Kam S. Law

Person

Union City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Auto-sequencing multi-directional inline processing method
- Patent number 9,287,152
- Issue date Mar 15, 2016
- Orbotech LT Solar, LLC.
- Wendell Thomas Blonigan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Auto-sequencing inline processing apparatus
- Patent number 8,672,603
- Issue date Mar 18, 2014
- Orbotech LT Solar, LLC.
- Wendell Thomas Blonigan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Showerhead assembly for plasma processing chamber
- Patent number 8,617,349
- Issue date Dec 31, 2013
- Orbotech LT Solar, LLC.
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Auto-sequencing multi-directional inline processing apparatus
- Patent number 8,444,364
- Issue date May 21, 2013
- Orbotech LT Solar, LLC.
- Wendell Thomas Blonigan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for supporting a glass substrate to improve uniform depositi...
- Patent number 7,732,010
- Issue date Jun 8, 2010
- Applied Materials, Inc.
- Soo Young Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of silicon layers for active matrix liquid crystal displ...
- Patent number 7,439,191
- Issue date Oct 21, 2008
- Applied Materials, Inc.
- Kam Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing porous films
- Patent number 7,220,685
- Issue date May 22, 2007
- Cecilia Y. Mak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing porous films
- Patent number 7,132,374
- Issue date Nov 7, 2006
- Cecilia Y. Mak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma display panel with a low K dielectric layer
- Patent number 7,122,962
- Issue date Oct 17, 2006
- Applied Materials, Inc.
- Kam S. Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical integrated circuits (ICs)
- Patent number 7,087,179
- Issue date Aug 8, 2006
- Applied Materials, Inc.
- Cecilia Y. Mak
- G02 - OPTICS
Information Patent Grant
Method for plasma etching a dielectric layer
- Patent number 7,056,830
- Issue date Jun 6, 2006
- Applied Materials, Inc.
- Walter R. Merry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for metallization of large area substrates
- Patent number 7,029,529
- Issue date Apr 18, 2006
- Applied Materials, Inc.
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
On-site cleaning gas generation for process chamber cleaning
- Patent number 6,981,508
- Issue date Jan 3, 2006
- Applied Materials, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for electrostatically maintaining substrate fl...
- Patent number 6,902,682
- Issue date Jun 7, 2005
- Applied Materials, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods to form metal lines using selective electrochemical deposition
- Patent number 6,887,776
- Issue date May 3, 2005
- Applied Materials, Inc.
- Quanyuan Shang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine process for cleaning semiconductor process chamber
- Patent number 6,880,561
- Issue date Apr 19, 2005
- Applied Materials, Inc.
- Haruhiro Harry Goto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of passivation layers for active matrix liquid crystal d...
- Patent number 6,869,838
- Issue date Mar 22, 2005
- Applied Materials, Inc.
- Kam Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple frequency plasma chamber with grounding capacitor at cathode
- Patent number 6,857,387
- Issue date Feb 22, 2005
- Applied Materials, Inc.
- Sheng Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
On-site cleaning gas generation for process chamber cleaning
- Patent number 6,843,258
- Issue date Jan 18, 2005
- Applied Materials, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of film layers by alternately pulsing a precursor and hi...
- Patent number 6,825,134
- Issue date Nov 30, 2004
- Applied Materials, Inc.
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for forming a silicon film across the surface...
- Patent number 6,818,529
- Issue date Nov 16, 2004
- Applied Materials, Inc.
- Robert Bachrach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface-treated shower head for use in a substrate processing chamber
- Patent number 6,647,993
- Issue date Nov 18, 2003
- Applied Komatsu Technology, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma display panel with a low k dielectric layer
- Patent number 6,610,354
- Issue date Aug 26, 2003
- Applied Materials, Inc.
- Kam S. Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for electrostatically maintaining subtrate flatness
- Patent number 6,500,265
- Issue date Dec 31, 2002
- Applied Materials, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selectively etching silicon using fluorine without plasma
- Patent number 6,500,356
- Issue date Dec 31, 2002
- Applied Materials, Inc.
- Haruhiro Harry Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for white powder reduction in silicon nitride...
- Patent number 6,468,601
- Issue date Oct 22, 2002
- Applied Komatsu Technology, Inc.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of TEOS oxide using pulsed RF plasma
- Patent number 6,451,390
- Issue date Sep 17, 2002
- Applied Materials, Inc.
- Haruhiro H. Goto
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for depositing amorphous silicon thin films onto large area...
- Patent number 6,444,277
- Issue date Sep 3, 2002
- Applied Materials, Inc.
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition using a finger type shadow frame
- Patent number 6,355,108
- Issue date Mar 12, 2002
- Applied Komatsu Technology, Inc.
- Tae Kyung Won
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing amorphous silicon based films having controlle...
- Patent number 6,352,910
- Issue date Mar 5, 2002
- Applied Komatsu Technology, Inc.
- William R. Harshbarger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
AUTO-SEQUENCING MULTI-DIRECTIONAL INLINE PROCESSING METHOD
- Publication number 20130294678
- Publication date Nov 7, 2013
- Orbotech LT Solar, LLC.
- Wendell Thomas Blonigan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUSCEPTOR FOR PLASMA PROCESSING CHAMBER
- Publication number 20110315081
- Publication date Dec 29, 2011
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AUTO-SEQUENCING MULTI-DIRECTIONAL INLINE PROCESSING APPARATUS
- Publication number 20110142573
- Publication date Jun 16, 2011
- Wendell Thomas BLONIGAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AUTO-SEQUENCING INLINE PROCESSING APPARATUS
- Publication number 20110142572
- Publication date Jun 16, 2011
- Wendell Thomas BLONIGAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD ASSEMBLY FOR PLASMA PROCESSING CHAMBER
- Publication number 20110088847
- Publication date Apr 21, 2011
- Kam S. LAW
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical vapor deposition apparatus and electrode plate thereof
- Publication number 20070151516
- Publication date Jul 5, 2007
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for depositing porous films
- Publication number 20060252278
- Publication date Nov 9, 2006
- Cecilia Y. Mak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Anodized substrate support
- Publication number 20060185795
- Publication date Aug 24, 2006
- APPLIED MATERIALS, INC.
- Soo Young Choi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method for depositing porous films
- Publication number 20060040507
- Publication date Feb 23, 2006
- Cecilia Y. Mak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for electrostatically maintaining substrate fl...
- Publication number 20050272273
- Publication date Dec 8, 2005
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and system for control of processing conditions in plasma pr...
- Publication number 20050220984
- Publication date Oct 6, 2005
- APPLIED MATERIALS INC., a Delaware corporation
- Sheng Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTICAL INTEGRATED CIRCUITS (ICS)
- Publication number 20050115921
- Publication date Jun 2, 2005
- Cecilia Y. Mak
- G02 - OPTICS
Information Patent Application
Method for plasma etching a dielectric layer
- Publication number 20050048789
- Publication date Mar 3, 2005
- Walter R. Merry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Anodized substrate support
- Publication number 20040221959
- Publication date Nov 11, 2004
- APPLIED MATERIALS, INC.
- Soo Young Choi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
On-site cleaning gas generation for process chamber cleaning
- Publication number 20040216768
- Publication date Nov 4, 2004
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS TO FORM METAL LINES USING SELECTIVE ELECTROCHEMICAL DEPOSITION
- Publication number 20040203181
- Publication date Oct 14, 2004
- Quanyuan Shang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for forming a silicon film across the surface...
- Publication number 20040056332
- Publication date Mar 25, 2004
- APPLIED MATERIALS, INC.
- Robert Bachrach
- G02 - OPTICS
Information Patent Application
Method and apparatus for metallization of large area substrates
- Publication number 20040058067
- Publication date Mar 25, 2004
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Pre-polycoating of glass substrates
- Publication number 20030219540
- Publication date Nov 27, 2003
- Kam S. Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma display panel with a low k dielectric layer
- Publication number 20030218424
- Publication date Nov 27, 2003
- APPLIED MATERIALS, INC.
- Kam S. Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluorine process for cleaning semiconductor process chamber
- Publication number 20030192569
- Publication date Oct 16, 2003
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of gate metallization for active matrix liquid crystal d...
- Publication number 20030194825
- Publication date Oct 16, 2003
- Kam Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of passivation layers for active matrix liquid crystal d...
- Publication number 20030189232
- Publication date Oct 9, 2003
- APPLIED MATERIALS, INC.
- Kam Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition of silicon layers for active matrix liquid crystal displ...
- Publication number 20030189208
- Publication date Oct 9, 2003
- Kam Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of film layers
- Publication number 20030186561
- Publication date Oct 2, 2003
- APPLIED MATERIALS, INC.
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for substrate processing
- Publication number 20030141820
- Publication date Jul 31, 2003
- APPLIED MATERIALS, INC.
- John M. White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selectively etching silicon using fluorine without plasma
- Publication number 20030109144
- Publication date Jun 12, 2003
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for electrostatically maintaining substrate fl...
- Publication number 20030070616
- Publication date Apr 17, 2003
- APPLIED MATERIALS, INC.
- Quanyuan Shang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for enhanced chamber cleaning
- Publication number 20030066541
- Publication date Apr 10, 2003
- Sheng Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUORINE PROCESS FOR CLEANING SEMICONDUCTOR PROCESS CHAMBER
- Publication number 20030010354
- Publication date Jan 16, 2003
- APPLIED MATERIALS, INC.
- HARUHIRO HARRY GOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Auto-sequencing multi-directional inline processing method

Auto-sequencing inline processing apparatus

Showerhead assembly for plasma processing chamber

Auto-sequencing multi-directional inline processing apparatus

Method for supporting a glass substrate to improve uniform depositi...

Deposition of silicon layers for active matrix liquid crystal displ...

Method for depositing porous films

Method for depositing porous films

Plasma display panel with a low K dielectric layer

Optical integrated circuits (ICs)

Method for plasma etching a dielectric layer

Method and apparatus for metallization of large area substrates

On-site cleaning gas generation for process chamber cleaning

Method and apparatus for electrostatically maintaining substrate fl...

Methods to form metal lines using selective electrochemical deposition

Fluorine process for cleaning semiconductor process chamber

Deposition of passivation layers for active matrix liquid crystal d...

Multiple frequency plasma chamber with grounding capacitor at cathode

On-site cleaning gas generation for process chamber cleaning

Deposition of film layers by alternately pulsing a precursor and hi...

Apparatus and method for forming a silicon film across the surface...

Surface-treated shower head for use in a substrate processing chamber

Plasma display panel with a low k dielectric layer

Apparatus for electrostatically maintaining subtrate flatness

Selectively etching silicon using fluorine without plasma

Apparatus and method for white powder reduction in silicon nitride...

Deposition of TEOS oxide using pulsed RF plasma

Method for depositing amorphous silicon thin films onto large area...

Film deposition using a finger type shadow frame

Method of depositing amorphous silicon based films having controlle...

Patents Applicationslast 30 patents

AUTO-SEQUENCING MULTI-DIRECTIONAL INLINE PROCESSING METHOD

SUSCEPTOR FOR PLASMA PROCESSING CHAMBER

AUTO-SEQUENCING MULTI-DIRECTIONAL INLINE PROCESSING APPARATUS

AUTO-SEQUENCING INLINE PROCESSING APPARATUS

SHOWERHEAD ASSEMBLY FOR PLASMA PROCESSING CHAMBER

Chemical vapor deposition apparatus and electrode plate thereof

Method for depositing porous films

Anodized substrate support

Method for depositing porous films

Method and apparatus for electrostatically maintaining substrate fl...

Method and system for control of processing conditions in plasma pr...

OPTICAL INTEGRATED CIRCUITS (ICS)

Method for plasma etching a dielectric layer

Anodized substrate support

On-site cleaning gas generation for process chamber cleaning

METHODS TO FORM METAL LINES USING SELECTIVE ELECTROCHEMICAL DEPOSITION

Apparatus and method for forming a silicon film across the surface...

Method and apparatus for metallization of large area substrates

Pre-polycoating of glass substrates

Plasma display panel with a low k dielectric layer

Fluorine process for cleaning semiconductor process chamber

Deposition of gate metallization for active matrix liquid crystal d...

Deposition of passivation layers for active matrix liquid crystal d...

Deposition of silicon layers for active matrix liquid crystal displ...

Deposition of film layers

Method and apparatus for substrate processing

Selectively etching silicon using fluorine without plasma

Method and apparatus for electrostatically maintaining substrate fl...

Method and apparatus for enhanced chamber cleaning

FLUORINE PROCESS FOR CLEANING SEMICONDUCTOR PROCESS CHAMBER