Mitsuru Suehiro

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,686,917
- Issue date Mar 30, 2010
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,169,254
- Issue date Jan 30, 2007
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 6,923,885
- Issue date Aug 2, 2005
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma etching method
- Patent number 6,914,005
- Issue date Jul 5, 2005
- Hitachi High-Technologies Corporation
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and plasma etching method
- Patent number 6,815,365
- Issue date Nov 9, 2004
- Hitachi, Ltd.
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 6,755,932
- Issue date Jun 29, 2004
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Wafer processing apparatus and a wafer stage and a wafer processing...
- Patent number 6,677,167
- Issue date Jan 13, 2004
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and a vacuum processing system
- Patent number 6,558,100
- Issue date May 6, 2003
- Hitachi, Ltd.
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer processing apparatus and method
- Patent number 6,549,393
- Issue date Apr 15, 2003
- Hitachi, Ltd.
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and a vacuum processing system
- Patent number 6,537,012
- Issue date Mar 25, 2003
- Hitachi, Ltd.
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,503,364
- Issue date Jan 7, 2003
- Hitachi, Ltd.
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,171,438
- Issue date Jan 9, 2001
- Hitachi, Ltd.
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing System And Apparatus And A Sample Processing Method
- Publication number 20080011422
- Publication date Jan 17, 2008
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20050236109
- Publication date Oct 27, 2005
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040177925
- Publication date Sep 16, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040118517
- Publication date Jun 24, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040118518
- Publication date Jun 24, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma etching apparatus
- Publication number 20040045675
- Publication date Mar 11, 2004
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer processing apparatus and a wafer stage and a wafer processing...
- Publication number 20040040933
- Publication date Mar 4, 2004
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20040016508
- Publication date Jan 29, 2004
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20040009617
- Publication date Jan 15, 2004
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus
- Publication number 20030203640
- Publication date Oct 30, 2003
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20030166343
- Publication date Sep 4, 2003
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer processing apparatus and a wafer stage and a wafer processing...
- Publication number 20030164226
- Publication date Sep 4, 2003
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER PROCESSING APPARATUS AND METHOD
- Publication number 20030030960
- Publication date Feb 13, 2003
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor wafer processing apparatus and method
- Publication number 20030029572
- Publication date Feb 13, 2003
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20030024646
- Publication date Feb 6, 2003
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and maintenance method therefor
- Publication number 20020179245
- Publication date Dec 5, 2002
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20020119670
- Publication date Aug 29, 2002
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and a vacuum processing system
- Publication number 20020081175
- Publication date Jun 27, 2002
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and a vacuum processing system
- Publication number 20020081174
- Publication date Jun 27, 2002
- Hironobu Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20020043338
- Publication date Apr 18, 2002
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus and plasma etching method
- Publication number 20020042206
- Publication date Apr 11, 2002
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD
- Publication number 20020005252
- Publication date Jan 17, 2002
- TOSHIO MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20010015175
- Publication date Aug 23, 2001
- Toshio Masuda
- G01 - MEASURING TESTING

Mitsuru Suehiro

Person

Patents Grantslast 30 patents

Plasma processing system and apparatus and a sample processing method

Plasma processing system and apparatus and a sample processing method

Plasma processing system and apparatus and a sample processing method

Plasma etching method

Plasma etching apparatus and plasma etching method

Plasma processing system and apparatus and a sample processing method

Wafer processing apparatus and a wafer stage and a wafer processing...

Vacuum processing apparatus and a vacuum processing system

Semiconductor wafer processing apparatus and method

Vacuum processing apparatus and a vacuum processing system

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Patents Applicationslast 30 patents

Plasma Processing System And Apparatus And A Sample Processing Method

Plasma etching apparatus and plasma etching method

Plasma processing system and apparatus and a sample processing method

Plasma processing system and apparatus and a sample processing method

Plasma processing system and apparatus and a sample processing method

Plasma etching apparatus

Wafer processing apparatus and a wafer stage and a wafer processing...

Plasma etching apparatus and plasma etching method

Plasma etching apparatus and plasma etching method

Plasma etching apparatus

Plasma etching method

Wafer processing apparatus and a wafer stage and a wafer processing...

SEMICONDUCTOR WAFER PROCESSING APPARATUS AND METHOD

Semiconductor wafer processing apparatus and method

Plasma etching apparatus and plasma etching method

Plasma processing apparatus and maintenance method therefor

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

Vacuum processing apparatus and a vacuum processing system

Vacuum processing apparatus and a vacuum processing system

Plasma etching apparatus and plasma etching method

Plasma etching apparatus and plasma etching method

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

Plasma processing system and apparatus and a sample processing method