Noboru Tokumasu

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming an interlayer insulating film, and semiconductor...
- Patent number 6,472,330
- Issue date Oct 29, 2002
- Canon Sales Co., Inc.
- Toshio Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and manufacturing method of semiconductor device
- Patent number 6,432,839
- Issue date Aug 13, 2002
- Canon Sales Co., Inc.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning substrate and method of manufacturing semiconduc...
- Patent number 6,372,650
- Issue date Apr 16, 2002
- Canon Sales Co., Inc.
- Toshio Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for modifying a film forming surface of a substrate on which...
- Patent number 6,255,230
- Issue date Jul 3, 2001
- Canon Sales Co., Inc.
- Hiroshi Ikakura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and manufacturing method of semiconductor device
- Patent number 6,221,755
- Issue date Apr 24, 2001
- Canon Sales Co., Inc.
- Noboru Tokumasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing system
- Patent number 6,212,789
- Issue date Apr 10, 2001
- Canon Sales Co., Inc.
- Toshio Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and semiconductor device manufacturing method
- Patent number 6,110,814
- Issue date Aug 29, 2000
- Canon Sales Co., Inc.
- Noboru Tokumasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removal of resist film and method for production of semi...
- Patent number 5,952,157
- Issue date Sep 14, 1999
- Canon Sales Co., Inc.
- Toshio Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film forming method and semiconductor device manufacturing method
- Patent number 5,915,200
- Issue date Jun 22, 1999
- Canon Sales Co., Inc.
- Noboru Tokumasu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing equipment and gas discharging device
- Patent number 5,834,730
- Issue date Nov 10, 1998
- Canon Sales Co., Inc.
- Setsu Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a fluorine containing silicon oxide film
- Patent number 5,800,877
- Issue date Sep 1, 1998
- Canon Sales Co., Inc.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for reforming insulating film
- Patent number 5,569,499
- Issue date Oct 29, 1996
- Semiconductor Process Laboratory Co., Ltd.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming insulating film
- Patent number 5,554,570
- Issue date Sep 10, 1996
- Canon Sales Co., Inc.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming insulating film
- Patent number 5,532,193
- Issue date Jul 2, 1996
- Canon Sales Co., Inc.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 5,484,749
- Issue date Jan 16, 1996
- Alcan-Tech Co., Inc.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing a semiconductor device
- Patent number 5,387,546
- Issue date Feb 7, 1995
- Canon Sales Co., Inc.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 5,376,591
- Issue date Dec 27, 1994
- Semiconductor Process Laboratory Co., Ltd.
- Kazuo Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming CVD thin glass films
- Patent number 5,324,539
- Issue date Jun 28, 1994
- Semiconductor Process Laboratory
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for manufacturing semiconductor device and method for man...
- Patent number 5,314,538
- Issue date May 24, 1994
- Semiconductor Process Laboratory
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for forming CVD film and semiconductor device
- Patent number 5,231,058
- Issue date Jul 27, 1993
- Semiconductor Process Laboratory Co. Ltd.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing semiconductor device
- Patent number 5,051,380
- Issue date Sep 24, 1991
- Semiconductor Process Laboratory Co., Ltd.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas-phase growth process and an apparatus for the same
- Patent number 4,731,255
- Issue date Mar 15, 1988
- Applied Materials Japan, Inc.
- Kazuo Maeda
- C30 - CRYSTAL GROWTH
Information Patent Grant
Gas-phase growth process
- Patent number 4,702,936
- Issue date Oct 27, 1987
- Applied Materials Japan, Inc.
- Kazuo Maeda
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
Method of forming a film of a semiconductor device
- Publication number 20020068377
- Publication date Jun 6, 2002
- Taizo Oku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing system and method for cleaning the same
- Publication number 20020062845
- Publication date May 30, 2002
- CANON SALES CO., LTD.
- Hideaki Kawai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CLEANING SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUC...
- Publication number 20020016076
- Publication date Feb 7, 2002
- TOSHIO KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film forming method and manufacturing method of semiconductor device
- Publication number 20010036754
- Publication date Nov 1, 2001
- CANON SALES CO., INC.
- Kazuo Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Noboru Tokumasu

Person

Patents Grantslast 30 patents

Method for forming an interlayer insulating film, and semiconductor...

Film forming method and manufacturing method of semiconductor device

Method of cleaning substrate and method of manufacturing semiconduc...

Method for modifying a film forming surface of a substrate on which...

Film formation method and manufacturing method of semiconductor device

Semiconductor device manufacturing system

Film forming method and semiconductor device manufacturing method

Method for removal of resist film and method for production of semi...

Film forming method and semiconductor device manufacturing method

Plasma processing equipment and gas discharging device

Method for forming a fluorine containing silicon oxide film

Method for reforming insulating film

Method of forming insulating film

Method for forming insulating film

Manufacturing method of semiconductor device

Method for manufacturing a semiconductor device

Method for manufacturing semiconductor device

Method for forming CVD thin glass films

Apparatus for manufacturing semiconductor device and method for man...

Process for forming CVD film and semiconductor device

Process for producing semiconductor device

Gas-phase growth process and an apparatus for the same

Gas-phase growth process

Patents Applicationslast 30 patents

Method of forming a film of a semiconductor device

Semiconductor manufacturing system and method for cleaning the same

METHOD OF CLEANING SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUC...

Film forming method and manufacturing method of semiconductor device