformal films by atomic layer deposition and atomic...
- Patent number 9,502,238
- Issue date Nov 22, 2016
- Lam Research Corporation
- Michal Danek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to integrate a halide-containing ALD film on sensitive mater...
- Patent number 9,385,318
- Issue date Jul 5, 2016
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing films on sensitive substrates
- Patent number 9,287,113
- Issue date Mar 15, 2016
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of depositing smooth and conformal ashable hard mask films
- Patent number 9,240,320
- Issue date Jan 19, 2016
- Novellus Systems, Inc.
- Pramod Subramonium
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma activated conformal film deposition
- Patent number 9,230,800
- Issue date Jan 5, 2016
- Novellus Systems, Inc.
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatuses for uniform reduction of the in-feature wet...
- Patent number 9,214,333
- Issue date Dec 15, 2015
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma enhanced atomic layer deposition with pulsed plasma exposure
- Patent number 9,076,646
- Issue date Jul 7, 2015
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a chlorine-free conformal sin film
- Patent number 9,070,555
- Issue date Jun 30, 2015
- Novellus Systems, Inc.
- Dennis Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature controlled showerhead for high temperature operations
- Patent number 9,034,142
- Issue date May 19, 2015
- Novellus Systems, Inc.
- Christopher M. Bartlett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 8,999,859
- Issue date Apr 7, 2015
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF
- Publication number 20250014890
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL SILICON OXIDE DEPOSITION USING AMINOSILANE AND CHLOROSILA...
- Publication number 20240410053
- Publication date Dec 12, 2024
- LAM RESEARCH CORPORATION
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING
- Publication number 20240387226
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Aaron Blake MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOELECTRON ASSISTED PLASMA IGNITION
- Publication number 20230207274
- Publication date Jun 29, 2023
- LAM RESEARCH CORPORATION
- Lee CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH MODULUS BORON-BASED CERAMICS FOR SEMICONDUCTOR APPLICATIONS
- Publication number 20230112746
- Publication date Apr 13, 2023
- LAM RESEARCH CORPORATION
- Ananda K. BANERJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK ENCAPSULATION TO PREVENT DEGRADATION DURING FABRICATION OF HIG...
- Publication number 20220406610
- Publication date Dec 22, 2022
- LAM RESEARCH CORPORATION
- Kapu Sirish REDDY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...
- Publication number 20220199417
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Jon HENRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING
- Publication number 20210358753
- Publication date Nov 18, 2021
- LAM RESEARCH CORPORATION
- Nagraj Shankar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE GROWTH OF METAL-CONTAINING HARDMASK THIN FILMS
- Publication number 20200227260
- Publication date Jul 16, 2020
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING
- Publication number 20200168466
- Publication date May 28, 2020
- LAM RESEARCH CORPORATION
- Nagraj Shankar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE...
- Publication number 20200066607
- Publication date Feb 27, 2020
- LAM RESEARCH CORPORATION
- Seshasayee Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE GROWTH OF METAL-CONTAINING HARDMASK THIN FILMS
- Publication number 20200006073
- Publication date Jan 2, 2020
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING
- Publication number 20190341256
- Publication date Nov 7, 2019
- LAM RESEARCH CORPORATION
- Nagraj Shankar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES
- Publication number 20180247875
- Publication date Aug 30, 2018
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE INHIBITION IN ATOMIC LAYER DEPOSITION OF SILICON-CONTAINI...
- Publication number 20180138028
- Publication date May 17, 2018
- LAM RESEARCH CORPORATION
- Jon Henri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING ALD FILMS USING HALIDE-BASED PRECURSORS
- Publication number 20180102245
- Publication date Apr 12, 2018
- LAM RESEARCH CORPORATION
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE...
- Publication number 20180047645
- Publication date Feb 15, 2018
- LAM RESEARCH CORPORATION
- Seshasayee Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES
- Publication number 20170316988
- Publication date Nov 2, 2017
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
- Publication number 20170148628
- Publication date May 25, 2017
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE INHIBITION IN ATOMIC LAYER DEPOSITION OF SILICON-CONTAINI...
- Publication number 20170117134
- Publication date Apr 27, 2017
- LAM RESEARCH CORPORATION
- Jon Henri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR ENCAPSULATING A CHALCOGENIDE MATERIAL
- Publication number 20170092856
- Publication date Mar 30, 2017
- LAM RESEARCH CORPORATION
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF CONFORMAL FILMS BY ATOMIC LAYER DEPOSITION AND ATOMIC...
- Publication number 20160293398
- Publication date Oct 6, 2016
- LAM RESEARCH CORPORATION
- Michal Danek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES
- Publication number 20160155676
- Publication date Jun 2, 2016
- Novellus Systems, Inc.
- Hu Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE INHIBITION IN ATOMIC LAYER DEPOSITION OF SILICON-CONTAINI...
- Publication number 20160148800
- Publication date May 26, 2016
- LAM RESEARCH CORPORATION
- Jon Henri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING AMMONIA FREE AND CHLORINE FREE CONFORMAL SILIC...
- Publication number 20160148806
- Publication date May 26, 2016
- LAM RESEARCH CORPORATION
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING A CHLORINE-FREE CONFORMAL SIN FILM
- Publication number 20150259791
- Publication date Sep 17, 2015
- Novellus Systems, Inc.
- Dennis Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE CONTROLLED SHOWERHEAD FOR HIGH TEMPERATURE OPERATIONS
- Publication number 20150218701
- Publication date Aug 6, 2015
- Novellus Systems, Inc.
- Christopher M. Bartlett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
- Publication number 20150206719
- Publication date Jul 23, 2015
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
- Publication number 20140216337
- Publication date Aug 7, 2014
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ACTIVATED CONFORMAL FILM DEPOSITION
- Publication number 20140209562
- Publication date Jul 31, 2014
- Novellus Systems, Inc.
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Selective deposition of etch-stop layer for enhanced patterning

Selective growth of metal-containing hardmask thin films

Selective deposition of etch-stop layer for enhanced patterning

Suppressing interfacial reactions by varying the wafer temperature...

Selective inhibition in atomic layer deposition of silicon-containi...

Methods for depositing films on sensitive substrates

Selective growth of metal-containing hardmask thin films

Selective deposition of etch-stop layer for enhanced patterning

Suppressing interfacial reactions by varying the wafer temperature...

Plasma activated conformal dielectric film deposition

Method for depositing ALD films using halide-based precursors

Methods for depositing films on sensitive substrates

Selective inhibition in atomic layer deposition of silicon-containi...

Method for depositing metals free ald silicon nitride films using h...

Methods for depositing films on sensitive substrates

Method for depositing a chlorine-free conformal SiN film

Method for encapsulating a chalcogenide material

Method of depositing ammonia free and chlorine free conformal silic...

Plasma activated conformal dielectric film deposition

Selective inhibition in atomic layer deposition of silicon-containi...

Deposition of conformal films by atomic layer deposition and atomic...

Method to integrate a halide-containing ALD film on sensitive mater...

Methods for depositing films on sensitive substrates

Methods of depositing smooth and conformal ashable hard mask films

Plasma activated conformal film deposition

Methods and apparatuses for uniform reduction of the in-feature wet...

Plasma enhanced atomic layer deposition with pulsed plasma exposure

Method for depositing a chlorine-free conformal sin film

Temperature controlled showerhead for high temperature operations

Plasma activated conformal dielectric film deposition

Patents Applicationslast 30 patents

CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF

CONFORMAL SILICON OXIDE DEPOSITION USING AMINOSILANE AND CHLOROSILA...

REMOTE PLASMA DEPOSITION WITH ELECTROSTATIC CLAMPING

PHOTOELECTRON ASSISTED PLASMA IGNITION

HIGH MODULUS BORON-BASED CERAMICS FOR SEMICONDUCTOR APPLICATIONS

MASK ENCAPSULATION TO PREVENT DEGRADATION DURING FABRICATION OF HIG...

CARBON BASED DEPOSITIONS USED FOR CRITICAL DIMENSION CONTROL DURING...

SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING

SELECTIVE GROWTH OF METAL-CONTAINING HARDMASK THIN FILMS

SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING

SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE...

SELECTIVE GROWTH OF METAL-CONTAINING HARDMASK THIN FILMS

SELECTIVE DEPOSITION OF ETCH-STOP LAYER FOR ENHANCED PATTERNING

METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES

SELECTIVE INHIBITION IN ATOMIC LAYER DEPOSITION OF SILICON-CONTAINI...

METHOD FOR DEPOSITING ALD FILMS USING HALIDE-BASED PRECURSORS

SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE...

METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES

PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION

SELECTIVE INHIBITION IN ATOMIC LAYER DEPOSITION OF SILICON-CONTAINI...

METHOD FOR ENCAPSULATING A CHALCOGENIDE MATERIAL

DEPOSITION OF CONFORMAL FILMS BY ATOMIC LAYER DEPOSITION AND ATOMIC...

METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES

SELECTIVE INHIBITION IN ATOMIC LAYER DEPOSITION OF SILICON-CONTAINI...

METHOD OF DEPOSITING AMMONIA FREE AND CHLORINE FREE CONFORMAL SILIC...

METHOD FOR DEPOSITING A CHLORINE-FREE CONFORMAL SIN FILM

TEMPERATURE CONTROLLED SHOWERHEAD FOR HIGH TEMPERATURE OPERATIONS

PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION

PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION

PLASMA ACTIVATED CONFORMAL FILM DEPOSITION