Kazuyoshi Mizutani

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method and resist composition
- Patent number 10,126,653
- Issue date Nov 13, 2018
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laminate, kit for manufacturing organic semiconductor, and resist c...
- Patent number 9,929,376
- Issue date Mar 27, 2018
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,709,892
- Issue date Jul 18, 2017
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 9,551,935
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern forming method using the same
- Patent number 8,785,104
- Issue date Jul 22, 2014
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern forming method, and resist composition, developer and rinsi...
- Patent number 8,603,733
- Issue date Dec 10, 2013
- FUJIFILM Corporation
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,349,535
- Issue date Jan 8, 2013
- FUJIFILM Corporation
- Kana Fujii
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 8,142,977
- Issue date Mar 27, 2012
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 8,092,977
- Issue date Jan 10, 2012
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern forming method using the same
- Patent number 8,084,187
- Issue date Dec 27, 2011
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, resist composition to be used in the patter...
- Patent number 8,034,547
- Issue date Oct 11, 2011
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, and resist composition, developer and rinsi...
- Patent number 8,017,304
- Issue date Sep 13, 2011
- FUJIFILM Corporation
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern-forming method using the same
- Patent number 7,989,137
- Issue date Aug 2, 2011
- FUJIFILM Corporation
- Shuji Hirano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,923,196
- Issue date Apr 12, 2011
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,887,988
- Issue date Feb 15, 2011
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive composition and pattern-forming method using the same
- Patent number 7,807,329
- Issue date Oct 5, 2010
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition for immersion exposure and pattern form...
- Patent number 7,645,557
- Issue date Jan 12, 2010
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,625,690
- Issue date Dec 1, 2009
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,592,118
- Issue date Sep 22, 2009
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for electron beam, EUV or X-ray
- Patent number 7,521,168
- Issue date Apr 21, 2009
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,374,860
- Issue date May 20, 2008
- Fuji Film Corporation
- Shuji Hirano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition for use with electron beam, EUV light o...
- Patent number 7,344,821
- Issue date Mar 18, 2008
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 7,335,454
- Issue date Feb 26, 2008
- FUJIFILM Corporation
- Shinichi Kanna
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive working resist composition
- Patent number 7,326,513
- Issue date Feb 5, 2008
- FUJIFILM Corporation
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern formation method using the...
- Patent number 7,250,246
- Issue date Jul 31, 2007
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 7,232,640
- Issue date Jun 19, 2007
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 7,217,493
- Issue date May 15, 2007
- FUJIFILM Corporation
- Shoichiro Yasunami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin composition
- Patent number 7,214,467
- Issue date May 8, 2007
- FUJIFILM Corporation
- Shinichi Kanna
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition and pattern making method using th...
- Patent number 7,202,015
- Issue date Apr 10, 2007
- Fuji Photo Film Co., Ltd.
- Shinichi Kanna
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 7,198,880
- Issue date Apr 3, 2007
- FUJIFILM Corporation
- Tomoya Sasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LAMINATE, KIT FOR MANUFACTURING ORGANIC SEMICONDUCTOR, AND RESIST C...
- Publication number 20160240816
- Publication date Aug 18, 2016
- FUJIFILM CORPORATION
- Kazuyoshi MIZUTANI
- B32 - LAYERED PRODUCTS
Information Patent Application
SELF-ORGANIZING COMPOSITION FOR FORMING PATTERN, METHOD FOR FORMING...
- Publication number 20150197663
- Publication date Jul 16, 2015
- FUJIFILM CORPORATION
- Kazuyoshi MIZUTANI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20130017377
- Publication date Jan 17, 2013
- FUJIFILM Corporation
- Shohei Kataoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20130011785
- Publication date Jan 10, 2013
- FUJIFILM Corporation
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20120321855
- Publication date Dec 20, 2012
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...
- Publication number 20110305992
- Publication date Dec 15, 2011
- FUJIFILM CORPORATION
- Shinji TARUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20110081612
- Publication date Apr 7, 2011
- FUJIFILM CORPORATION
- Kana FUJII
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20110014570
- Publication date Jan 20, 2011
- FUJIFILM CORPORATION
- Kazuyoshi Mizutani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20100248146
- Publication date Sep 30, 2010
- FUJIFILM CORPORATION
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...
- Publication number 20100040971
- Publication date Feb 18, 2010
- FUJIFILM Corporaion
- Shinji TARUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...
- Publication number 20100040972
- Publication date Feb 18, 2010
- FUJIFILM CORPORATION
- Shinji TARUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20090253070
- Publication date Oct 8, 2009
- FUJIFILM CORPORATION
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME
- Publication number 20090087789
- Publication date Apr 2, 2009
- FUJIFILM CORPORATION
- Shuji HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTER...
- Publication number 20090011366
- Publication date Jan 8, 2009
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080241752
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Kazuyoshi MIZUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080241743
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080241749
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Kazuyoshi MIZUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080220370
- Publication date Sep 11, 2008
- FUJIFILM CORPORATION
- Kazuyoshi MIZUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080193878
- Publication date Aug 14, 2008
- FUJIFILM CORPORATION
- Masaomi MAKINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080081292
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080081289
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Fumiyuki NISHIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080050675
- Publication date Feb 28, 2008
- FUJIFILM CORPORATION
- Fumiyuki Nishiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and pattern forming method using the same
- Publication number 20070224539
- Publication date Sep 27, 2007
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and pattern forming method using the same
- Publication number 20070218406
- Publication date Sep 20, 2007
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and pattern forming method using the same
- Publication number 20070218407
- Publication date Sep 20, 2007
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION
- Publication number 20070128547
- Publication date Jun 7, 2007
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and pattern forming method using the same
- Publication number 20070072117
- Publication date Mar 29, 2007
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and pattern forming method using the same
- Publication number 20070072121
- Publication date Mar 29, 2007
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition for immersion exposure and pattern form...
- Publication number 20070065753
- Publication date Mar 22, 2007
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and pattern forming method using the same
- Publication number 20060216635
- Publication date Sep 28, 2006
- FUJI PHOTO FILM CO., LTD.
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kazuyoshi Mizutani

Person

Patents Grantslast 30 patents

Pattern forming method and resist composition

Laminate, kit for manufacturing organic semiconductor, and resist c...

Actinic-ray- or radiation-sensitive resin composition and method of...

Pattern forming method and resist composition

Resist composition and pattern forming method using the same

Pattern forming method, and resist composition, developer and rinsi...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Resist composition and pattern forming method using the same

Pattern forming method, resist composition to be used in the patter...

Pattern forming method, and resist composition, developer and rinsi...

Resist composition and pattern-forming method using the same

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Photosensitive composition and pattern-forming method using the same

Positive resist composition for immersion exposure and pattern form...

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Resist composition for electron beam, EUV or X-ray

Positive resist composition and pattern forming method using the same

Positive resist composition for use with electron beam, EUV light o...

Positive resist composition

Positive working resist composition

Positive resist composition and pattern formation method using the...

Positive resist composition

Positive resist composition

Photosensitive resin composition

Positive photoresist composition and pattern making method using th...

Positive resist composition

Patents Applicationslast 30 patents

LAMINATE, KIT FOR MANUFACTURING ORGANIC SEMICONDUCTOR, AND RESIST C...

SELF-ORGANIZING COMPOSITION FOR FORMING PATTERN, METHOD FOR FORMING...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

PATTERN FORMING METHOD AND RESIST COMPOSITION

PATTERN FORMING METHOD AND RESIST COMPOSITION

PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...

PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...

RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME

PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTER...

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

Resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

POSITIVE RESIST COMPOSITION

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Positive resist composition for immersion exposure and pattern form...

Positive resist composition and pattern forming method using the same