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Leslie G. Jerde
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Novato, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Reactor with heated and textured electrodes and surfaces
Patent number
7,439,188
Issue date
Oct 21, 2008
Tegal Corporation
Stephen DeOrnellas
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma etch reactor and method
Patent number
7,223,699
Issue date
May 29, 2007
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for using a hard mask for critical dimension growth containment
Patent number
6,958,295
Issue date
Oct 25, 2005
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for using a hard mask for critical dimension growth containment
Patent number
6,951,820
Issue date
Oct 4, 2005
Silicon Valley Bank
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etch reactor and method
Patent number
6,905,969
Issue date
Jun 14, 2005
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for minimizing the critical dimension growth of a feature on...
Patent number
6,774,046
Issue date
Aug 10, 2004
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etch reactor and method
Patent number
6,620,335
Issue date
Sep 16, 2003
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etch reactor and method
Patent number
6,500,314
Issue date
Dec 31, 2002
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cobalt silicide etch process and apparatus
Patent number
6,486,069
Issue date
Nov 26, 2002
Tegal Corporation
Steven Marks
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for minimizing semiconductor wafer arcing duri...
Patent number
6,406,925
Issue date
Jun 18, 2002
Tegal Corporation
Satish D. Athavale
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cobalt silicide etch process and apparatus
Patent number
6,391,148
Issue date
May 21, 2002
Tegal Corporation
Steven Marks
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etch reactor having a plurality of magnets
Patent number
6,354,240
Issue date
Mar 12, 2002
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for minimizing semiconductor wafer arcing duri...
Patent number
6,346,428
Issue date
Feb 12, 2002
Tegal Corporation
Satish D. Athavale
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for using a hard mask for critical dimension growth containment
Patent number
6,287,975
Issue date
Sep 11, 2001
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for minimizing the critical dimension growth of a feature on...
Patent number
6,046,116
Issue date
Apr 4, 2000
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
REACTOR WITH HEATED AND TEXTURED ELECTRODES AND SURFACES
Publication number
20080318432
Publication date
Dec 25, 2008
Tegal Corporation
Stephen P. DeOrnellas
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma etch reactor and method
Publication number
20050164513
Publication date
Jul 28, 2005
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma etch reactor and method
Publication number
20020139665
Publication date
Oct 3, 2002
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for using a hard mask for critical dimension growth containment
Publication number
20020132485
Publication date
Sep 19, 2002
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Reactor with heated and textured electrodes and surfaces
Publication number
20020036064
Publication date
Mar 28, 2002
Tegal Corporation
Stephen DeOrnellas
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method for minimizing the critical dimension growth of a feature on...
Publication number
20010031561
Publication date
Oct 18, 2001
Tegal Corporation
Stephen P. DeOrnellas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Cobalt silicide etch process and apparatus
Publication number
20010003676
Publication date
Jun 14, 2001
Tegal Corporation
Steven Marks
H01 - BASIC ELECTRIC ELEMENTS