Olivier Luere

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer edge ring lifting solution
- Patent number 12,094,752
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback loop for controlling a pulsed voltage waveform
- Patent number 12,057,292
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing using pulsed-voltage and radio-frequency power
- Patent number 11,848,176
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 11,776,789
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 11,728,124
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feedback loop for controlling a pulsed voltage waveform
- Patent number 11,699,572
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ deposition process
- Patent number 11,521,849
- Issue date Dec 6, 2022
- Applied Materials, Inc.
- Sang Wook Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High voltage filter assembly
- Patent number 11,508,554
- Issue date Nov 22, 2022
- Applied Materials, Inc.
- Anurag Kumar Mishra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,482,402
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing assembly using pulsed-voltage and radio-frequency...
- Patent number 11,462,388
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed-voltage hardware assembly for use in a plasma processing system
- Patent number 11,462,389
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer edge ring lifting solution
- Patent number 11,393,710
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generator
- Patent number 11,284,500
- Issue date Mar 22, 2022
- APPLIED MATERIALS, INC.
- Leonid Dorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 11,069,504
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Universal process kit
- Patent number 11,049,760
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Olivier Joubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,991,556
- Issue date Apr 27, 2021
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of generating a pulsed waveform
- Patent number 10,923,321
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of forming plasma using a pulsed waveform
- Patent number 10,916,408
- Issue date Feb 9, 2021
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,791,617
- Issue date Sep 29, 2020
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 10,685,807
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,553,404
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,555,412
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Leonid Dorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,504,702
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,448,495
- Issue date Oct 15, 2019
- Applied Materials, Inc.
- Leonid Dorf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of controlling ion energy distribution using a pulse generat...
- Patent number 10,448,494
- Issue date Oct 15, 2019
- Applied Materials, Inc.
- Leonid Dorf
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 10,312,048
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Minimization of ring erosion during plasma processes
- Patent number 10,109,464
- Issue date Oct 23, 2018
- Applied Materials, Inc.
- Olivier Joubert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,103,010
- Issue date Oct 16, 2018
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 9,947,517
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite edge ring
- Patent number D797691
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Olivier Joubert
- D13 - Equipment for production, distribution, or transformation of energy

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20240030002
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Creating Ion Energy Distribution Functions (IEDF)
- Publication number 20230352264
- Publication date Nov 2, 2023
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20230326717
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIAS VOLTAGE MODULATION APPROACH FOR SiO/SiN LAYER ALTERNATING ETCH...
- Publication number 20230223268
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Sean KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20230030927
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20220319904
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED-VOLTAGE HARDWARE ASSEMBLY FOR USE IN A PLASMA PROCESSING SYSTEM
- Publication number 20220037120
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...
- Publication number 20220037119
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER
- Publication number 20220037121
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20210343496
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210193438
- Publication date Jun 24, 2021
- Applied Materials, Inc.
- Leonid DORF
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
IN-SITU ATOMIC LAYER DEPOSITION PROCESS
- Publication number 20200373149
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Sang Wook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERATOR
- Publication number 20200352017
- Publication date Nov 5, 2020
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20200266022
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE FILTER ASSEMBLY
- Publication number 20200243303
- Publication date Jul 30, 2020
- Applied Materials, Inc.
- Anurag Kumar MISHRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF GENERATING A PULSED WAVEFORM
- Publication number 20200234922
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF FORMING PLASMA USING A PULSED WAVEFORM
- Publication number 20200234923
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Feedback loop for controlling a pulsed voltage waveform
- Publication number 20200234921
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
- Publication number 20200154556
- Publication date May 14, 2020
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20200118798
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU DEPOSITION PROCESS
- Publication number 20200027717
- Publication date Jan 23, 2020
- Applied Materials, Inc.
- Sang Wook PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...
- Publication number 20190350072
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- Leonid DORF
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20190259562
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING WITH POWERED EDGE RING
- Publication number 20190228952
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MINIMIZATION OF RING EROSION DURING PLASMA PROCESSES
- Publication number 20190043697
- Publication date Feb 7, 2019
- Applied Materials, Inc.
- Olivier JOUBERT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180315583
- Publication date Nov 1, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180233334
- Publication date Aug 16, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180218933
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20180166249
- Publication date Jun 14, 2018
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING A VOLTAGE WAVEFORM AT A SUBSTRA...
- Publication number 20170358431
- Publication date Dec 14, 2017
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS

Olivier Luere

Person

Patents Grantslast 30 patents

Wafer edge ring lifting solution

Feedback loop for controlling a pulsed voltage waveform

Plasma processing using pulsed-voltage and radio-frequency power

Plasma processing assembly using pulsed-voltage and radio-frequency...

Creating ion energy distribution functions (IEDF)

Feedback loop for controlling a pulsed voltage waveform

In-situ deposition process

High voltage filter assembly

Methods and apparatus for processing a substrate

Plasma processing assembly using pulsed-voltage and radio-frequency...

Pulsed-voltage hardware assembly for use in a plasma processing system

Wafer edge ring lifting solution

Method of controlling ion energy distribution using a pulse generator

Creating ion energy distribution functions (IEDF)

Universal process kit

Adjustable extended electrode for edge uniformity control

Apparatus and method of generating a pulsed waveform

Apparatus and method of forming plasma using a pulsed waveform

Method of controlling ion energy distribution using a pulse generat...

Creating ion energy distribution functions (IEDF)

Adjustable extended electrode for edge uniformity control

Method of controlling ion energy distribution using a pulse generat...

Adjustable extended electrode for edge uniformity control

Method of controlling ion energy distribution using a pulse generat...

Method of controlling ion energy distribution using a pulse generat...

Creating ion energy distribution functions (IEDF)

Minimization of ring erosion during plasma processes

Adjustable extended electrode for edge uniformity control

Adjustable extended electrode for edge uniformity control

Composite edge ring

Patents Applicationslast 30 patents

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

Creating Ion Energy Distribution Functions (IEDF)

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

BIAS VOLTAGE MODULATION APPROACH FOR SiO/SiN LAYER ALTERNATING ETCH...

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

WAFER EDGE RING LIFTING SOLUTION

PULSED-VOLTAGE HARDWARE ASSEMBLY FOR USE IN A PLASMA PROCESSING SYSTEM

PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY...

PLASMA PROCESSING USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

IN-SITU ATOMIC LAYER DEPOSITION PROCESS

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERATOR

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

HIGH VOLTAGE FILTER ASSEMBLY

APPARATUS AND METHOD OF GENERATING A PULSED WAVEFORM

APPARATUS AND METHOD OF FORMING PLASMA USING A PULSED WAVEFORM

Feedback loop for controlling a pulsed voltage waveform

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

IN-SITU DEPOSITION PROCESS

METHOD OF CONTROLLING ION ENERGY DISTRIBUTION USING A PULSE GENERAT...

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

PROCESSING WITH POWERED EDGE RING

MINIMIZATION OF RING EROSION DURING PLASMA PROCESSES

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

SYSTEMS AND METHODS FOR CONTROLLING A VOLTAGE WAVEFORM AT A SUBSTRA...