Katsumi Oomori

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 7,147,984
- Issue date Dec 12, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yukawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,890,697
- Issue date May 10, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,869,745
- Issue date Mar 22, 2005
- Tokyo Ohka Kogyo, Co., Inc.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,818,380
- Issue date Nov 16, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for the preparation of a semiconductor device
- Patent number 6,777,158
- Issue date Aug 17, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,773,863
- Issue date Aug 10, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Crosslinked positive-working photoresist composition
- Patent number 6,630,282
- Issue date Oct 7, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working chemical-amplification photoresist composition and...
- Patent number 6,548,229
- Issue date Apr 15, 2003
- Tokyo Ohka Kogyo, Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,485,887
- Issue date Nov 26, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,387,587
- Issue date May 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,340,553
- Issue date Jan 22, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working chemical-amplification photoresist composition and...
- Patent number 6,284,430
- Issue date Sep 4, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for formation of patterned resist layer
- Patent number 6,255,041
- Issue date Jul 3, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization resist composition
- Patent number 6,245,930
- Issue date Jun 12, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam negative working resist composition
- Patent number 6,153,354
- Issue date Nov 28, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuhiko Katsumata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithographic resist
- Patent number 6,087,068
- Issue date Jul 11, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist laminate and method for patterning using the same
- Patent number 6,083,665
- Issue date Jul 4, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-amplification-type negative resist composition
- Patent number 6,042,988
- Issue date Mar 28, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization resist composition
- Patent number 5,976,760
- Issue date Nov 2, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithographic resist
- Patent number 5,939,510
- Issue date Aug 17, 1999
- Tokyo Ohka Kogya Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist laminate and method for patterning using the same
- Patent number 5,925,495
- Issue date Jul 20, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithography
- Patent number 5,908,738
- Issue date Jun 1, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 5,789,136
- Issue date Aug 4, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoating composition for photolithography
- Patent number 5,756,255
- Issue date May 26, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 5,700,625
- Issue date Dec 23, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20040191677
- Publication date Sep 30, 2004
- Hiroto Yukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for the preparation of a semiconductor device
- Publication number 20040067615
- Publication date Apr 8, 2004
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20040023163
- Publication date Feb 5, 2004
- Hiroto Yukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20030152865
- Publication date Aug 14, 2003
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20020119393
- Publication date Aug 29, 2002
- Hiroto Yukawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working chemical-amplification photoresist composition and...
- Publication number 20020090567
- Publication date Jul 11, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Method for the preparation of a semiconductor device
- Publication number 20020045133
- Publication date Apr 18, 2002
- Satoshi Maemori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Crosslinked positive-working photoresist composition
- Publication number 20020034704
- Publication date Mar 21, 2002
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working photoresist composition
- Publication number 20020031722
- Publication date Mar 14, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20020028407
- Publication date Mar 7, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Katsumi Oomori

Person

Patents Grantslast 30 patents

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Method for the preparation of a semiconductor device

Method for the preparation of a semiconductor device

Positive-working chemical-amplification photoresist composition

Crosslinked positive-working photoresist composition

Positive-working chemical-amplification photoresist composition and...

Positive-working photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working photoresist composition

Positive-working chemical-amplification photoresist composition and...

Method for formation of patterned resist layer

Chemical-sensitization resist composition

Electron beam negative working resist composition

Undercoating composition for photolithographic resist

Photoresist laminate and method for patterning using the same

Chemical-amplification-type negative resist composition

Chemical-sensitization resist composition

Undercoating composition for photolithographic resist

Photoresist laminate and method for patterning using the same

Undercoating composition for photolithography

Negative-working photoresist composition

Undercoating composition for photolithography

Negative-working photoresist composition

Patents Applicationslast 30 patents

Positive-working chemical-amplification photoresist composition

Method for the preparation of a semiconductor device

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition and...

Method for the preparation of a semiconductor device

Crosslinked positive-working photoresist composition

Positive-working photoresist composition

Positive-working chemical-amplification photoresist composition