Makoto Kaji

Person

Chiyoda-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Borazine-based resin, process for its production, borazine-based re...
- Patent number 8,362,199
- Issue date Jan 29, 2013
- Hitachi Chemical Co., Ltd.
- Hiroshi Matsutani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photocurable resin composition and a method for forming a pattern
- Patent number 8,288,079
- Issue date Oct 16, 2012
- Hitachi Chemical Company, Ltd.
- Masahiko Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photo-curable resin composition and a method for forming a pattern...
- Patent number 7,935,472
- Issue date May 3, 2011
- Hitachi Chemical Company, Ltd.
- Masahiko Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Borazine-based resin, and method for production thereof, borazine b...
- Patent number 7,625,642
- Issue date Dec 1, 2009
- Hitachi Chemical Co., Ltd.
- Hiroshi Matsutani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive element, resist pattern formation method and printed...
- Patent number 7,622,243
- Issue date Nov 24, 2009
- Hitachi Chemical Company, Ltd.
- Takashi Kumaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming process using photosensitive resin composition
- Patent number 7,153,631
- Issue date Dec 26, 2006
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, patterning method, and electronic...
- Patent number 6,773,866
- Issue date Aug 10, 2004
- Hitachi Chemical DuPont Microsystems L.L.C.
- Akihiro Sasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of preparing photosensitive resin composition
- Patent number 6,600,053
- Issue date Jul 29, 2003
- Hitachi Chemical DuPont Microsystems Ltd.
- Noriyoshi Arai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hexaaryl biimidazole compounds as photoinitiators, photosensitive c...
- Patent number 6,524,770
- Issue date Feb 25, 2003
- Hitachi Chemical Co., Ltd.
- Takahiro Hidaka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Positive photosensitive resin composition, process for producing pa...
- Patent number 6,436,593
- Issue date Aug 20, 2002
- Hitachi Chemical DuPont Microsystems Ltd.
- Tomonori Minegishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, patterning method, and electronic...
- Patent number 6,342,333
- Issue date Jan 29, 2002
- Hitachi Chemical DuPont Microsystems, L.L.C.
- Akihiro Sasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition
- Patent number 6,329,494
- Issue date Dec 11, 2001
- Hitachi Chemical DuPont Microsystems Ltd.
- Noriyoshi Arai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive polyimide precursor and its use for pattern formation
- Patent number 6,319,656
- Issue date Nov 20, 2001
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursor, polyimide and their use
- Patent number 6,309,791
- Issue date Oct 30, 2001
- Hitachi Chemical Co.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type photosensitive resin composition containing an alkali...
- Patent number 6,197,475
- Issue date Mar 6, 2001
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming process using photosensitive resin composition
- Patent number 6,194,126
- Issue date Feb 27, 2001
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursor, polyimide and their use
- Patent number 6,143,475
- Issue date Nov 7, 2000
- Hitachi Chemical Co.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition containing a photosensitive polyam...
- Patent number 6,071,667
- Issue date Jun 6, 2000
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitve polymide precursor and its use for pattern formation
- Patent number 6,025,113
- Issue date Feb 15, 2000
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoimageable compositions comprising polyquinoline polymer and di...
- Patent number 5,889,141
- Issue date Mar 30, 1999
- Hitachi Chemical Co., Ltd.
- Matthew L. Marrocco
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition
- Patent number 5,856,059
- Issue date Jan 5, 1999
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition
- Patent number 5,847,071
- Issue date Dec 8, 1998
- Hitachi, Chemical Co., Ltd.
- Hideo Hagiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoinitiator compositions including amino acids, coumarin and tit...
- Patent number 5,811,218
- Issue date Sep 22, 1998
- Hitachi Chemical Company, Ltd.
- Makoto Kaji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 5,668,248
- Issue date Sep 16, 1997
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition
- Patent number 5,472,823
- Issue date Dec 5, 1995
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Nonlinear optical material and devices utilizing said material
- Patent number 5,467,421
- Issue date Nov 14, 1995
- Hitachi Chemical Company, Ltd.
- Makoto Kaji
- G02 - OPTICS
Information Patent Grant
Aryl triflate compounds and radiologically acid producing agents th...
- Patent number 5,302,725
- Issue date Apr 12, 1994
- Hitachi Chemical Co., Ltd.
- Makoto Kaji
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
16-benzalandrosta-1,4-diene-3,17-dione compounds and non-linear opt...
- Patent number 5,262,090
- Issue date Nov 16, 1993
- Hitachi Chemical Company, Ltd.
- Makoto Kaji
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Non-linear optical material and non-linear optical devices
- Patent number 5,219,496
- Issue date Jun 15, 1993
- Hitachi Chemical Company
- Makoto Kaji
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Aryl triflate compound, radiologically acid producing agent, radiol...
- Patent number 5,198,402
- Issue date Mar 30, 1993
- Hitachi Chemical Company Ltd.
- Makoto Kaji
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
- Publication number 20130298398
- Publication date Nov 14, 2013
- Masahiro Miyasaka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
BORAZINE-BASED RESIN, PROCESS FOR ITS PRODUCTION, BORAZINE-BASED RE...
- Publication number 20110313122
- Publication date Dec 22, 2011
- Hiroshi MATSUTANI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Borazine-based resin, process for its production, borazine-based re...
- Publication number 20090240017
- Publication date Sep 24, 2009
- Hiroshi MATSUTANI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photocurable resin composition and a method for forming a pattern
- Publication number 20070160937
- Publication date Jul 12, 2007
- Masahiko Ogino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive element, resist pattern formation method and printed...
- Publication number 20070105036
- Publication date May 10, 2007
- Takashi Kumaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photo-curable resin composition and a method for forming a pattern...
- Publication number 20070065757
- Publication date Mar 22, 2007
- Masahiko Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Application
Borazine-based resin, and method for production thereof, borazine b...
- Publication number 20060110610
- Publication date May 25, 2006
- Hiroshi Matsutani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Pattern-forming process using photosensitive resin composition
- Publication number 20040106066
- Publication date Jun 3, 2004
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive resin composition, patterning method, and electronic...
- Publication number 20020098444
- Publication date Jul 25, 2002
- Hitachi Chemical DuPont Microsystems L.L.C.
- Akihiro Sasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive polyimide precursor and its use for pattern formation
- Publication number 20020048726
- Publication date Apr 25, 2002
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive resin composition
- Publication number 20020037991
- Publication date Mar 28, 2002
- Hitachi Chemical DuPont MicroSystems Ltd.
- Noriyoshi Arai
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photosensitive resin composition
- Publication number 20020004177
- Publication date Jan 10, 2002
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Makoto Kaji

Person

Patents Grantslast 30 patents

Borazine-based resin, process for its production, borazine-based re...

Photocurable resin composition and a method for forming a pattern

Photo-curable resin composition and a method for forming a pattern...

Borazine-based resin, and method for production thereof, borazine b...

Photosensitive element, resist pattern formation method and printed...

Pattern-forming process using photosensitive resin composition

Photosensitive resin composition, patterning method, and electronic...

Method of preparing photosensitive resin composition

Hexaaryl biimidazole compounds as photoinitiators, photosensitive c...

Positive photosensitive resin composition, process for producing pa...

Photosensitive resin composition, patterning method, and electronic...

Photosensitive resin composition

Photosensitive polyimide precursor and its use for pattern formation

Polyimide precursor, polyimide and their use

Positive type photosensitive resin composition containing an alkali...

Pattern-forming process using photosensitive resin composition

Polyimide precursor, polyimide and their use

Photosensitive resin composition containing a photosensitive polyam...

Photosensitve polymide precursor and its use for pattern formation

Photoimageable compositions comprising polyquinoline polymer and di...

Photosensitive resin composition

Photosensitive resin composition

Photoinitiator compositions including amino acids, coumarin and tit...

Photosensitive resin composition

Photosensitive resin composition

Nonlinear optical material and devices utilizing said material

Aryl triflate compounds and radiologically acid producing agents th...

16-benzalandrosta-1,4-diene-3,17-dione compounds and non-linear opt...

Non-linear optical material and non-linear optical devices

Aryl triflate compound, radiologically acid producing agent, radiol...

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...

BORAZINE-BASED RESIN, PROCESS FOR ITS PRODUCTION, BORAZINE-BASED RE...

Borazine-based resin, process for its production, borazine-based re...

Photocurable resin composition and a method for forming a pattern

Photosensitive element, resist pattern formation method and printed...

Photo-curable resin composition and a method for forming a pattern...

Borazine-based resin, and method for production thereof, borazine b...

Pattern-forming process using photosensitive resin composition

Photosensitive resin composition, patterning method, and electronic...

Photosensitive polyimide precursor and its use for pattern formation

Photosensitive resin composition

Photosensitive resin composition