Masato Toshima

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for encapsulation of an organic light emitting...
- Patent number 10,333,104
- Issue date Jun 25, 2019
- Orbotech LT Solar, LLC.
- Kam S. Law
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Auto-sequencing multi-directional inline processing method
- Patent number 9,287,152
- Issue date Mar 15, 2016
- Orbotech LT Solar, LLC.
- Wendell Thomas Blonigan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and processing method
- Patent number 8,998,552
- Issue date Apr 7, 2015
- Orbotech LT Solar, LLC.
- Masato Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Auto-sequencing inline processing apparatus
- Patent number 8,672,603
- Issue date Mar 18, 2014
- Orbotech LT Solar, LLC.
- Wendell Thomas Blonigan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Showerhead assembly for plasma processing chamber
- Patent number 8,617,349
- Issue date Dec 31, 2013
- Orbotech LT Solar, LLC.
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Auto-sequencing multi-directional inline processing apparatus
- Patent number 8,444,364
- Issue date May 21, 2013
- Orbotech LT Solar, LLC.
- Wendell Thomas Blonigan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 7,695,233
- Issue date Apr 13, 2010
- Orbotech LT Solar, LLC.
- Masato Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lifting mechanism for integrated circuit fabrication systems
- Patent number 6,860,710
- Issue date Mar 1, 2005
- Novellus Systems, Inc.
- Masato Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cassette load lock
- Patent number 6,599,076
- Issue date Jul 29, 2003
- Applied Materials, Inc.
- Masato M. Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor using inductive RF coupling, and processes
- Patent number 6,545,420
- Issue date Apr 8, 2003
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor using inductive RF coupling, and processes
- Patent number 6,518,195
- Issue date Feb 11, 2003
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic confinement in a plasma reactor having an RF bias electrode
- Patent number 6,488,807
- Issue date Dec 3, 2002
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual cassette load lock
- Patent number 6,454,508
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Masato M. Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cassette load lock
- Patent number 6,454,519
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Masato M. Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for stripping organic based film
- Patent number 6,352,937
- Issue date Mar 5, 2002
- Sony Corporation
- Shingo Kadomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes
- Patent number 6,251,792
- Issue date Jun 26, 2001
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer transfer system
- Patent number 6,224,680
- Issue date May 1, 2001
- Gamma Precision Technology, Inc.
- Masato Toshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for cleaning semiconductor wafers
- Patent number 6,146,469
- Issue date Nov 14, 2000
- Gamma Precision Technology
- Masato Toshima
- B08 - CLEANING
Information Patent Grant
Process used in an RF coupled plasma reactor
- Patent number 6,068,784
- Issue date May 30, 2000
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High frequency power supply generator
- Patent number 6,028,777
- Issue date Feb 22, 2000
- Betek Manufacturing, Inc.
- Binh Nguyen
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Wafer transfer system and method of using the same
- Patent number 6,007,675
- Issue date Dec 28, 1999
- Gamma Precision Technology, Inc.
- Masato Toshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer transfer system and method of using the same
- Patent number 5,944,940
- Issue date Aug 31, 1999
- Gamma Precision Technology, Inc.
- Masato Toshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer transfer system and method of using the same
- Patent number 5,900,105
- Issue date May 4, 1999
- Gamma Precision Technology, Inc.
- Masato Toshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple chamber integrated process system
- Patent number 5,882,165
- Issue date Mar 16, 1999
- Applied Materials, Inc.
- Dan Maydan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cassette load lock
- Patent number 5,769,588
- Issue date Jun 23, 1998
- Applied Materials, Inc.
- Masato M. Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching film layers on large substrates
- Patent number 5,753,133
- Issue date May 19, 1998
- Applied Komatsu Technology, Inc.
- Jerry Wong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid concentration detecting apparatus
- Patent number 5,585,729
- Issue date Dec 17, 1996
- Gamma Precision Technology, Inc.
- Masato Toshima
- G01 - MEASURING TESTING
Information Patent Grant
Silicon scavenger in an inductively coupled RF plasma reactor
- Patent number 5,556,501
- Issue date Sep 17, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Uniformity for magnetically enhanced plasma chambers
- Patent number 5,308,417
- Issue date May 3, 1994
- Applied Materials, Inc.
- David W. Groechel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multichamber integrated process system
- Patent number 5,292,393
- Issue date Mar 8, 1994
- Applied Materials, Inc.
- Dan Maydan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR ENCAPSULATION OF AN ORGANIC LIGHT EMITTING...
- Publication number 20180130975
- Publication date May 10, 2018
- Orbotech LT Solar, LLC.
- Kam S. Law
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SYSTEM, ARCHITECTURE AND METHOD FOR SIMULTANEOUS TRANSFER AND PROCE...
- Publication number 20140064886
- Publication date Mar 6, 2014
- Orbotech LT Solar, LLC.
- Masato Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTO-SEQUENCING MULTI-DIRECTIONAL INLINE PROCESSING METHOD
- Publication number 20130294678
- Publication date Nov 7, 2013
- Orbotech LT Solar, LLC.
- Wendell Thomas Blonigan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20110144799
- Publication date Jun 16, 2011
- Masato Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTO-SEQUENCING MULTI-DIRECTIONAL INLINE PROCESSING APPARATUS
- Publication number 20110142573
- Publication date Jun 16, 2011
- Wendell Thomas BLONIGAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AUTO-SEQUENCING INLINE PROCESSING APPARATUS
- Publication number 20110142572
- Publication date Jun 16, 2011
- Wendell Thomas BLONIGAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD ASSEMBLY FOR PLASMA PROCESSING CHAMBER
- Publication number 20110088847
- Publication date Apr 21, 2011
- Kam S. LAW
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shower head and cvd apparatus using the same
- Publication number 20080196666
- Publication date Aug 21, 2008
- Masato Toshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing apparatus
- Publication number 20070207014
- Publication date Sep 6, 2007
- Masato Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical vapor deposition apparatus and electrode plate thereof
- Publication number 20070151516
- Publication date Jul 5, 2007
- Kam S. Law
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dual cassette load lock
- Publication number 20060245854
- Publication date Nov 2, 2006
- Masato M. Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual cassette load lock
- Publication number 20030002959
- Publication date Jan 2, 2003
- Masato M. Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual cassette load lock
- Publication number 20030002960
- Publication date Jan 2, 2003
- Masato M. Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSES USED IN AN INDUCTIVELY COUPLED PLASMA REACTOR
- Publication number 20020004309
- Publication date Jan 10, 2002
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL CASSETTE LOAD LOCK
- Publication number 20010014266
- Publication date Aug 16, 2001
- MASATO M. TOSHIMA
- H01 - BASIC ELECTRIC ELEMENTS

Masato Toshima

Person

Patents Grantslast 30 patents

Method and apparatus for encapsulation of an organic light emitting...

Auto-sequencing multi-directional inline processing method

Processing apparatus and processing method

Auto-sequencing inline processing apparatus

Showerhead assembly for plasma processing chamber

Auto-sequencing multi-directional inline processing apparatus

Substrate processing apparatus

Lifting mechanism for integrated circuit fabrication systems

Dual cassette load lock

Plasma reactor using inductive RF coupling, and processes

Plasma reactor using inductive RF coupling, and processes

Magnetic confinement in a plasma reactor having an RF bias electrode

Dual cassette load lock

Dual cassette load lock

Method for stripping organic based film

Plasma etch processes

Wafer transfer system

Apparatus and method for cleaning semiconductor wafers

Process used in an RF coupled plasma reactor

High frequency power supply generator

Wafer transfer system and method of using the same

Wafer transfer system and method of using the same

Wafer transfer system and method of using the same

Multiple chamber integrated process system

Dual cassette load lock

Method and apparatus for etching film layers on large substrates

Fluid concentration detecting apparatus

Silicon scavenger in an inductively coupled RF plasma reactor

Uniformity for magnetically enhanced plasma chambers

Multichamber integrated process system

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR ENCAPSULATION OF AN ORGANIC LIGHT EMITTING...

SYSTEM, ARCHITECTURE AND METHOD FOR SIMULTANEOUS TRANSFER AND PROCE...

AUTO-SEQUENCING MULTI-DIRECTIONAL INLINE PROCESSING METHOD

PROCESSING APPARATUS AND PROCESSING METHOD

AUTO-SEQUENCING MULTI-DIRECTIONAL INLINE PROCESSING APPARATUS

AUTO-SEQUENCING INLINE PROCESSING APPARATUS

SHOWERHEAD ASSEMBLY FOR PLASMA PROCESSING CHAMBER

Shower head and cvd apparatus using the same

Substrate processing apparatus

Chemical vapor deposition apparatus and electrode plate thereof

Dual cassette load lock

Dual cassette load lock

Dual cassette load lock

PROCESSES USED IN AN INDUCTIVELY COUPLED PLASMA REACTOR

DUAL CASSETTE LOAD LOCK