Michael D. Welch

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of and apparatuses for maintenance, diagnosis, and optimiza...
- Patent number 7,580,767
- Issue date Aug 25, 2009
- KLA-Tencor Corporation
- Paul Douglas MacDonald
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods and apparatus for low distortion parameter measurements
- Patent number 7,299,148
- Issue date Nov 20, 2007
- OnWafer Technologies, Inc.
- Dean Hunt
- G01 - MEASURING TESTING
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 7,147,719
- Issue date Dec 12, 2006
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching photomasks
- Patent number 7,115,523
- Issue date Oct 3, 2006
- Applied Materials, Inc.
- Brigitte C. Stoehr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configurable single substrate wet-dry integrated cluster cleaner
- Patent number 6,899,111
- Issue date May 31, 2005
- Applied Materials, Inc.
- Paul E. Luscher
- B08 - CLEANING
Information Patent Grant
Magnetic barrier for plasma in chamber exhaust
- Patent number 6,863,835
- Issue date Mar 8, 2005
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Distributed inductively-coupled plasma source and circuit for coupl...
- Patent number 6,825,618
- Issue date Nov 30, 2004
- Bryan Y. Pu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled dome-coil system for high power inductively...
- Patent number 6,822,185
- Issue date Nov 23, 2004
- Applied Materials, Inc.
- Michael Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Endpoint detection in substrate fabrication processes
- Patent number 6,813,534
- Issue date Nov 2, 2004
- Zhifeng Sui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric etch chamber with expanded process window
- Patent number 6,797,639
- Issue date Sep 28, 2004
- Applied Materials Inc.
- James D Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic barrier for plasma in chamber exhaust
- Patent number 6,773,544
- Issue date Aug 10, 2004
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric etch chamber with expanded process window
- Patent number 6,716,302
- Issue date Apr 6, 2004
- Applied Materials Inc.
- James D Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shield or ring surrounding semiconductor workpiece in plasma chamber
- Patent number 6,689,249
- Issue date Feb 10, 2004
- Applied Materials, Inc.
- Kuang-Han Ke
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 6,647,918
- Issue date Nov 18, 2003
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for detecting a presence or position of a subs...
- Patent number 6,592,673
- Issue date Jul 15, 2003
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction of wafer temperature drift in a plasma reactor based upo...
- Patent number 6,575,622
- Issue date Jun 10, 2003
- Applied Materials Inc.
- Hamid Norrbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distributed inductively-coupled plasma source and circuit for coupl...
- Patent number 6,568,346
- Issue date May 27, 2003
- Applied Materials Inc.
- Bryan Y. Pu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching photomasks
- Patent number 6,534,417
- Issue date Mar 18, 2003
- Applied Materials, Inc.
- Brigitte C. Stoehr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjusting DC bias voltage in plasma chamber
- Patent number 6,513,452
- Issue date Feb 4, 2003
- Applied Materials Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor cooled ceiling with an array of thermally isolated p...
- Patent number 6,432,259
- Issue date Aug 13, 2002
- Applied Materials, Inc.
- Hamid Noorbakhsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching photomasks
- Patent number 6,391,790
- Issue date May 21, 2002
- Applied Materials, Inc.
- Brigitte C. Stoehr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High selectivity etch using an external plasma discharge
- Patent number 6,387,288
- Issue date May 14, 2002
- Applied Materials, Inc.
- Claes Bjorkman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction of wafer temperature drift in a plasma reactor based upo...
- Patent number 6,353,210
- Issue date Mar 5, 2002
- Applied Materials Inc.
- Hamid Norrbakhsh
- C30 - CRYSTAL GROWTH
Information Patent Grant
Shield or ring surrounding semiconductor workpiece in plasma chamber
- Patent number 6,284,093
- Issue date Sep 4, 2001
- Applied Materials, Inc.
- Kuang-Han Ke
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Distributed inductively-coupled plasma source
- Patent number 6,273,022
- Issue date Aug 14, 2001
- Applied Materials, Inc.
- Bryan Y. Pu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual independent robot blades with minimal offset
- Patent number 6,267,549
- Issue date Jul 31, 2001
- Applied Materials, Inc.
- William Brown
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Apparatus for sidewall profile control during an etch process
- Patent number 6,248,206
- Issue date Jun 19, 2001
- Applied Materials Inc.
- Harald Herchen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling plasma uniformity in a semicon...
- Patent number 6,232,236
- Issue date May 15, 2001
- Applied Materials, Inc.
- Hongqing Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjusting DC bias voltage in plasma chamber
- Patent number 6,221,782
- Issue date Apr 24, 2001
- Applied Materials, Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double slit-valve doors for plasma processing
- Patent number 6,192,827
- Issue date Feb 27, 2001
- Applied Materials, Inc.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF AND APPARATUSES FOR MAINTENANCE, DIAGNOSIS, AND OPTIMIZA...
- Publication number 20090292506
- Publication date Nov 26, 2009
- KLA-Tencor Corporation
- Paul Douglas MacDonald
- G05 - CONTROLLING REGULATING
Information Patent Application
TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER
- Publication number 20070091535
- Publication date Apr 26, 2007
- APPLIED MATERIALS, INC.
- Hamid Noorbakhsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of and apparatuses for maintenance, diagnosis, and optimiza...
- Publication number 20070055403
- Publication date Mar 8, 2007
- Paul Douglas MacDonald
- G05 - CONTROLLING REGULATING
Information Patent Application
Methods and apparatus for low distortion parameter measurements
- Publication number 20060052969
- Publication date Mar 9, 2006
- Dean Hunt
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for etching photomasks
- Publication number 20050181608
- Publication date Aug 18, 2005
- APPLIED MATERIALS, INC.
- Brigitte C. Stoeher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20050003675
- Publication date Jan 6, 2005
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double slit-valve doors for plasma processing
- Publication number 20040083978
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Michael D. Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature controlled dome-coil system for high power inductively...
- Publication number 20040065645
- Publication date Apr 8, 2004
- Applied Materials, Inc.
- Michael Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Distributed inductively-coupled plasma source and circuit for coupl...
- Publication number 20030192644
- Publication date Oct 16, 2003
- APPLIED MATERIALS, INC.
- Bryan Y. Pu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20030037880
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric etch chamber with expanded process window
- Publication number 20030038111
- Publication date Feb 27, 2003
- APPLIED MATERIALS, INC.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Configurable single substrate wet-dry integrated cluster cleaner
- Publication number 20020189638
- Publication date Dec 19, 2002
- Paul E. Luscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Endpoint detection in substrate fabrication processes
- Publication number 20020183977
- Publication date Dec 5, 2002
- APPLIED MATERIALS, INC.
- Zhifeng Sui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for etching photomasks
- Publication number 20020155725
- Publication date Oct 24, 2002
- APPLIED MATERIALS, INC.
- Brigitte C. Stoehr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Series chamber for substrate processing
- Publication number 20020096114
- Publication date Jul 25, 2002
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR DETECTING A PRESENCE OR POSITION OF A SUBS...
- Publication number 20020078889
- Publication date Jun 27, 2002
- MICHAEL D. WELCH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature controlled semiconductor processing chamber liner
- Publication number 20020069970
- Publication date Jun 13, 2002
- APPLIED MATERIALS, INC.
- Hamid Noorbakhsh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shield or ring surrounding semiconductor workpiece in plasma chamber
- Publication number 20020066531
- Publication date Jun 6, 2002
- APPLIED MATERIALS, INC.
- Kuang-Han Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST SYSTEM FOR TREATING PROCESS GAS EFFLUENT
- Publication number 20020066535
- Publication date Jun 6, 2002
- WILLIAM BROWN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Correction of wafer temperature drift in a plasma reactor based upo...
- Publication number 20020048311
- Publication date Apr 25, 2002
- APPLIED MATERIALS, INC.
- Hamid Norrbakhsh
- C30 - CRYSTAL GROWTH
Information Patent Application
Distributed inductively-coupled plasma source and circuit for coupl...
- Publication number 20010054383
- Publication date Dec 27, 2001
- APPLIED MATERIALS, INC.
- Bryan Y. Pu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetic barrier for plasma in chamber exhaust
- Publication number 20010032590
- Publication date Oct 25, 2001
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic barrier for plasma in chamber exhaust
- Publication number 20010032591
- Publication date Oct 25, 2001
- APPLIED MATERIALS, INC.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adjusting DC bias voltage in plasma chamber
- Publication number 20010014540
- Publication date Aug 16, 2001
- APPLIED MATERIALS, INC.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for controlling plasma uniformity in a semicon...
- Publication number 20010009139
- Publication date Jul 26, 2001
- Hongqing Shan
- H01 - BASIC ELECTRIC ELEMENTS

Michael D. Welch

Person

Patents Grantslast 30 patents

Methods of and apparatuses for maintenance, diagnosis, and optimiza...

Methods and apparatus for low distortion parameter measurements

Double slit-valve doors for plasma processing

Method and apparatus for etching photomasks

Configurable single substrate wet-dry integrated cluster cleaner

Magnetic barrier for plasma in chamber exhaust

Distributed inductively-coupled plasma source and circuit for coupl...

Temperature controlled dome-coil system for high power inductively...

Endpoint detection in substrate fabrication processes

Dielectric etch chamber with expanded process window

Magnetic barrier for plasma in chamber exhaust

Dielectric etch chamber with expanded process window

Shield or ring surrounding semiconductor workpiece in plasma chamber

Double slit-valve doors for plasma processing

Apparatus and method for detecting a presence or position of a subs...

Correction of wafer temperature drift in a plasma reactor based upo...

Distributed inductively-coupled plasma source and circuit for coupl...

Method and apparatus for etching photomasks

Adjusting DC bias voltage in plasma chamber

Plasma reactor cooled ceiling with an array of thermally isolated p...

Method and apparatus for etching photomasks

High selectivity etch using an external plasma discharge

Correction of wafer temperature drift in a plasma reactor based upo...

Shield or ring surrounding semiconductor workpiece in plasma chamber

Distributed inductively-coupled plasma source

Dual independent robot blades with minimal offset

Apparatus for sidewall profile control during an etch process

Apparatus and method for controlling plasma uniformity in a semicon...

Adjusting DC bias voltage in plasma chamber

Double slit-valve doors for plasma processing

Patents Applicationslast 30 patents

METHODS OF AND APPARATUSES FOR MAINTENANCE, DIAGNOSIS, AND OPTIMIZA...

TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER

Methods of and apparatuses for maintenance, diagnosis, and optimiza...

Methods and apparatus for low distortion parameter measurements

Method and apparatus for etching photomasks

Dielectric etch chamber with expanded process window

Double slit-valve doors for plasma processing

Temperature controlled dome-coil system for high power inductively...

Distributed inductively-coupled plasma source and circuit for coupl...

Dielectric etch chamber with expanded process window

Dielectric etch chamber with expanded process window

Configurable single substrate wet-dry integrated cluster cleaner

Endpoint detection in substrate fabrication processes

Method and apparatus for etching photomasks

Series chamber for substrate processing

APPARATUS AND METHOD FOR DETECTING A PRESENCE OR POSITION OF A SUBS...

Temperature controlled semiconductor processing chamber liner

Shield or ring surrounding semiconductor workpiece in plasma chamber

EXHAUST SYSTEM FOR TREATING PROCESS GAS EFFLUENT

Correction of wafer temperature drift in a plasma reactor based upo...

Distributed inductively-coupled plasma source and circuit for coupl...

Magnetic barrier for plasma in chamber exhaust

Magnetic barrier for plasma in chamber exhaust

Adjusting DC bias voltage in plasma chamber

Apparatus and method for controlling plasma uniformity in a semicon...