Jun Yoshikawa

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming an electronic structure using reforming gas, syst...
- Patent number 11,908,684
- Issue date Feb 20, 2024
- ASM IP Holding B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma device using coaxial waveguide, and substrate treatment method
- Patent number 11,605,528
- Issue date Mar 14, 2023
- ASM IP Holding B.V.
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an electronic structure using reforming gas, syst...
- Patent number 11,476,109
- Issue date Oct 18, 2022
- ASM IP Holding B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,456,157
- Issue date Sep 27, 2022
- Tokyo Electron Limited
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna, plasma processing device and plasma processing method
- Patent number 10,832,892
- Issue date Nov 10, 2020
- Tokyo Electron Limited
- Kazuki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave control method
- Patent number 10,679,826
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,566,174
- Issue date Feb 18, 2020
- Tokyo Electron Limited
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,504,698
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Masayuki Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,312,057
- Issue date Jun 4, 2019
- Tokyo Electron Limited
- Masayuki Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna and plasma processing apparatus
- Patent number 10,083,819
- Issue date Sep 25, 2018
- Tokyo Electron Limited
- Naoki Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 10,062,547
- Issue date Aug 28, 2018
- Tokyo Electron Limited
- Naoki Mihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 9,970,109
- Issue date May 15, 2018
- Tokyo Electron Limited
- Jun Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing base body to be processed
- Patent number 9,728,417
- Issue date Aug 8, 2017
- Tokyo Electron Limited
- Masaki Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,659,754
- Issue date May 23, 2017
- Tokyo Electron Limited
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna, dielectric window, plasma processing apparatus and plasma...
- Patent number 9,595,425
- Issue date Mar 14, 2017
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,574,270
- Issue date Feb 21, 2017
- Tokyo Electron Limited
- Jun Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,343,270
- Issue date May 17, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,324,542
- Issue date Apr 26, 2016
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma treatment and method for plasma treatment
- Patent number 9,277,637
- Issue date Mar 1, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Dielectric window for plasma treatment device, and plasma treatment...
- Patent number 9,048,070
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric window for plasma processing apparatus, plasma processin...
- Patent number 8,988,012
- Issue date Mar 24, 2015
- Tokyo Electron Limited
- Wataru Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,920,596
- Issue date Dec 30, 2014
- Tokyo Electron Limited
- Naoki Mihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,753,475
- Issue date Jun 17, 2014
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus and film deposition method
- Patent number 8,696,814
- Issue date Apr 15, 2014
- Tokyo Electron Limited
- Eisuke Morisaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Baffle plate
- Patent number D697038
- Issue date Jan 7, 2014
- Tokyo Electron Limited
- Naoki Matsumoto
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Baffle plate for manufacturing semiconductor
- Patent number D694790
- Issue date Dec 3, 2013
- Tokyo Electron Limited
- Naoki Matsumoto
- D15 - Machines not elsewhere specified
Information Patent Grant
Baffle plate for manufacturing semiconductor
- Patent number D694791
- Issue date Dec 3, 2013
- Tokyo Electron Limited
- Naoki Matsumoto
- D15 - Machines not elsewhere specified
Information Patent Grant
Film deposition apparatus and method
- Patent number 8,440,270
- Issue date May 14, 2013
- Tokyo Electron Limited
- Eisuke Morisaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric window for plasma processing device
- Patent number D672377
- Issue date Dec 11, 2012
- Tokyo Electron Limited
- Wataru Yoshikawa
- D15 - Machines not elsewhere specified
Information Patent Grant
Dielectric window for plasma processing device
- Patent number D645486
- Issue date Sep 20, 2011
- Tokyo Electron Limited
- Wataru Yoshikawa
- D15 - Machines not elsewhere specified

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...
- Publication number 20240162037
- Publication date May 16, 2024
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...
- Publication number 20230005734
- Publication date Jan 5, 2023
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DEVICE USING COAXIAL WAVEGUIDE, AND SUBSTRATE TREATMENT METHOD
- Publication number 20210013010
- Publication date Jan 14, 2021
- ASM IP Holding B.V.
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...
- Publication number 20200395209
- Publication date Dec 17, 2020
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200161090
- Publication date May 21, 2020
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA, PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20200058468
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Kazuki TAKAHASHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE CONTROL METHOD
- Publication number 20180019103
- Publication date Jan 18, 2018
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20160362789
- Publication date Dec 15, 2016
- TOKYO ELECTRON LIMITED
- Jun Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160358756
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Michitaka AITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160126066
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160126114
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Masayuki KOHNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160118224
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Masayuki KOHNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150294839
- Publication date Oct 15, 2015
- TOKYO ELECTRON LIMITED
- Hiroyuki TAKABA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150228459
- Publication date Aug 13, 2015
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150211125
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20150206712
- Publication date Jul 23, 2015
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC WINDOW, ANTENNA AND PLASMA PROCESSING APPARATUS
- Publication number 20150155139
- Publication date Jun 4, 2015
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS
- Publication number 20150013913
- Publication date Jan 15, 2015
- TOKYO ELECTRON LIMITED
- Toshihiko IWAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING BASE BODY TO BE PROCESSED
- Publication number 20150017811
- Publication date Jan 15, 2015
- Masaki Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140338602
- Publication date Nov 20, 2014
- Naoki MIHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...
- Publication number 20140312767
- Publication date Oct 23, 2014
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140238607
- Publication date Aug 28, 2014
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140231016
- Publication date Aug 21, 2014
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140124478
- Publication date May 8, 2014
- TOKYO ELECTRON LIMITED
- Jun YOSHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20140080311
- Publication date Mar 20, 2014
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT
- Publication number 20130302992
- Publication date Nov 14, 2013
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC WINDOW FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSIN...
- Publication number 20130093321
- Publication date Apr 18, 2013
- TOKYO ELECTRON LIMITED
- Wataru Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA, DIELECTRIC WINDOW, PLASMA PROCESSING APPARATUS AND PLASMA...
- Publication number 20130008607
- Publication date Jan 10, 2013
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120241090
- Publication date Sep 27, 2012
- TOKYO ELECTRON LIMITED
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110048642
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Naoki MIHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Jun Yoshikawa

Person

Patents Grantslast 30 patents

Method of forming an electronic structure using reforming gas, syst...

Plasma device using coaxial waveguide, and substrate treatment method

Method of forming an electronic structure using reforming gas, syst...

Plasma processing apparatus

Antenna, plasma processing device and plasma processing method

Microwave control method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Antenna and plasma processing apparatus

Plasma processing apparatus

Substrate processing method and substrate processing apparatus

Method for processing base body to be processed

Plasma processing apparatus and plasma processing method

Antenna, dielectric window, plasma processing apparatus and plasma...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Apparatus for plasma treatment and method for plasma treatment

Dielectric window for plasma treatment device, and plasma treatment...

Dielectric window for plasma processing apparatus, plasma processin...

Plasma processing apparatus

Plasma processing apparatus

Film deposition apparatus and film deposition method

Baffle plate

Baffle plate for manufacturing semiconductor

Baffle plate for manufacturing semiconductor

Film deposition apparatus and method

Dielectric window for plasma processing device

Dielectric window for plasma processing device

Patents Applicationslast 30 patents

METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...

METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...

PLASMA DEVICE USING COAXIAL WAVEGUIDE, AND SUBSTRATE TREATMENT METHOD

METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...

PLASMA PROCESSING APPARATUS

ANTENNA, PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

MICROWAVE CONTROL METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

ANTENNA AND PLASMA PROCESSING APPARATUS

DIELECTRIC WINDOW, ANTENNA AND PLASMA PROCESSING APPARATUS

MICROWAVE PLASMA PROCESSING APPARATUS

METHOD FOR PROCESSING BASE BODY TO BE PROCESSED

PLASMA PROCESSING APPARATUS

DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

APPARATUS FOR PLASMA TREATMENT AND METHOD FOR PLASMA TREATMENT

DIELECTRIC WINDOW FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSIN...

ANTENNA, DIELECTRIC WINDOW, PLASMA PROCESSING APPARATUS AND PLASMA...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS