Richard H. Lane

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of providing electrical isolation and semiconductor structu...
- Patent number 8,987,834
- Issue date Mar 24, 2015
- Micron Technology, Inc.
- Paul Grisham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned semiconductor trench structures
- Patent number 8,685,859
- Issue date Apr 1, 2014
- Micron Technology, Inc.
- Juengling Werner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned semiconductor trench structures
- Patent number 8,552,526
- Issue date Oct 8, 2013
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming an integrated circuit with self-aligned trench f...
- Patent number 8,343,875
- Issue date Jan 1, 2013
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of providing electrical isolation and semiconductor structu...
- Patent number 8,148,775
- Issue date Apr 3, 2012
- Micron Technology, Inc.
- Brent D. Gilgen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned trench formation
- Patent number 8,101,497
- Issue date Jan 24, 2012
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of patterning noble metals for semiconductor devices by elec...
- Patent number 7,943,477
- Issue date May 17, 2011
- Round Rock Research, LLC
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing methods
- Patent number 7,935,602
- Issue date May 3, 2011
- Micron Technology, Inc.
- Hongmei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electropolished patterned metal layer for semiconductor devices
- Patent number 7,629,630
- Issue date Dec 8, 2009
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reverse metal process for creating a metal silicide transistor gate...
- Patent number 7,601,598
- Issue date Oct 13, 2009
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for a self-aligned silicided word line and pol...
- Patent number 7,501,672
- Issue date Mar 10, 2009
- Micron Technology, Inc.
- Fredrick D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming controlled geometry hardmasks including subresol...
- Patent number 7,473,644
- Issue date Jan 6, 2009
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of electrochemically treating semiconductor substrates
- Patent number 7,375,014
- Issue date May 20, 2008
- Micron Technology, Inc.
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming capacitor constructions
- Patent number 7,348,234
- Issue date Mar 25, 2008
- Micron Technology, Inc.
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of electroplating a substance over a semiconductor substrate
- Patent number 7,344,977
- Issue date Mar 18, 2008
- Micron Technology, Inc.
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting methods
- Patent number 7,329,618
- Issue date Feb 12, 2008
- Micron Technology, Inc.
- Randall Culver
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reverse metal process for creating a metal silicide transistor gate...
- Patent number 7,288,817
- Issue date Oct 30, 2007
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of electrochemically treating semiconductor substrates
- Patent number 7,282,131
- Issue date Oct 16, 2007
- Micron Technology, Inc.
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of electroplating a substance over a semiconductor substrate
- Patent number 7,273,778
- Issue date Sep 25, 2007
- Micron Technology, Inc.
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a metal-containing layer over selected regions of...
- Patent number 7,179,716
- Issue date Feb 20, 2007
- Micron Technology, Inc.
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a mass over a semiconductor substrate
- Patent number 7,179,361
- Issue date Feb 20, 2007
- Micron Technology, Inc.
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor with noble metal pattern
- Patent number 7,157,761
- Issue date Jan 2, 2007
- Micron Technology, Inc.
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for a self-aligned silicided word line and pol...
- Patent number 7,119,024
- Issue date Oct 10, 2006
- Micron Technology, Inc.
- Fredrick D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double blanket ion implant method and structure
- Patent number 7,119,397
- Issue date Oct 10, 2006
- Micron Technology, Inc.
- Mark Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming conductive material in opening and structure reg...
- Patent number 7,112,508
- Issue date Sep 26, 2006
- Micron Technology, Inc.
- Howard E. Rhodes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor gate structure
- Patent number 7,067,880
- Issue date Jun 27, 2006
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming capacitor constructions
- Patent number 6,984,301
- Issue date Jan 10, 2006
- Micron Technology, Inc.
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory cell having improved interconnect
- Patent number 6,979,849
- Issue date Dec 27, 2005
- Micron Technology, Inc.
- Richard Lane
- G11 - INFORMATION STORAGE
Information Patent Grant
Isolation region forming methods
- Patent number 6,967,146
- Issue date Nov 22, 2005
- Micron Technology, Inc.
- David L. Dickerson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field emission device having a covering comprising aluminum nitride
- Patent number 6,894,306
- Issue date May 17, 2005
- Micron Technology, Inc.
- Brenda D. Kraus
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR STRUCTURES PROVIDING ELECTRICAL ISOLATION
- Publication number 20150187767
- Publication date Jul 2, 2015
- Micron Technology, Inc.
- Paul Grisham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED SEMICONDUCTOR TRENCH STRUCTURES
- Publication number 20140030869
- Publication date Jan 30, 2014
- Micron Technology, Inc.
- Juengling Werner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED SEMICONDUCTOR TRENCH STRUCTURES
- Publication number 20130113069
- Publication date May 9, 2013
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PROVIDING ELECTRICAL ISOLATION AND SEMICONDUCTOR STRUCTU...
- Publication number 20120181605
- Publication date Jul 19, 2012
- Micron Technology, Inc.
- Paul Grisham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING AN INTEGRATED CIRCUIT WITH SELF-ALIGNED TRENCH F...
- Publication number 20120108069
- Publication date May 3, 2012
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PROVIDING ELECTRICAL ISOLATION AND SEMICONDUCTOR STRUCTU...
- Publication number 20100133609
- Publication date Jun 3, 2010
- Micron Technology, Inc.
- Brent D. Gilgen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED TRENCH FORMATION
- Publication number 20100062579
- Publication date Mar 11, 2010
- Micron Technology, Inc.
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING NOBLE METALS FOR SEMICONDUCTOR DEVICES BY ELEC...
- Publication number 20100055863
- Publication date Mar 4, 2010
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF PROVIDING ELECTRICAL ISOLATION AND SEMICONDUCTOR STRUCTU...
- Publication number 20090294840
- Publication date Dec 3, 2009
- Micron Technology, Inc.
- Brent D. Gilgen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reverse metal process for creating a metal silicide transistor gate...
- Publication number 20080038893
- Publication date Feb 14, 2008
- Warner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and structure for a self-aligned silicided word line and pol...
- Publication number 20070164350
- Publication date Jul 19, 2007
- Frederick D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor constructions
- Publication number 20070117347
- Publication date May 24, 2007
- Hongmei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Controlled geometry hardmask including subresolution elements
- Publication number 20070020939
- Publication date Jan 25, 2007
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing methods, and semiconductor constructions
- Publication number 20060292787
- Publication date Dec 28, 2006
- Hongmei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanting methods
- Publication number 20060292838
- Publication date Dec 28, 2006
- Micron Technology, Inc.
- Randall Culver
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A method of forming semiconductor structures
- Publication number 20060234469
- Publication date Oct 19, 2006
- Micron Technology, Inc.
- David L. Dickerson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming controlled geometry hardmasks including subresol...
- Publication number 20060003182
- Publication date Jan 5, 2006
- Richard H. Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming conductive material in opening and structure reg...
- Publication number 20050186779
- Publication date Aug 25, 2005
- Micron Technology, Inc.
- Howard E. Rhodes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double blanket ion implant method and structure
- Publication number 20050181567
- Publication date Aug 18, 2005
- Mark Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a metal-containing layer over selected regions of...
- Publication number 20050167280
- Publication date Aug 4, 2005
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of forming capacitor constructions
- Publication number 20050167278
- Publication date Aug 4, 2005
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of electrochemically treating semiconductor substrates
- Publication number 20050167279
- Publication date Aug 4, 2005
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of electroplating a substance over a semiconductor substrate
- Publication number 20050167277
- Publication date Aug 4, 2005
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of electrochemically treating semiconductor substrates
- Publication number 20050139480
- Publication date Jun 30, 2005
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a mass over a semiconductor substrate
- Publication number 20050139479
- Publication date Jun 30, 2005
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of electroplating a substance over a semiconductor substrate
- Publication number 20050139481
- Publication date Jun 30, 2005
- Dale W. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Memory cell having improved interconnect
- Publication number 20050139884
- Publication date Jun 30, 2005
- Richard Lane
- G11 - INFORMATION STORAGE
Information Patent Application
Reverse metal process for creating a metal silicide transistor gate...
- Publication number 20050124106
- Publication date Jun 9, 2005
- Werner Juengling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and structure for a self-aligned silicided word line and pol...
- Publication number 20050009343
- Publication date Jan 13, 2005
- Fredrick D. Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Isolation region forming methods
- Publication number 20040241957
- Publication date Dec 2, 2004
- Micron Technology, Inc.
- David L. Dickerson
- H01 - BASIC ELECTRIC ELEMENTS

Richard H. Lane

Person

Patents Grantslast 30 patents

Methods of providing electrical isolation and semiconductor structu...

Self-aligned semiconductor trench structures

Self-aligned semiconductor trench structures

Methods of forming an integrated circuit with self-aligned trench f...

Methods of providing electrical isolation and semiconductor structu...

Self-aligned trench formation

Method of patterning noble metals for semiconductor devices by elec...

Semiconductor processing methods

Electropolished patterned metal layer for semiconductor devices

Reverse metal process for creating a metal silicide transistor gate...

Method and structure for a self-aligned silicided word line and pol...

Method for forming controlled geometry hardmasks including subresol...

Methods of electrochemically treating semiconductor substrates

Methods of forming capacitor constructions

Method of electroplating a substance over a semiconductor substrate

Ion implanting methods

Reverse metal process for creating a metal silicide transistor gate...

Methods of electrochemically treating semiconductor substrates

Method of electroplating a substance over a semiconductor substrate

Method of forming a metal-containing layer over selected regions of...

Method of forming a mass over a semiconductor substrate

Capacitor with noble metal pattern

Method and structure for a self-aligned silicided word line and pol...

Double blanket ion implant method and structure

Method for forming conductive material in opening and structure reg...

Transistor gate structure

Methods of forming capacitor constructions

Memory cell having improved interconnect

Isolation region forming methods

Field emission device having a covering comprising aluminum nitride

Patents Applicationslast 30 patents

SEMICONDUCTOR STRUCTURES PROVIDING ELECTRICAL ISOLATION

SELF-ALIGNED SEMICONDUCTOR TRENCH STRUCTURES

SELF-ALIGNED SEMICONDUCTOR TRENCH STRUCTURES

METHODS OF PROVIDING ELECTRICAL ISOLATION AND SEMICONDUCTOR STRUCTU...

METHODS OF FORMING AN INTEGRATED CIRCUIT WITH SELF-ALIGNED TRENCH F...

METHODS OF PROVIDING ELECTRICAL ISOLATION AND SEMICONDUCTOR STRUCTU...

SELF-ALIGNED TRENCH FORMATION

METHOD OF PATTERNING NOBLE METALS FOR SEMICONDUCTOR DEVICES BY ELEC...

METHODS OF PROVIDING ELECTRICAL ISOLATION AND SEMICONDUCTOR STRUCTU...

Reverse metal process for creating a metal silicide transistor gate...

Method and structure for a self-aligned silicided word line and pol...

Semiconductor constructions

Controlled geometry hardmask including subresolution elements

Semiconductor processing methods, and semiconductor constructions

Ion implanting methods

A method of forming semiconductor structures

Method for forming controlled geometry hardmasks including subresol...

Method for forming conductive material in opening and structure reg...

Double blanket ion implant method and structure

Method of forming a metal-containing layer over selected regions of...

Methods of forming capacitor constructions

Methods of electrochemically treating semiconductor substrates

Method of electroplating a substance over a semiconductor substrate

Methods of electrochemically treating semiconductor substrates

Method of forming a mass over a semiconductor substrate

Method of electroplating a substance over a semiconductor substrate

Memory cell having improved interconnect

Reverse metal process for creating a metal silicide transistor gate...

Method and structure for a self-aligned silicided word line and pol...

Isolation region forming methods