Membership
Tour
Register
Log in
Michael Sebald
Follow
Person
Hessdorf, DE
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Method for structuring a substrate using a metal mask layer formed...
Patent number
7,928,011
Issue date
Apr 19, 2011
Qimonda AG
Klaus Elian
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Resist for electron beam lithography and a process for producing ph...
Patent number
7,220,531
Issue date
May 22, 2007
Infineon Technologies AG
Klaus Elian
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Lithographic process for reducing the lateral chromium structure lo...
Patent number
7,157,189
Issue date
Jan 2, 2007
Infineon Technologies AG
Klaus Elian
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist for photolithography having reactive groups for subsequent m...
Patent number
7,125,640
Issue date
Oct 24, 2006
Infineon Technologies AG
Jörg Rottstegge
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Apparatus and method for proof of outgassing products
Patent number
7,078,709
Issue date
Jul 18, 2006
Infineon Technologies AG
Waltraud Herbst
G01 - MEASURING TESTING
Information
Patent Grant
Silicon-containing resist for photolithography
Patent number
7,052,820
Issue date
May 30, 2006
Infineon Technologies AG
Jörg Rottstegge
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Process for silylating photoresists in the UV range
Patent number
7,045,273
Issue date
May 16, 2006
Infineon Technologies AG
Jens Ferbitz
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist based on polycondensates and having an increased resolu...
Patent number
7,041,426
Issue date
May 9, 2006
Infineon Technologies AG
Christian Eschbaumer
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Process for producing hard masks
Patent number
7,018,748
Issue date
Mar 28, 2006
InfineonTechnologies AG
Michael Sebald
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Silicon resist for photolithography at short exposure wavelengths a...
Patent number
6,974,655
Issue date
Dec 13, 2005
Infineon Technologies AG
Jörg Rottstegge
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Negative resist process with simultaneous development and aromatiza...
Patent number
6,946,236
Issue date
Sep 20, 2005
Infineon Technologies AG
Jörg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for modifying resist structures and resist films from the a...
Patent number
6,899,997
Issue date
May 31, 2005
Infineon Technologies AG
Siew Siew Yip
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Process for sidewall amplification of resist structures and for the...
Patent number
6,893,972
Issue date
May 17, 2005
Infineon Technologies AG
Jörg Rottstegge
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for structuring a photoresist layer
Patent number
6,887,653
Issue date
May 3, 2005
Infineon Technologies AG
Ernst-Christian Richter
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist compound and method for structuring a photoresist layer
Patent number
6,841,332
Issue date
Jan 11, 2005
Infineon Technology AG
Gertrud Falk
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
CHEMICALLY AMPLIFIED PHOTORESIST AND PROCESS FOR STRUCTURING SUBSTI...
Patent number
6,806,027
Issue date
Oct 19, 2004
Infineon Technologies AG
Christoph Hohle
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method for experimentally verifying imaging errors in photomasks
Patent number
6,800,407
Issue date
Oct 5, 2004
Infineon Technologies AG
Günther Czech
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative resist process with simultaneous development and silylation
Patent number
6,770,423
Issue date
Aug 3, 2004
Infineon Technologies AG
Jörg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Amplification of resist structures of fluorinated resist polymers b...
Patent number
6,759,184
Issue date
Jul 6, 2004
Infineon Technologies AG
Jörg Rottstegge
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method of structuring a photoresist layer
Patent number
6,746,821
Issue date
Jun 8, 2004
Infineon Technologies AG
Ernst-Christian Richter
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Process for structuring a photoresist layer
Patent number
6,746,828
Issue date
Jun 8, 2004
Infineon Technologies AG
Ernst-Christian Richter
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Process for structuring a photoresist layer
Patent number
6,746,827
Issue date
Jun 8, 2004
Infineon Technologies AG
Ernst-Christian Richter
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method for structuring a photoresist layer
Patent number
6,743,572
Issue date
Jun 1, 2004
Infineon Technologies AG
Ernst Christian Richter
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for structuring a photoresist layer
Patent number
6,740,475
Issue date
May 25, 2004
Infineon Technologies AG
Ernst-Christian Richter
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method for producing resist structures
Patent number
6,703,190
Issue date
Mar 9, 2004
Infineon Technologies AG
Klaus Elian
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method for experimentally verifying imaging errors in optical expos...
Patent number
6,696,208
Issue date
Feb 24, 2004
Infineon Technologies AG
Günther Czech
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Bottom resist
Patent number
6,514,663
Issue date
Feb 4, 2003
Infineon Technologies AG
Stefan Hien
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Film-forming polymers
Patent number
6,306,990
Issue date
Oct 23, 2001
Siemens Aktiengesellschaft
Stefan Hien
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresists which are suitable for producing sub-micron size struc...
Patent number
6,110,637
Issue date
Aug 29, 2000
Siemens Aktinegesellschaft
Recai Sezi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive mixture and its use
Patent number
6,063,543
Issue date
May 16, 2000
Siemens Aktiengesellschaft
Stefan Hien
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
Method for Structuring a Substrate
Publication number
20090174077
Publication date
Jul 9, 2009
Klaus Elian
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of forming a patterned resist layer for patterning a semicon...
Publication number
20080203386
Publication date
Aug 28, 2008
Ulrich Klostermann
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method and apparatus for a post exposure bake of a resist
Publication number
20060269879
Publication date
Nov 30, 2006
Infineon Technologies AG
Klaus Elian
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method for forming a lithography mask
Publication number
20060105274
Publication date
May 18, 2006
Karl Kragler
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process for the production of photomasks for structuring semiconduc...
Publication number
20060083993
Publication date
Apr 20, 2006
Oliver Kirch
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Apparatus and method for verification of outgassing products
Publication number
20050109954
Publication date
May 26, 2005
Waltraud Herbst
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Apparatus and method for proof of outgassing products
Publication number
20050092936
Publication date
May 5, 2005
Waltraud Herbst
G01 - MEASURING TESTING
Information
Patent Application
Optical device for use with a lithography method
Publication number
20040169834
Publication date
Sep 2, 2004
Infineon Technologies AG
Ernst-Christian Richter
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process and control device for the planarization of a semiconductor...
Publication number
20040077180
Publication date
Apr 22, 2004
Michael Sebald
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Process for modifying resist structures and resist films from the a...
Publication number
20030211422
Publication date
Nov 13, 2003
Siew Siew Yip
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process for producing hard masks
Publication number
20030203314
Publication date
Oct 30, 2003
Michael Sebald
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Lithographic process for reducing the lateral chromium structure lo...
Publication number
20030165751
Publication date
Sep 4, 2003
Klaus Elian
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist for electron beam lithography and a process for producing ph...
Publication number
20030165752
Publication date
Sep 4, 2003
Klaus Elian
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Silicon resist for photolithography at short exposure wavelengths a...
Publication number
20030148219
Publication date
Aug 7, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist for photolithography having reactive groups for subsequent m...
Publication number
20030143484
Publication date
Jul 31, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process for silylating photoresists in the UV range
Publication number
20030124468
Publication date
Jul 3, 2003
Jens Ferbitz
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Silicon-containing resist for photolithography
Publication number
20030108812
Publication date
Jun 12, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Silylating process for photoresists in the UV region
Publication number
20030096194
Publication date
May 22, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Chemically amplified photoresist and process for structuring substi...
Publication number
20030096190
Publication date
May 22, 2003
Christoph Hohle
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Process for sidewall amplification of resist structures and for the...
Publication number
20030091936
Publication date
May 15, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Chemically amplified photoresist and process for structuring substr...
Publication number
20030082483
Publication date
May 1, 2003
Christoph Hohle
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Negative resist process with simultaneous development and silylation
Publication number
20030082488
Publication date
May 1, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresist based on polycondensates and having an increased resolu...
Publication number
20030082480
Publication date
May 1, 2003
Christian Eschbaumer
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Negative resist process with simultaneous development and aromatiza...
Publication number
20030073037
Publication date
Apr 17, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Amplification of resist structures of fluorinated resist polymers b...
Publication number
20030073043
Publication date
Apr 17, 2003
Jorg Rottstegge
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method for experimentally verifying imaging errors in optical expos...
Publication number
20030054268
Publication date
Mar 20, 2003
Gunther Czech
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresist compound and method for structuring a photoresist layer
Publication number
20030022111
Publication date
Jan 30, 2003
Gertrud Falk
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method for experimentally verifying imaging errors in photomasks
Publication number
20030013022
Publication date
Jan 16, 2003
Gunther Czech
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method for producing resist structures
Publication number
20030008240
Publication date
Jan 9, 2003
Klaus Elian
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
Method for structuring a photoresist layer
Publication number
20020187436
Publication date
Dec 12, 2002
Ernst-Christian Richter
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY