Joseph Kennedy

Person

Morristown, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fill material to mitigate pattern collapse
- Patent number 10,727,044
- Issue date Jul 28, 2020
- Honeywell International Inc.
- Desaraju Varaprasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gap filling dielectric materials
- Patent number 10,544,330
- Issue date Jan 28, 2020
- Honeywell International Inc.
- Yamini Pandey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-reflective coating for photolithography and methods of prepara...
- Patent number 9,069,133
- Issue date Jun 30, 2015
- Honeywell International Inc.
- Teresa Baldwin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective coatings for via fill and photolithography applicati...
- Patent number 8,992,806
- Issue date Mar 31, 2015
- Honeywell International Inc.
- Bo Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Spin-on anti-reflective coatings for photolithography
- Patent number 8,889,334
- Issue date Nov 18, 2014
- Honeywell International Inc.
- Joseph T Kennedy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Processable inorganic and organic polymer formulations, methods of...
- Patent number 8,859,673
- Issue date Oct 14, 2014
- Honeywell International, Inc.
- Edward Rutter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions, coatings and films for tri-layer patterning applicati...
- Patent number 8,642,246
- Issue date Feb 4, 2014
- Honeywell International Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on anti-reflective coatings for photolithography
- Patent number 8,344,088
- Issue date Jan 1, 2013
- Honeywell International Inc.
- Joseph T. Kennedy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coatings and hard mask compositions for integrated circuit applicat...
- Patent number 8,101,015
- Issue date Jan 24, 2012
- Honeywell International Inc.
- Joseph Kennedy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective coatings for via fill and photolithography applicati...
- Patent number 8,053,159
- Issue date Nov 8, 2011
- Honeywell International Inc.
- Bo Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Bottom antireflective coatings exhibiting enhanced wet strip rates,...
- Patent number 7,955,782
- Issue date Jun 7, 2011
- Honeywell International Inc.
- Sudip Mukhopadhyay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Planarization films for advanced microelectronic applications and d...
- Patent number 7,910,223
- Issue date Mar 22, 2011
- Honeywell International Inc.
- Wei Huang
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Coating composition optimization for via fill and photolithography...
- Patent number 7,867,331
- Issue date Jan 11, 2011
- Honeywell International Inc.
- Joseph Kennedy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 7,678,462
- Issue date Mar 16, 2010
- Honeywell International, Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 7,012,125
- Issue date Mar 14, 2006
- Honeywell International Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,969,753
- Issue date Nov 29, 2005
- Honeywell International Inc.
- Teresa Baldwin
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,956,097
- Issue date Oct 18, 2005
- Honeywell International Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,824,879
- Issue date Nov 30, 2004
- Honeywell International Inc.
- Teresa Baldwin
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for eliminating reaction between photoresist and OSG
- Patent number 6,818,552
- Issue date Nov 16, 2004
- Honeywell International, Inc.
- Brian J. Daniels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of sacrificial inorganic dielectrics for dual damascene process...
- Patent number 6,812,131
- Issue date Nov 2, 2004
- Honeywell International Inc.
- Joseph Travis Kennedy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for eliminating reaction between photoresist and OSG
- Patent number 6,583,047
- Issue date Jun 24, 2003
- Honeywell International, Inc.
- Brian J. Daniels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,506,497
- Issue date Jan 14, 2003
- Honeywell International Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on-glass anti-reflective coatings for photolithography
- Patent number 6,365,765
- Issue date Apr 2, 2002
- Honeywell International Inc.
- Teresa Baldwin
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on glass anti-reflective coatings for photolithography
- Patent number 6,268,457
- Issue date Jul 31, 2001
- Allied-Signal, Inc.
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist ashing process for organic and inorganic polymer dielec...
- Patent number 6,207,583
- Issue date Mar 27, 2001
- AlliedSignal Inc.
- Jude Dunne
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POLYIMIDE FOR FLEXIBLE DISPLAYS, FLEXIBLE DISPLAYS, AND METHODS FOR...
- Publication number 20190127529
- Publication date May 2, 2019
- HONEYWELL INTERNATIONAL INC.
- Ya Qun Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILL MATERIAL TO MITIGATE PATTERN COLLAPSE
- Publication number 20190088470
- Publication date Mar 21, 2019
- HONEYWELL INTERNATIONAL INC.
- Desaraju Varaprasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAP FILLING DIELECTRIC MATERIALS
- Publication number 20180208796
- Publication date Jul 26, 2018
- HONEYWELL INTERNATIONAL INC.
- Yamini Pandey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBOSILANE POLYMERS
- Publication number 20170355826
- Publication date Dec 14, 2017
- HONEYWELL INTERNATIONAL INC.
- Yamini Pandey
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATI...
- Publication number 20170260419
- Publication date Sep 14, 2017
- HONEYWELL INTERNATIONAL INC.
- Nancy E. Iwamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
LIQUID TITANIUM OXIDE COMPOSITIONS, METHODS FOR FORMING THE SAME, A...
- Publication number 20160148814
- Publication date May 26, 2016
- HONEYWELL INTERNATIONAL INC.
- Helen X. Xu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Anti-Reflective Coating for Photolithography and Methods of Prepara...
- Publication number 20140227538
- Publication date Aug 14, 2014
- Honeywell International Inc.
- Teresa Baldwin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Spin-On Anti-Reflective Coatings for Photolithography
- Publication number 20130164677
- Publication date Jun 27, 2013
- Honeywell International Inc.
- Joseph T. Kennedy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Coatings and Hard Mask Compositions for Integrated Circuit Applicat...
- Publication number 20120070689
- Publication date Mar 22, 2012
- JOSEPH TRAVIS KENNEDY
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Antireflective Coatings for Via Fill and Photolithography Applicati...
- Publication number 20120001135
- Publication date Jan 5, 2012
- Bo Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PROCESSABLE INORGANIC AND ORGANIC POLYMER FORMULATIONS, METHODS OF...
- Publication number 20110054119
- Publication date Mar 3, 2011
- Honeywell International Inc.
- Edward Rutter
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BOTTOM ANTIREFLECTIVE COATINGS EXHIBITING ENHANCED WET STRIP RATES,...
- Publication number 20100075248
- Publication date Mar 25, 2010
- Honeywell International Inc.
- Sudip Mukhopadhyay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spin-on-Glass Anti-Reflective Coatings for Photolithography
- Publication number 20090275694
- Publication date Nov 5, 2009
- Honeywell International Inc.
- Teresa Baldwin-Hendricks
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Compositions, coatings and films for tri-layer patterning applicati...
- Publication number 20080206690
- Publication date Aug 28, 2008
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Compositions, layers and films for optoelectronic devices, methods...
- Publication number 20080157065
- Publication date Jul 3, 2008
- Ahila Krishnamoorthy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Coating Composition Optimization for Via Fill and Photolithography...
- Publication number 20070272123
- Publication date Nov 29, 2007
- Joseph Kennedy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Coatings and hard mask compositions for integrated circuit applicat...
- Publication number 20070022909
- Publication date Feb 1, 2007
- Joseph Kennedy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Sacrificial layers comprising water-soluble compounds, uses and met...
- Publication number 20060154485
- Publication date Jul 13, 2006
- Bo Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Planarization films for advanced microelectronic applications and d...
- Publication number 20060106160
- Publication date May 18, 2006
- Honeywell International Inc.
- Wei Huang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20050245717
- Publication date Nov 3, 2005
- Joseph Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Layered components, materials, methods of production and uses thereof
- Publication number 20050238889
- Publication date Oct 27, 2005
- Nancy Iwamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Antireflective coatings for via fill and photolithography applicati...
- Publication number 20050171277
- Publication date Aug 4, 2005
- Bo Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Spin-on anti-reflective coatings for photolithography
- Publication number 20050058929
- Publication date Mar 17, 2005
- Joseph T Kennedy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for eliminating reaction between photoresist and OSG
- Publication number 20050042860
- Publication date Feb 24, 2005
- Brian J. Daniels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20030120018
- Publication date Jun 26, 2003
- Teresa Baldwin
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for eliminating reaction between photoresist and OSG
- Publication number 20030032274
- Publication date Feb 13, 2003
- Brian J. Daniels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20020128388
- Publication date Sep 12, 2002
- AlliedSignal Inc.
- Joseph Kennedy
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20020095018
- Publication date Jul 18, 2002
- Teresa Baldwin
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Method for eliminating reaction between photoresist and OSG
- Publication number 20020081834
- Publication date Jun 27, 2002
- Honeywell International Inc.
- Brian J. Daniels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spin-on-glass anti-reflective coatings for photolithography
- Publication number 20020055000
- Publication date May 9, 2002
- Honeywell International Inc.
- Joseph Kennedy
- C03 - GLASS MINERAL OR SLAG WOOL

Joseph Kennedy

Person

Patents Grantslast 30 patents

Fill material to mitigate pattern collapse

Gap filling dielectric materials

Anti-reflective coating for photolithography and methods of prepara...

Antireflective coatings for via fill and photolithography applicati...

Spin-on anti-reflective coatings for photolithography

Processable inorganic and organic polymer formulations, methods of...

Compositions, coatings and films for tri-layer patterning applicati...

Spin-on anti-reflective coatings for photolithography

Coatings and hard mask compositions for integrated circuit applicat...

Antireflective coatings for via fill and photolithography applicati...

Bottom antireflective coatings exhibiting enhanced wet strip rates,...

Planarization films for advanced microelectronic applications and d...

Coating composition optimization for via fill and photolithography...

Spin-on-glass anti-reflective coatings for photolithography

Spin-on-glass anti-reflective coatings for photolithography

Spin-on-glass anti-reflective coatings for photolithography

Spin-on-glass anti-reflective coatings for photolithography

Spin-on-glass anti-reflective coatings for photolithography

Method for eliminating reaction between photoresist and OSG

Use of sacrificial inorganic dielectrics for dual damascene process...

Method for eliminating reaction between photoresist and OSG

Spin-on-glass anti-reflective coatings for photolithography

Spin-on-glass anti-reflective coatings for photolithography

Spin-on glass anti-reflective coatings for photolithography

Photoresist ashing process for organic and inorganic polymer dielec...

Patents Applicationslast 30 patents

POLYIMIDE FOR FLEXIBLE DISPLAYS, FLEXIBLE DISPLAYS, AND METHODS FOR...

FILL MATERIAL TO MITIGATE PATTERN COLLAPSE

GAP FILLING DIELECTRIC MATERIALS

CARBOSILANE POLYMERS

POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATI...

LIQUID TITANIUM OXIDE COMPOSITIONS, METHODS FOR FORMING THE SAME, A...

Anti-Reflective Coating for Photolithography and Methods of Prepara...

Spin-On Anti-Reflective Coatings for Photolithography

Coatings and Hard Mask Compositions for Integrated Circuit Applicat...

Antireflective Coatings for Via Fill and Photolithography Applicati...

PROCESSABLE INORGANIC AND ORGANIC POLYMER FORMULATIONS, METHODS OF...

BOTTOM ANTIREFLECTIVE COATINGS EXHIBITING ENHANCED WET STRIP RATES,...

Spin-on-Glass Anti-Reflective Coatings for Photolithography

Compositions, coatings and films for tri-layer patterning applicati...

Compositions, layers and films for optoelectronic devices, methods...

Coating Composition Optimization for Via Fill and Photolithography...

Coatings and hard mask compositions for integrated circuit applicat...

Sacrificial layers comprising water-soluble compounds, uses and met...

Planarization films for advanced microelectronic applications and d...

Spin-on-glass anti-reflective coatings for photolithography

Layered components, materials, methods of production and uses thereof

Antireflective coatings for via fill and photolithography applicati...

Spin-on anti-reflective coatings for photolithography

Method for eliminating reaction between photoresist and OSG

Spin-on-glass anti-reflective coatings for photolithography

Method for eliminating reaction between photoresist and OSG

Spin-on-glass anti-reflective coatings for photolithography

Spin-on-glass anti-reflective coatings for photolithography

Method for eliminating reaction between photoresist and OSG

Spin-on-glass anti-reflective coatings for photolithography