Ramkumar Subramanian

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods that control liquid temperature in immersion li...
- Patent number 8,547,521
- Issue date Oct 1, 2013
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 8,007,631
- Issue date Aug 30, 2011
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Inverse resist coating process
- Patent number 7,943,289
- Issue date May 17, 2011
- GLOBALFOUNDRIES Inc.
- Bharath Rangarajan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface treatment with an acidic composition to prevent substrate a...
- Patent number 7,799,514
- Issue date Sep 21, 2010
- GLOBALFOUNDRIES Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask having sidewall absorbers to enable the printing of finer feat...
- Patent number 7,604,903
- Issue date Oct 20, 2009
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recirculation and reuse of dummy dispensed resist
- Patent number 7,591,902
- Issue date Sep 22, 2009
- GLOBALFOUNDRIES Inc.
- Bharath Rangarajan
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Feedback control of imprint mask feature profile using scatterometr...
- Patent number 7,449,348
- Issue date Nov 11, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post fabrication CD modification on imprint lithography mask
- Patent number 7,386,162
- Issue date Jun 10, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint lithography mask trimming for imprint mask using etch
- Patent number 7,384,569
- Issue date Jun 10, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Using supercritical fluids to clean lenses and monitor defects
- Patent number 7,381,278
- Issue date Jun 3, 2008
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topography compensation of imprint lithography patterning
- Patent number 7,376,259
- Issue date May 20, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of making an organic memory cell
- Patent number 7,374,654
- Issue date May 20, 2008
- Spansion LLC
- Mark S. Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Two mask photoresist exposure pattern for dense and isolated regions
- Patent number 7,368,225
- Issue date May 6, 2008
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resist to pattern organic low k-dielectrics
- Patent number 7,309,659
- Issue date Dec 18, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extraction of tool independent line-edge-roughness (LER) measuremen...
- Patent number 7,310,155
- Issue date Dec 18, 2007
- Advanced Micro Devices, Inc.
- Luigi Capodieci
- G01 - MEASURING TESTING
Information Patent Grant
Method for manufacturing place & route based on 2-D forbidden patterns
- Patent number 7,305,645
- Issue date Dec 4, 2007
- Advanced Micro Technologies, Inc.
- Luigi Capodieci
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods of imprint lithography with adjustable mask
- Patent number 7,295,288
- Issue date Nov 13, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Frame structure for turbulence control in immersion lithography
- Patent number 7,289,193
- Issue date Oct 30, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic BARC with adjustable etch rate
- Patent number 7,262,138
- Issue date Aug 28, 2007
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of supercritical fluid to dry wafer and clean lens in immersion...
- Patent number 7,262,422
- Issue date Aug 28, 2007
- Spansion LLC
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ reticle contamination detection system at exposure wavelength
- Patent number 7,251,033
- Issue date Jul 31, 2007
- Advanced Micro Devices, Inc.
- Khoi Phan
- G01 - MEASURING TESTING
Information Patent Grant
Using scatterometry to verify contact hole opening during tapered b...
- Patent number 7,235,414
- Issue date Jun 26, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G01 - MEASURING TESTING
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 7,235,474
- Issue date Jun 26, 2007
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ defect monitor and control system for immersion medium in i...
- Patent number 7,224,456
- Issue date May 29, 2007
- Advanced Micro Devices, Inc.
- Khoi Phan
- G01 - MEASURING TESTING
Information Patent Grant
Composite alignment mark scheme for multi-layers in lithography
- Patent number 7,221,060
- Issue date May 22, 2007
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Systems and methods that employ exposure compensation to provide un...
- Patent number 7,187,796
- Issue date Mar 6, 2007
- Advanced Micro Devices, Inc.
- Khoi A. Phan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time immersion medium control using scatterometry
- Patent number 7,158,896
- Issue date Jan 2, 2007
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using supercritical fluids to clean lenses and monitor defects
- Patent number 7,156,925
- Issue date Jan 2, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Re-circulation and reuse of dummy-dispensed resist
- Patent number 7,153,364
- Issue date Dec 26, 2006
- Advance Micro Devices, Inc.
- Bharath Rangarajan
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
SO2 treatment of oxidized CuO for copper sulfide formation of memor...
- Patent number 7,115,440
- Issue date Oct 3, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR IMPRINT LITHOGRAPHY TO FACILITATE DUAL DAMASC...
- Publication number 20070283883
- Publication date Dec 13, 2007
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- B82 - NANO-TECHNOLOGY
Information Patent Application
RECIRCULATION AND REUSE OF DUMMY DISPENSED RESIST
- Publication number 20070261636
- Publication date Nov 15, 2007
- Advanced Micro Devices, Inc.
- Bharath Rangarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of supercritical fluid to dry wafer and clean lens in immersion...
- Publication number 20070026345
- Publication date Feb 1, 2007
- Spansion LLC
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inverse resist coating process
- Publication number 20050164133
- Publication date Jul 28, 2005
- Advanced Micro Devices, Inc.
- Bharath Rangarajan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contact etch resistant spacers
- Publication number 20050121738
- Publication date Jun 9, 2005
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sidewall formation for high density polymer memory element array
- Publication number 20050092983
- Publication date May 5, 2005
- Christopher F. Lyons
- G11 - INFORMATION STORAGE
Information Patent Application
PHOTOSENSITIVE POLYMERIC MEMORY ELEMENTS
- Publication number 20050045877
- Publication date Mar 3, 2005
- Christopher F. Lyons
- G11 - INFORMATION STORAGE
Information Patent Application
Using scatterometry to obtain measurements of in circuit structures
- Publication number 20040078108
- Publication date Apr 22, 2004
- Bryan K. Choo
- G01 - MEASURING TESTING
Information Patent Application
Comprehensive integrated lithographic process control system based...
- Publication number 20040063009
- Publication date Apr 1, 2004
- Khoi A. Phan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated pressure sensor for measuring multiaxis pressure gradients
- Publication number 20030188829
- Publication date Oct 9, 2003
- Bharath Rangarajan
- B24 - GRINDING POLISHING
Information Patent Application
Nozzle arm movement for resist development
- Publication number 20030068430
- Publication date Apr 10, 2003
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ or ex-situ profile monitoring of phase openings on alternat...
- Publication number 20030052084
- Publication date Mar 20, 2003
- Cyrus E. Tabery
- G01 - MEASURING TESTING
Information Patent Application
WAFER BASED TEMPERATURE SENSORS FOR CHARACTERIZING CHEMICAL MECHANI...
- Publication number 20030055526
- Publication date Mar 20, 2003
- Steven C. Avanzino
- B24 - GRINDING POLISHING
Information Patent Application
Critical dimension monitoring from latent image
- Publication number 20030002878
- Publication date Jan 2, 2003
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Using scatterometry for etch end points for dual damascene process
- Publication number 20030000644
- Publication date Jan 2, 2003
- Ramkumar Subramanian
- G01 - MEASURING TESTING
Information Patent Application
Using scatterometry to develop real time etch image
- Publication number 20030000922
- Publication date Jan 2, 2003
- Ramkumar Subramanian
- G01 - MEASURING TESTING
Information Patent Application
Growing copper vias or lines within a patterned resist using a copp...
- Publication number 20030003701
- Publication date Jan 2, 2003
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual damascene using removable via studs
- Publication number 20020164544
- Publication date Nov 7, 2002
- Advanced Micro Devices, Inc.
- Todd P. Luckanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Modification of mask layout data to improve mask fidelity
- Publication number 20020160281
- Publication date Oct 31, 2002
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inverse resist coating process
- Publication number 20020155389
- Publication date Oct 24, 2002
- Bharath Rangarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scatterometry techniques to ascertain asymmetry profile of features...
- Publication number 20020135781
- Publication date Sep 26, 2002
- Bhanwar Singh
- G01 - MEASURING TESTING
Information Patent Application
DAMASCENE PROCESSING EMPLOYING LOW SI-SION ETCH STOP LAYER/ARC
- Publication number 20020123217
- Publication date Sep 5, 2002
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Slot via filled dual damascene structure without middle stop layer...
- Publication number 20020106889
- Publication date Aug 8, 2002
- Advanced Micro Devices, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FABRICATING A SLOT DUAL DAMASCENE STRUCTURE WITHOUT MIDDL...
- Publication number 20020106885
- Publication date Aug 8, 2002
- Advanced Micro Devices, Inc.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual damascene process utilizing a bi-layer imaging layer
- Publication number 20020061470
- Publication date May 23, 2002
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF SILICON OXYNITRIDE ARC FOR METAL LAYERS
- Publication number 20010046791
- Publication date Nov 29, 2001
- RAMKUMAR SUBRAMANIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN CONTACT BARC FOR TUNGSTEN POLISHED CONTACTS
- Publication number 20010041444
- Publication date Nov 15, 2001
- JEFFREY A. SHIELDS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual damascene method for backened metallization using poly stop la...
- Publication number 20010027003
- Publication date Oct 4, 2001
- Bharath Rangarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECT STRUCTURE WITH SILICON CONTAINING ALICYCLIC POLYMERS A...
- Publication number 20010012689
- Publication date Aug 9, 2001
- UZODINMA OKOROANYANWU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ozone cleaning of wafers
- Publication number 20010010229
- Publication date Aug 2, 2001
- R. Subramanian
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS

Ramkumar Subramanian

Person

Patents Grantslast 30 patents

Systems and methods that control liquid temperature in immersion li...

System and method for imprint lithography to facilitate dual damasc...

Inverse resist coating process

Surface treatment with an acidic composition to prevent substrate a...

Mask having sidewall absorbers to enable the printing of finer feat...

Recirculation and reuse of dummy dispensed resist

Feedback control of imprint mask feature profile using scatterometr...

Post fabrication CD modification on imprint lithography mask

Imprint lithography mask trimming for imprint mask using etch

Using supercritical fluids to clean lenses and monitor defects

Topography compensation of imprint lithography patterning

Method of making an organic memory cell

Two mask photoresist exposure pattern for dense and isolated regions

Silicon-containing resist to pattern organic low k-dielectrics

Extraction of tool independent line-edge-roughness (LER) measuremen...

Method for manufacturing place & route based on 2-D forbidden patterns

Systems and methods of imprint lithography with adjustable mask

Frame structure for turbulence control in immersion lithography

Organic BARC with adjustable etch rate

Use of supercritical fluid to dry wafer and clean lens in immersion...

In-situ reticle contamination detection system at exposure wavelength

Using scatterometry to verify contact hole opening during tapered b...

System and method for imprint lithography to facilitate dual damasc...

In-situ defect monitor and control system for immersion medium in i...

Composite alignment mark scheme for multi-layers in lithography

Systems and methods that employ exposure compensation to provide un...

Real time immersion medium control using scatterometry

Using supercritical fluids to clean lenses and monitor defects

Re-circulation and reuse of dummy-dispensed resist

SO2 treatment of oxidized CuO for copper sulfide formation of memor...

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR IMPRINT LITHOGRAPHY TO FACILITATE DUAL DAMASC...

RECIRCULATION AND REUSE OF DUMMY DISPENSED RESIST

Use of supercritical fluid to dry wafer and clean lens in immersion...

Inverse resist coating process

Contact etch resistant spacers

Sidewall formation for high density polymer memory element array

PHOTOSENSITIVE POLYMERIC MEMORY ELEMENTS

Using scatterometry to obtain measurements of in circuit structures

Comprehensive integrated lithographic process control system based...

Integrated pressure sensor for measuring multiaxis pressure gradients

Nozzle arm movement for resist development

In-situ or ex-situ profile monitoring of phase openings on alternat...

WAFER BASED TEMPERATURE SENSORS FOR CHARACTERIZING CHEMICAL MECHANI...

Critical dimension monitoring from latent image

Using scatterometry for etch end points for dual damascene process

Using scatterometry to develop real time etch image

Growing copper vias or lines within a patterned resist using a copp...

Dual damascene using removable via studs

Modification of mask layout data to improve mask fidelity

Inverse resist coating process

Scatterometry techniques to ascertain asymmetry profile of features...

DAMASCENE PROCESSING EMPLOYING LOW SI-SION ETCH STOP LAYER/ARC

Slot via filled dual damascene structure without middle stop layer...

METHOD OF FABRICATING A SLOT DUAL DAMASCENE STRUCTURE WITHOUT MIDDL...

Dual damascene process utilizing a bi-layer imaging layer

USE OF SILICON OXYNITRIDE ARC FOR METAL LAYERS

TIN CONTACT BARC FOR TUNGSTEN POLISHED CONTACTS

Dual damascene method for backened metallization using poly stop la...

INTERCONNECT STRUCTURE WITH SILICON CONTAINING ALICYCLIC POLYMERS A...

Ozone cleaning of wafers