Fujino et al "Surface Modification of Base Material for TEOS/Oo.sub.3 . . . " J. of Electromechanical Soc. vol. 139, No. 6 (Jun. 1992). |
Wolf, Silicon Processing for the VLSI Era vol. 1 Process Tech. pp. 182-189 & 504. |
Electronics Letters, vol. 26, No. 11, May 24, 1990, Enage GB pp. 733-734, XP000108687, K. Aite et al. "Novel Low Temperature RF Plasma Annealing using NH3-N2 Gas Mixture". |
RCA Review, vol. 37, No. 1, Mar. 1976, Princeton US pp. 55-77 W. Kern "Densification of Vapor-Deposited Phosphosilicate Glass Films". pp. 55, paragraph 1-p. 56, paragraph 2; FIG. 3. |
J. Vac. Sci Technol B3(5) Sep./Oct. 1985 pp. 1352-1356. |