Kirk Ostrowski

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Metal doped carbon based hard mask removal in semiconductor fabrica...
- Patent number 11,062,897
- Issue date Jul 13, 2021
- Lam Research Corporation
- Yongsik Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist strip processes for improved device integrity
- Patent number 9,613,825
- Issue date Apr 4, 2017
- Novellus Systems, Inc.
- Roey Shaviv
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultra low silicon loss high dose implant strip
- Patent number 9,564,344
- Issue date Feb 7, 2017
- Novellus Systems, Inc.
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma based photoresist removal system for cleaning post ash residue
- Patent number 8,716,143
- Issue date May 6, 2014
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low damage photoresist strip method for low-K dielectrics
- Patent number 8,591,661
- Issue date Nov 26, 2013
- Novellus Systems, Inc.
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma based photoresist removal system for cleaning post ash residue
- Patent number 8,129,281
- Issue date Mar 6, 2012
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing photoresist from low-k films in a downstream pl...
- Patent number 6,693,043
- Issue date Feb 17, 2004
- Novellus Systems, Inc.
- Senzi Li
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METAL DOPED CARBON BASED HARD MASK REMOVAL IN SEMICONDUCTOR FABRICA...
- Publication number 20180358220
- Publication date Dec 13, 2018
- LAM RESEARCH CORPORATION
- Yongsik Yu
- C01 - INORGANIC CHEMISTRY
Information Patent Application
ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP
- Publication number 20150332933
- Publication date Nov 19, 2015
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS
- Publication number 20140120733
- Publication date May 1, 2014
- Novellus Systems, Inc.
- David Cheung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST STRIP PROCESSES FOR IMPROVED DEVICE INTEGRITY
- Publication number 20130048014
- Publication date Feb 28, 2013
- Roey Shaviv
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS
- Publication number 20110139176
- Publication date Jun 16, 2011
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP
- Publication number 20110143548
- Publication date Jun 16, 2011
- David Cheung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kirk Ostrowski

Person

Patents Grantslast 30 patents

Metal doped carbon based hard mask removal in semiconductor fabrica...

Photoresist strip processes for improved device integrity

Ultra low silicon loss high dose implant strip

Plasma based photoresist removal system for cleaning post ash residue

Low damage photoresist strip method for low-K dielectrics

Plasma based photoresist removal system for cleaning post ash residue

Method for removing photoresist from low-k films in a downstream pl...

Patents Applicationslast 30 patents

METAL DOPED CARBON BASED HARD MASK REMOVAL IN SEMICONDUCTOR FABRICA...

ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP

LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS

PHOTORESIST STRIP PROCESSES FOR IMPROVED DEVICE INTEGRITY

LOW DAMAGE PHOTORESIST STRIP METHOD FOR LOW-K DIELECTRICS

ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP