Michio Satou

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sputtering target and method of manufacturing the same
- Patent number 5,733,427
- Issue date Mar 31, 1998
- Kabushiki Kaisha Toshiba
- Michio Satou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Highly purified metal material and sputtering target using the same
- Patent number 5,679,983
- Issue date Oct 21, 1997
- Kabushiki Kaisha Toshiba
- Takashi Ishigami
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtered silicide film
- Patent number 5,612,571
- Issue date Mar 18, 1997
- Kabushiki Kaisha Toshiba
- Michio Satou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and method of manufacturing the same
- Patent number 5,508,000
- Issue date Apr 16, 1996
- Kabushiki Kaisha Toshiba
- Michio Satou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ti-W sputtering target and method for manufacturing same
- Patent number 5,470,527
- Issue date Nov 28, 1995
- Kabushiki Kaisha Toshiba
- Takashi Yamanobe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Highly purified metal material and sputtering target using the same
- Patent number 5,458,697
- Issue date Oct 17, 1995
- Kabushiki Kaisha Toshiba
- Takashi Ishigami
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtering target
- Patent number 5,447,616
- Issue date Sep 5, 1995
- Kabushiki Kaisha Toshiba
- Michio Satou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and method of manufacturing the same
- Patent number 5,418,071
- Issue date May 23, 1995
- Kabushiki Kaisha Toshiba
- Michio Satou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and method of manufacturing the same
- Patent number 5,409,517
- Issue date Apr 25, 1995
- Kabushiki Kaisha Toshiba
- Michio Satou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target
- Patent number 5,294,321
- Issue date Mar 15, 1994
- Kabushiki Kaisha Toshiba
- Michio Satou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Highly purified metal material and sputtering target using the same
- Patent number 5,196,916
- Issue date Mar 23, 1993
- Kabushiki Kaisha Toshiba
- Takashi Ishigami
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Michio Satou

Person

Patents Grantslast 30 patents

Sputtering target and method of manufacturing the same

Highly purified metal material and sputtering target using the same

Sputtered silicide film

Sputtering target and method of manufacturing the same

Ti-W sputtering target and method for manufacturing same

Highly purified metal material and sputtering target using the same

Sputtering target

Sputtering target and method of manufacturing the same

Sputtering target and method of manufacturing the same

Sputtering target

Highly purified metal material and sputtering target using the same