Katsuhiko Murakami

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Multilayer film reflector, method of manufacturing multilayer film...
- Patent number 10,126,660
- Issue date Nov 13, 2018
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV light source, EUV exposure apparatus, and electronic device man...
- Patent number 8,809,818
- Issue date Aug 19, 2014
- Nikon Corporation
- Katsuhiko Murakami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical element, exposure apparatus using this, and device manufact...
- Patent number 8,121,254
- Issue date Feb 21, 2012
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection-optical systems and exposure apparatus comprising same
- Patent number 7,773,196
- Issue date Aug 10, 2010
- Nikon Corporation
- Murakami Katsuhiko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV light source, EUV exposure equipment, and semiconductor device...
- Patent number 7,741,616
- Issue date Jun 22, 2010
- Nikon Corporation
- Katsuhiko Murakami
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multilayer mirror, method for manufacturing the same, and exposure...
- Patent number 7,706,058
- Issue date Apr 27, 2010
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Laser plasma EUV light source, target material, tape material, a me...
- Patent number 7,456,417
- Issue date Nov 25, 2008
- Nikon Corporation
- Katsuhiko Murakami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multilayer mirror, method for manufacturing the same, and exposure...
- Patent number 7,440,182
- Issue date Oct 21, 2008
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Extreme ultraviolet exposure apparatus and vacuum chamber
- Patent number 7,417,708
- Issue date Aug 26, 2008
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Collector optical system, light source unit, illumination optical a...
- Patent number 7,385,212
- Issue date Jun 10, 2008
- Nikon Corporation
- Katsuhiko Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV multilayer mirror with phase shifting layer
- Patent number 7,382,527
- Issue date Jun 3, 2008
- Nikon Corporation
- Noriaki Kandaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus and methods for surficial milling of selected regions on...
- Patent number 6,909,774
- Issue date Jun 21, 2005
- Nikon Corporation
- Tetsuya Oshino
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
High-luminosity EUV-source devices for use in extreme ultraviolet (...
- Patent number 6,861,656
- Issue date Mar 1, 2005
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer-film reflective mirrors, extreme UV microlithography app...
- Patent number 6,522,716
- Issue date Feb 18, 2003
- Nikon Corporation
- Katsuhiko Murakami
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective-type soft x-ray microscope
- Patent number 6,522,717
- Issue date Feb 18, 2003
- Nikon Corporation
- Katsuhiko Murakami
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
X-ray-generation devices, X-ray microlithography apparatus comprisi...
- Patent number 6,507,641
- Issue date Jan 14, 2003
- Nikon Corporation
- Hiroyuki Kondo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-layered mirror
- Patent number 6,441,963
- Issue date Aug 27, 2002
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mirror for soft x-ray exposure apparatus
- Patent number 6,377,655
- Issue date Apr 23, 2002
- Nikon Corporation
- Katsuhiko Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection masks, microlithography apparatus using same, and integr...
- Patent number 6,333,961
- Issue date Dec 25, 2001
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-layered mirror
- Patent number 6,295,164
- Issue date Sep 25, 2001
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-layer X-ray-reflecting mirrors with reduced internal stress
- Patent number 6,160,867
- Issue date Dec 12, 2000
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element, production method of optical element, optical syst...
- Patent number 5,581,605
- Issue date Dec 3, 1996
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflecting photo mask for x-ray exposure and method for manufacturi...
- Patent number 5,572,564
- Issue date Nov 5, 1996
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Immersion nozzle for continuous casting
- Patent number 5,501,430
- Issue date Mar 26, 1996
- NKK Corporation
- Yuichi Yamaoka
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Reflection mask for X ray
- Patent number 5,399,448
- Issue date Mar 21, 1995
- Nikon Corporation
- Hiroshi Nagata
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multi-layered mirror
- Patent number 5,239,566
- Issue date Aug 24, 1993
- Nikon Corporation
- Hiroshi Nakamura
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYER REFLECTIVE MIRROR, METHOD FOR PRODUCING SAME, AND EXPOSU...
- Publication number 20170052290
- Publication date Feb 23, 2017
- Nikon Corporation
- Katsuhiko Murakami
- G02 - OPTICS
Information Patent Application
MULTILAYER FILM REFLECTOR, METHOD OF MANUFACTURING MULTILAYER FILM...
- Publication number 20160246178
- Publication date Aug 25, 2016
- Nikon Corporation
- Noriaki KANDAKA
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT, EXPOSURE APPARATUS USING THIS, AND DEVICE MANUFACT...
- Publication number 20100190113
- Publication date Jul 29, 2010
- NIKON CORPORATION
- Katsuhiko Murakami
- G02 - OPTICS
Information Patent Application
EUV light source, EUV exposure apparatus, and electronic device man...
- Publication number 20100097593
- Publication date Apr 22, 2010
- Nikon Corporation
- Katsuhiko Murakami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multilayer mirror, method for manufacturing the same, and exposure...
- Publication number 20090097104
- Publication date Apr 16, 2009
- Nikon Corporation
- Noriaki Kandaka
- G02 - OPTICS
Information Patent Application
OPTICAL APPARATUS, MULTILAYER-FILM REFLECTIVE MIRROR, EXPOSURE APPA...
- Publication number 20080266651
- Publication date Oct 30, 2008
- Katsuhiko Murakami
- G02 - OPTICS
Information Patent Application
OPTICAL APPARATUS, MULTILAYER-FILM REFLECTIVE MIRROR, EXPOSURE APPA...
- Publication number 20080268380
- Publication date Oct 30, 2008
- Katsuhiko Murakami
- G02 - OPTICS
Information Patent Application
Optical element, exposure apparatus using the same, and device manu...
- Publication number 20080123073
- Publication date May 29, 2008
- NIKON CORPORATION
- Masayuki Shiraishi
- G02 - OPTICS
Information Patent Application
Euv Light Source, Euv Exposure Equipment, And Semiconductor Device...
- Publication number 20080068575
- Publication date Mar 20, 2008
- Katsuhiko Murakami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multilayer mirror, method for manufacturing the same, and exposure...
- Publication number 20080049307
- Publication date Feb 28, 2008
- Nikon Corporation
- Nariaki Kandaka
- G02 - OPTICS
Information Patent Application
Projection-optical systems and exposure apparatus comprising same
- Publication number 20070222964
- Publication date Sep 27, 2007
- NIKON CORPORATION
- Murakami Katsuhiko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Laser plasma EUV light source, target material, tape material, a me...
- Publication number 20070007469
- Publication date Jan 11, 2007
- Katsuhiko Murakami
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multilayer mirror, method for manufacturing the same, and exposure...
- Publication number 20060192147
- Publication date Aug 31, 2006
- Nikon Corporation
- Noriaki Kandaka
- G02 - OPTICS
Information Patent Application
Collector optical system, light source unit, illumination optical a...
- Publication number 20060120429
- Publication date Jun 8, 2006
- Nikon Corporation
- Katsuhiko Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme ultraviolet exposure apparatus and vacuum chamber
- Publication number 20050213069
- Publication date Sep 29, 2005
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multilayer reflective mirrors for EUV, wavefront-aberration-correct...
- Publication number 20050157384
- Publication date Jul 21, 2005
- NIKON CORPORATION
- Masayuki Shiraishi
- G02 - OPTICS
Information Patent Application
Optical unit and X-ray exposure system
- Publication number 20050147204
- Publication date Jul 7, 2005
- Nikon Corporation
- Hiroyuki Kondo
- G02 - OPTICS
Information Patent Application
High-luminosity EUV-source devices for use in extreme ultraviolet (...
- Publication number 20030223544
- Publication date Dec 4, 2003
- NIKON CORPORATION
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Application
Self-cleaning reflective optical elements for use in X-ray optical...
- Publication number 20030147058
- Publication date Aug 7, 2003
- NIKON CORPORATION
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multilayer-film mirrors for use in extreme UV optical systems, and...
- Publication number 20030081722
- Publication date May 1, 2003
- NIKON CORPORATION
- Noriaki Kandaka
- G02 - OPTICS
Information Patent Application
Apparatus and methods for surficial milling of selected regions on...
- Publication number 20030058986
- Publication date Mar 27, 2003
- NIKON CORPORATION
- Tetsuya Oshino
- B82 - NANO-TECHNOLOGY
Information Patent Application
Radiation-generating devices utilizing multiple plasma-discharge so...
- Publication number 20030053588
- Publication date Mar 20, 2003
- NIKON CORPORATION
- Hiroyuki Kondo
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multilayer reflective mirrors for EUV, wavefront-aberration-correct...
- Publication number 20020171922
- Publication date Nov 21, 2002
- NIKON CORPORATION
- Masayuki Shiraishi
- G02 - OPTICS
Information Patent Application
Multi-layered mirror
- Publication number 20010033421
- Publication date Oct 25, 2001
- Nikon Corporation
- Katsuhiko Murakami
- B82 - NANO-TECHNOLOGY

Katsuhiko Murakami

Person

Patents Grantslast 30 patents

Multilayer film reflector, method of manufacturing multilayer film...

EUV light source, EUV exposure apparatus, and electronic device man...

Optical element, exposure apparatus using this, and device manufact...

Projection-optical systems and exposure apparatus comprising same

EUV light source, EUV exposure equipment, and semiconductor device...

Multilayer mirror, method for manufacturing the same, and exposure...

Laser plasma EUV light source, target material, tape material, a me...

Multilayer mirror, method for manufacturing the same, and exposure...

Extreme ultraviolet exposure apparatus and vacuum chamber

Collector optical system, light source unit, illumination optical a...

EUV multilayer mirror with phase shifting layer

Apparatus and methods for surficial milling of selected regions on...

High-luminosity EUV-source devices for use in extreme ultraviolet (...

Multilayer-film reflective mirrors, extreme UV microlithography app...

Reflective-type soft x-ray microscope

X-ray-generation devices, X-ray microlithography apparatus comprisi...

Multi-layered mirror

Reflective mirror for soft x-ray exposure apparatus

Reflection masks, microlithography apparatus using same, and integr...

Multi-layered mirror

Multi-layer X-ray-reflecting mirrors with reduced internal stress

Optical element, production method of optical element, optical syst...

Reflecting photo mask for x-ray exposure and method for manufacturi...

Immersion nozzle for continuous casting

Reflection mask for X ray

Multi-layered mirror

Patents Applicationslast 30 patents

MULTILAYER REFLECTIVE MIRROR, METHOD FOR PRODUCING SAME, AND EXPOSU...

MULTILAYER FILM REFLECTOR, METHOD OF MANUFACTURING MULTILAYER FILM...

OPTICAL ELEMENT, EXPOSURE APPARATUS USING THIS, AND DEVICE MANUFACT...

EUV light source, EUV exposure apparatus, and electronic device man...

Multilayer mirror, method for manufacturing the same, and exposure...

OPTICAL APPARATUS, MULTILAYER-FILM REFLECTIVE MIRROR, EXPOSURE APPA...

OPTICAL APPARATUS, MULTILAYER-FILM REFLECTIVE MIRROR, EXPOSURE APPA...

Optical element, exposure apparatus using the same, and device manu...

Euv Light Source, Euv Exposure Equipment, And Semiconductor Device...

Multilayer mirror, method for manufacturing the same, and exposure...

Projection-optical systems and exposure apparatus comprising same

Laser plasma EUV light source, target material, tape material, a me...

Multilayer mirror, method for manufacturing the same, and exposure...

Collector optical system, light source unit, illumination optical a...

Extreme ultraviolet exposure apparatus and vacuum chamber

Multilayer reflective mirrors for EUV, wavefront-aberration-correct...

Optical unit and X-ray exposure system

High-luminosity EUV-source devices for use in extreme ultraviolet (...

Self-cleaning reflective optical elements for use in X-ray optical...

Multilayer-film mirrors for use in extreme UV optical systems, and...

Apparatus and methods for surficial milling of selected regions on...

Radiation-generating devices utilizing multiple plasma-discharge so...

Multilayer reflective mirrors for EUV, wavefront-aberration-correct...

Multi-layered mirror