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Katsuhide WATANABE
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Eddy current sensor
Patent number
12,076,834
Issue date
Sep 3, 2024
Ebara Corporation
Atsushi Abe
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate processing apparatus, substrate processing system, and su...
Patent number
12,062,563
Issue date
Aug 13, 2024
Ebara Corporation
Itsuki Kobata
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate processing control system, substrate processing control m...
Patent number
12,036,634
Issue date
Jul 16, 2024
Ebara Corporation
Koichi Takeda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Polishing head system and polishing apparatus
Patent number
12,017,323
Issue date
Jun 25, 2024
Ebara Corporation
Itsuki Kobata
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate polishing apparatus, method of creating thickness map, an...
Patent number
11,833,636
Issue date
Dec 5, 2023
Ebara Corporation
Katsuhide Watanabe
B24 - GRINDING POLISHING
Information
Patent Grant
Magnetic element and eddy current sensor using the same
Patent number
11,759,912
Issue date
Sep 19, 2023
Ebara Corporation
Taro Takahashi
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing head system and polishing apparatus
Patent number
11,673,222
Issue date
Jun 13, 2023
Ebara Corporation
Katsuhide Watanabe
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing machine and a polishing method for a substrate
Patent number
11,465,254
Issue date
Oct 11, 2022
Ebara Corporation
Itsuki Kobata
B24 - GRINDING POLISHING
Information
Patent Grant
Substrate processing apparatus, substrate processing system, and su...
Patent number
11,450,544
Issue date
Sep 20, 2022
Ebara Corporation
Itsuki Kobata
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus, substrate processing system, and su...
Patent number
10,665,487
Issue date
May 26, 2020
Ebara Corporation
Itsuki Kobata
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus and substrate processing method
Patent number
10,500,691
Issue date
Dec 10, 2019
Ebara Corporation
Masayoshi Imai
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing method
Patent number
10,056,277
Issue date
Aug 21, 2018
Ebara Corporation
Yoichi Kobayashi
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus and polished-state monitoring method
Patent number
9,999,955
Issue date
Jun 19, 2018
Ebara Corporation
Yoichi Kobayashi
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus
Patent number
9,687,955
Issue date
Jun 27, 2017
Ebara Corporation
Katsuhide Watanabe
B24 - GRINDING POLISHING
Information
Patent Grant
Method of adjusting profile of a polishing member used in a polishi...
Patent number
9,156,130
Issue date
Oct 13, 2015
Ebara Corporation
Takahiro Shimano
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus having substrate holding apparatus
Patent number
9,149,903
Issue date
Oct 6, 2015
Ebara Corporation
Makoto Fukushima
B24 - GRINDING POLISHING
Information
Patent Grant
Method of obtaining a sliding distance distribution of a dresser on...
Patent number
9,108,292
Issue date
Aug 18, 2015
Ebara Corporation
Takahiro Shimano
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus having thermal energy measuring means
Patent number
9,073,170
Issue date
Jul 7, 2015
Ebara Corporation
Makoto Fukushima
B24 - GRINDING POLISHING
Information
Patent Grant
Elastic membrane for semiconductor wafer polishing
Patent number
D729753
Issue date
May 19, 2015
Ebara Corporation
Makoto Fukushima
D13 - Equipment for production, distribution, or transformation of energy
Information
Patent Grant
Method of polishing a substrate having a film on a surface of the s...
Patent number
8,951,813
Issue date
Feb 10, 2015
Ebara Corporation
Takeshi Iizumi
B24 - GRINDING POLISHING
Information
Patent Grant
Polishing apparatus having thermal energy measuring means
Patent number
8,932,106
Issue date
Jan 13, 2015
Ebara Corporation
Makoto Fukushima
B24 - GRINDING POLISHING
Information
Patent Grant
Elastic membrane
Patent number
8,859,070
Issue date
Oct 14, 2014
Ebara Corporation
Hozumi Yasuda
B24 - GRINDING POLISHING
Information
Patent Grant
Elastic membrane for semiconductor wafer polishing
Patent number
D711330
Issue date
Aug 19, 2014
Ebara Corporation
Makoto Fukushima
D13 - Equipment for production, distribution, or transformation of energy
Information
Patent Grant
Apparatus for dressing a polishing pad, chemical mechanical polishi...
Patent number
8,382,558
Issue date
Feb 26, 2013
Ebara Corporation
Katsuhide Watanabe
B24 - GRINDING POLISHING
Information
Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
Patent number
D633452
Issue date
Mar 1, 2011
Ebara Corporation
Keisuke Namiki
D13 - Equipment for production, distribution, or transformation of energy
Information
Patent Grant
Electron beam apparatus and method for manufacturing semiconductor...
Patent number
7,372,027
Issue date
May 13, 2008
Tokyo Electron Limited
Atsushi Ando
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Vibration isolating apparatus for table for mounting device sensiti...
Patent number
6,536,735
Issue date
Mar 25, 2003
Ebara Corporation
Takahide Haga
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Grant
Magnetic levitation control apparatus
Patent number
6,515,388
Issue date
Feb 4, 2003
Ebara Corporation
Shinichi Moriyama
H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information
Patent Grant
Stage positioning device
Patent number
6,437,864
Issue date
Aug 20, 2002
Ebara Corporation
Katsuhide Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Polishing apparatus
Patent number
6,183,342
Issue date
Feb 6, 2001
Ebara Corporation
Katsuhide Watanabe
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Patents Applications
last 30 patents
Information
Patent Application
SUBSTRATE PROCESSING CONTROL SYSTEM, SUBSTRATE PROCESSING CONTROL M...
Publication number
20240316720
Publication date
Sep 26, 2024
EBARA CORPORATION
Koichi TAKEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS AND INFORMATION PROCESSING SYSTEM
Publication number
20240308018
Publication date
Sep 19, 2024
EBARA CORPORATION
Yuta SUZUKI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD
Publication number
20240087963
Publication date
Mar 14, 2024
EBARA CORPORATION
Akira FUKUNAGA
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SU...
Publication number
20220375775
Publication date
Nov 24, 2022
EBARA CORPORATION
Itsuki KOBATA
B24 - GRINDING POLISHING
Information
Patent Application
CONTROL METHOD FOR PROCESSING OF A SUBSTRATE
Publication number
20220266414
Publication date
Aug 25, 2022
KIOXIA Corporation
Tsutomu MIKI
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS
Publication number
20220266418
Publication date
Aug 25, 2022
EBARA CORPORATION
Yuta Suzuki
B24 - GRINDING POLISHING
Information
Patent Application
OUTPUT SIGNAL PROCESSING APPARATUS FOR EDDY CURRENT SENSOR
Publication number
20220063056
Publication date
Mar 3, 2022
EBARA CORPORATION
Atsushi ABE
G01 - MEASURING TESTING
Information
Patent Application
POLISHING HEAD SYSTEM AND POLISHING APPARATUS
Publication number
20210308823
Publication date
Oct 7, 2021
EBARA CORPORATION
Katsuhide Watanabe
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING HEAD SYSTEM AND POLISHING APPARATUS
Publication number
20210237224
Publication date
Aug 5, 2021
EBARA CORPORATION
Itsuki Kobata
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD
Publication number
20210166967
Publication date
Jun 3, 2021
EBARA CORPORATION
Akira FUKUNAGA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE POLISHING APPARATUS, METHOD OF CREATING THICKNESS MAP, AN...
Publication number
20210101250
Publication date
Apr 8, 2021
EBARA CORPORATION
Katsuhide Watanabe
B24 - GRINDING POLISHING
Information
Patent Application
EDDY CURRENT SENSOR
Publication number
20210001447
Publication date
Jan 7, 2021
EBARA CORPORATION
Atsushi Abe
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SU...
Publication number
20200243364
Publication date
Jul 30, 2020
EBARA CORPORATION
Itsuki KOBATA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR SPECIFYING AREA TO B...
Publication number
20200223027
Publication date
Jul 16, 2020
EBARA CORPORATION
Katsuhide WATANABE
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING MACHINE AND A POLISHING METHOD FOR A SUBSTRATE
Publication number
20200171618
Publication date
Jun 4, 2020
EBARA CORPORATION
Itsuki KOBATA
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE PROCESSING CONTROL SYSTEM, SUBSTRATE PROCESSING CONTROL M...
Publication number
20190240799
Publication date
Aug 8, 2019
EBARA CORPORATION
Koichi TAKEDA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MAGNETIC ELEMENT AND EDDY CURRENT SENSOR USING THE SAME
Publication number
20190193242
Publication date
Jun 27, 2019
EBARA CORPORATION
Taro TAKAHASHI
B24 - GRINDING POLISHING
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM INCL...
Publication number
20180286717
Publication date
Oct 4, 2018
EBARA CORPORATION
Katsuhide WATANABE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Publication number
20180056470
Publication date
Mar 1, 2018
EBARA CORPORATION
Masayoshi IMAI
C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information
Patent Application
POLISHING MACHINE AND A POLISHING METHOD FOR A SUBSTRATE
Publication number
20170259395
Publication date
Sep 14, 2017
EBARA CORPORATION
Itsuki KOBATA
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING APPARATUS
Publication number
20170252889
Publication date
Sep 7, 2017
EBARA CORPORATION
Katsuhide WATANABE
B24 - GRINDING POLISHING
Information
Patent Application
POLISHING METHOD
Publication number
20170148655
Publication date
May 25, 2017
EBARA CORPORATION
Yoichi KOBAYASHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM. AND SU...
Publication number
20170047237
Publication date
Feb 16, 2017
EBARA CORPORATION
Itsuki KOBATA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
A METHOD OF POLISHING A SUBSTRATE HAVING A FILM ON A SURFACE OF THE...
Publication number
20150111314
Publication date
Apr 23, 2015
EBARA CORPORATION
Takeshi IIZUMI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POLISHING APPARATUS AND METHOD
Publication number
20150093968
Publication date
Apr 2, 2015
EBARA CORPORATION
Makoto FUKUSHIMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POLISHING APPARATUS AND METHOD
Publication number
20150093971
Publication date
Apr 2, 2015
EBARA CORPORATION
Makoto FUKUSHIMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
POLISHING APPARATUS AND POLISHED-STATE MONITORING METHOD
Publication number
20150017887
Publication date
Jan 15, 2015
EBARA CORPORATION
Yoichi KOBAYASHI
G01 - MEASURING TESTING
Information
Patent Application
FILM-THICKNESS MEASURING APPARATUS, FILM-THICKNESS MEASURING METHOD...
Publication number
20150017880
Publication date
Jan 15, 2015
EBARA CORPORATION
Toshikazu NOMURA
G01 - MEASURING TESTING
Information
Patent Application
METHOD OF OBTAINING A SLIDING DISTANCE DISTRIBUTION OF A DRESSER ON...
Publication number
20140342642
Publication date
Nov 20, 2014
Takahiro SHIMANO
B24 - GRINDING POLISHING
Information
Patent Application
METHOD OF ADJUSTING PROFILE OF A POLISHING MEMBER USED IN A POLISHI...
Publication number
20140287653
Publication date
Sep 25, 2014
Takahiro SHIMANO
B24 - GRINDING POLISHING