Ohmi Tadahiro

Person

Sendai, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for smoothing a perfluoro alkoxy alkane film surface
- Patent number 9,957,406
- Issue date May 1, 2018
- Tohoku University
- Masamichi Iwaki
- F05 - INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF...
Information Patent Grant
Flow rate range variable type flow rate control apparatus
- Patent number 9,921,089
- Issue date Mar 20, 2018
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Semiconductor transistor
- Patent number 9,875,899
- Issue date Jan 23, 2018
- Fuji Electric Co., Ltd.
- Hiroshi Kambayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering apparatus
- Patent number 9,812,302
- Issue date Nov 7, 2017
- National University Corporation Tohoku University
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shower plate sintered integrally with gas release hole member and m...
- Patent number 9,767,994
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Masahiro Okesaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal oxide film, laminate, metal member and process for producing...
- Patent number 9,476,137
- Issue date Oct 25, 2016
- Tohoku University
- Tadahiro Ohmi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Flow rate range variable type flow rate control apparatus
- Patent number 9,383,758
- Issue date Jul 5, 2016
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Semiconductor device
- Patent number 9,385,042
- Issue date Jul 5, 2016
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching backside Si substrate of SOI substrate to expose...
- Patent number 9,240,505
- Issue date Jan 19, 2016
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoelectric conversion element and solar cell
- Patent number 9,231,130
- Issue date Jan 5, 2016
- National University Corporation Tohoku University
- Tadahiro Ohmi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for fabricating semiconductor device and the semiconductor d...
- Patent number 9,230,799
- Issue date Jan 5, 2016
- Tohoku University
- Akinobu Teramoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,196,460
- Issue date Nov 24, 2015
- Tokyo Electron Limited
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface treatment method for atomically flattening a silicon wafer...
- Patent number 9,157,681
- Issue date Oct 13, 2015
- National University Corporation Tohoku University
- Tadahiro Ohmi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Flex-rigid printed wiring board and manufacturing method thereof
- Patent number 9,155,209
- Issue date Oct 6, 2015
- Daisho Denshi Co., Ltd.
- Akihiro Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gasket type orifice and pressure type flow rate control apparatus f...
- Patent number 9,133,951
- Issue date Sep 15, 2015
- Fujikin Incorporated
- Tadahiro Ohmi
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,105,450
- Issue date Aug 11, 2015
- Tohoku University
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,095,039
- Issue date Jul 28, 2015
- Tohoku University
- Masaki Hirayama
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Flow rate range variable type flow rate control apparatus
- Patent number 9,010,369
- Issue date Apr 21, 2015
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Manufacturing method of GaN-based semiconductor device and semicond...
- Patent number 8,999,788
- Issue date Apr 7, 2015
- TOHOKU UNIVERSITY
- Hiroshi Kambayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wiring board and method of manufacturing the same
- Patent number 8,981,234
- Issue date Mar 17, 2015
- National University Corporation Tohoku University
- Tadahiro Ohmi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photoelectric conversion device
- Patent number 8,941,005
- Issue date Jan 27, 2015
- National University Corporation Tohoku University
- Tadahiro Ohmi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Gate electrode comprising aluminum and zirconium
- Patent number 8,941,091
- Issue date Jan 27, 2015
- National University Corporation Tohoku University
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower plate sintered integrally with gas release hole member and m...
- Patent number 8,915,999
- Issue date Dec 23, 2014
- Tokyo Electron Limited
- Masahiro Okesaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of producing semiconductor transistor
- Patent number 8,906,796
- Issue date Dec 9, 2014
- TOHOKU UNIVERSITY
- Hiroshi Kambayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and semiconductor manu...
- Patent number 8,895,410
- Issue date Nov 25, 2014
- Tadahiro Ohmi
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 8,889,545
- Issue date Nov 18, 2014
- National University Corporation Tohoku University
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Solar cell wherein solar photovolatic thin film is directly formed...
- Patent number 8,841,545
- Issue date Sep 23, 2014
- Tohoku University
- Yoshihide Wakayama
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Metal gasket
- Patent number 8,807,573
- Issue date Aug 19, 2014
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,741,779
- Issue date Jun 3, 2014
- Rohm Co., Ltd.
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,733,281
- Issue date May 27, 2014
- Tokyo Electron Limited
- Masaki Hirayama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS
- Publication number 20160274595
- Publication date Sep 22, 2016
- Fujikin Incorporated
- Tadahiro Ohmi
- G01 - MEASURING TESTING
Information Patent Application
Surface Treatment Method for Atomically Flattening a Silicon Wafer...
- Publication number 20160276171
- Publication date Sep 22, 2016
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Tadahiro OHMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE AND SECONDARY BATTERY
- Publication number 20160172666
- Publication date Jun 16, 2016
- New Nippon Metal Mining Industry Co., Ltd.
- Kenzo Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS
- Publication number 20160109886
- Publication date Apr 21, 2016
- Fujikin Incorporated
- Tadahiro Ohmi
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR TREATING INNER WALL SURFACE OF MICRO-VACANCY
- Publication number 20160064213
- Publication date Mar 3, 2016
- Takeshi Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SMOOTHING A PERFLUORO ALKOXY ALKANE FILM SURFACE
- Publication number 20150225593
- Publication date Aug 13, 2015
- TOHOKU UNIVERSITY
- Masamichi Iwaki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS
- Publication number 20150160662
- Publication date Jun 11, 2015
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Application
ORGANIC SEMICONDUCTOR ELEMENT AND CMIS SEMICONDUCTOR DEVICE INCLUDI...
- Publication number 20150084013
- Publication date Mar 26, 2015
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER PLATE SINTERED INTEGRALLY WITH GAS RELEASE HOLE MEMBER AND M...
- Publication number 20150069674
- Publication date Mar 12, 2015
- TOKYO ELECTRON LIMITED
- Masahiro OKESAKU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20150054075
- Publication date Feb 26, 2015
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND THE SEMICONDUCTOR D...
- Publication number 20140367699
- Publication date Dec 18, 2014
- TOHOKU UNIVERSITY
- Akinobu TERAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20140252436
- Publication date Sep 11, 2014
- TOHOKU UNIVERSITY
- Tomoyuki Suwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS EXHAUST PUMP SYSTEM AND GAS EXHAUST METHOD
- Publication number 20140193283
- Publication date Jul 10, 2014
- TOHOKU UNIVERSITY
- Kenji Ohyama
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
ROTATION MECHANISM FOR GAS EXHAUST PUMP, MANUFACTURING METHOD OF TH...
- Publication number 20140186162
- Publication date Jul 3, 2014
- TOHOKU UNIVERSITY
- Masamichi Iwaki
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
STATOR FOR GAS EXHAUST PUMP, METHOD FOR MANUFACTURING THE SAME, PUM...
- Publication number 20140161600
- Publication date Jun 12, 2014
- TOHOKU UNIVERSITY
- Masamichi Iwaki
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
Ion Implantation Apparatus, Ion Implantation Method, and Semiconduc...
- Publication number 20140151853
- Publication date Jun 5, 2014
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Tadahiro OHMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCREW ROTOR FOR EXHAUST PUMP, METHOD FOR MANUFACTURING THE SAME, GA...
- Publication number 20140127031
- Publication date May 8, 2014
- TOHOKU UNIVERSITY
- Masamichi Iwaki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MAGNETRON SPUTTERING APPARATUS
- Publication number 20140027278
- Publication date Jan 30, 2014
- TOKYO ELECTRON LIMITED
- Tadahiro Ohmi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ETCHING OF SOI SUBSTRATE, AND BACK-ILLUMINATED PHOTOELECT...
- Publication number 20130320477
- Publication date Dec 5, 2013
- TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM TUBE AND VACUUM TUBE MANUFACTURING APPARATUS AND METHOD
- Publication number 20130307404
- Publication date Nov 21, 2013
- FOUNDATION FOR ADVANCEMENT OF INTERNATIONAL SCIENCE
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20130307092
- Publication date Nov 21, 2013
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF GaN-BASED SEMICONDUCTOR DEVICE AND SEMICOND...
- Publication number 20130307063
- Publication date Nov 21, 2013
- TOHOKU UNIVERSITY
- Hiroshi KAMBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20130309828
- Publication date Nov 21, 2013
- TOHOKU UNIVERSITY
- Hiroshi KAMBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130302918
- Publication date Nov 14, 2013
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gasket
- Publication number 20130300070
- Publication date Nov 14, 2013
- NIPPON VALQUA INDUSTRIES, LTD.
- Tadahiro Ohmi
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION ELEMENTS
- Publication number 20130295709
- Publication date Nov 7, 2013
- Tadahiro OHMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND THE SEMICONDUCTOR D...
- Publication number 20130292700
- Publication date Nov 7, 2013
- TOHOKU UNIVERSITY
- Akinobu Teramoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA HIGH-SPEED WET ETCHING APPARATUS
- Publication number 20130244442
- Publication date Sep 19, 2013
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER WIRING BOARD
- Publication number 20130235545
- Publication date Sep 12, 2013
- Zeon Corporation
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS
- Publication number 20130220451
- Publication date Aug 29, 2013
- Fujikin Incorporated
- Tadahiro Ohmi
- G01 - MEASURING TESTING

Ohmi Tadahiro

Person

Patents Grantslast 30 patents

Method for smoothing a perfluoro alkoxy alkane film surface

Flow rate range variable type flow rate control apparatus

Semiconductor transistor

Magnetron sputtering apparatus

Shower plate sintered integrally with gas release hole member and m...

Metal oxide film, laminate, metal member and process for producing...

Flow rate range variable type flow rate control apparatus

Semiconductor device

Method of etching backside Si substrate of SOI substrate to expose...

Photoelectric conversion element and solar cell

Method for fabricating semiconductor device and the semiconductor d...

Plasma processing apparatus and plasma processing method

Surface treatment method for atomically flattening a silicon wafer...

Flex-rigid printed wiring board and manufacturing method thereof

Gasket type orifice and pressure type flow rate control apparatus f...

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Flow rate range variable type flow rate control apparatus

Manufacturing method of GaN-based semiconductor device and semicond...

Wiring board and method of manufacturing the same

Photoelectric conversion device

Gate electrode comprising aluminum and zirconium

Shower plate sintered integrally with gas release hole member and m...

Method of producing semiconductor transistor

Method of manufacturing semiconductor device and semiconductor manu...

Method of manufacturing a semiconductor device

Solar cell wherein solar photovolatic thin film is directly formed...

Metal gasket

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Patents Applicationslast 30 patents

FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS

Surface Treatment Method for Atomically Flattening a Silicon Wafer...

ELECTRODE STRUCTURE AND SECONDARY BATTERY

FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS

METHOD FOR TREATING INNER WALL SURFACE OF MICRO-VACANCY

METHOD FOR SMOOTHING A PERFLUORO ALKOXY ALKANE FILM SURFACE

FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS

ORGANIC SEMICONDUCTOR ELEMENT AND CMIS SEMICONDUCTOR DEVICE INCLUDI...

SHOWER PLATE SINTERED INTEGRALLY WITH GAS RELEASE HOLE MEMBER AND M...

SEMICONDUCTOR DEVICE

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND THE SEMICONDUCTOR D...

SEMICONDUCTOR DEVICE

GAS EXHAUST PUMP SYSTEM AND GAS EXHAUST METHOD

ROTATION MECHANISM FOR GAS EXHAUST PUMP, MANUFACTURING METHOD OF TH...

STATOR FOR GAS EXHAUST PUMP, METHOD FOR MANUFACTURING THE SAME, PUM...

Ion Implantation Apparatus, Ion Implantation Method, and Semiconduc...

SCREW ROTOR FOR EXHAUST PUMP, METHOD FOR MANUFACTURING THE SAME, GA...

MAGNETRON SPUTTERING APPARATUS

METHOD OF ETCHING OF SOI SUBSTRATE, AND BACK-ILLUMINATED PHOTOELECT...

VACUUM TUBE AND VACUUM TUBE MANUFACTURING APPARATUS AND METHOD

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

MANUFACTURING METHOD OF GaN-BASED SEMICONDUCTOR DEVICE AND SEMICOND...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Metal Gasket

METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION ELEMENTS

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND THE SEMICONDUCTOR D...

ULTRA HIGH-SPEED WET ETCHING APPARATUS

MULTILAYER WIRING BOARD

FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS