Richard Holscher

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
CFA resist silylation for limiting color interactions and improving...
- Patent number 9,240,427
- Issue date Jan 19, 2016
- Semiconductor Components Industries, LLC
- Brian Vaartstra
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Imaging systems with image pixels having varying light collecting a...
- Patent number 9,172,892
- Issue date Oct 27, 2015
- Semiconductor Components Industries, LLC
- Alexandre G. Dokoutchaev
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Dielectric barriers for pixel arrays
- Patent number 9,093,579
- Issue date Jul 28, 2015
- Semiconductor Components Industries, LLC
- Jeffrey Mackey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imaging systems with color filter barriers
- Patent number 8,878,969
- Issue date Nov 4, 2014
- Aptina Imaging Corporation
- Richard Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor constructions
- Patent number 7,825,443
- Issue date Nov 2, 2010
- Micron Technology, Inc.
- Richard Holscher
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Intermediate semiconductor device structures
- Patent number 7,821,142
- Issue date Oct 26, 2010
- Micron Technology, Inc.
- Richard D. Holscher
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor constructions having antireflective portions
- Patent number 7,804,115
- Issue date Sep 28, 2010
- Micron Technology, Inc.
- Richard Holscher
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor devices having antireflective material
- Patent number 7,626,238
- Issue date Dec 1, 2009
- Micron Technology, Inc.
- Richard Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuitry and gate stacks
- Patent number 7,576,400
- Issue date Aug 18, 2009
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming openings, and methods of forming container capac...
- Patent number 7,538,036
- Issue date May 26, 2009
- Micron Technology, Inc.
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a dual-tone resist to form photomasks including alignment ma...
- Patent number 7,408,265
- Issue date Aug 5, 2008
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor structures, and DRAM arrays
- Patent number 7,321,149
- Issue date Jan 22, 2008
- Micron Technology, Inc.
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming openings, and methods of forming container capac...
- Patent number 7,153,778
- Issue date Dec 26, 2006
- Micron Technology, Inc.
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing methods
- Patent number 6,878,507
- Issue date Apr 12, 2005
- Micron Technology, Inc.
- Richard Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a dual-tone resist to form photomasks including alignment ma...
- Patent number 6,815,308
- Issue date Nov 9, 2004
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle for creating resist-filled vias in a dual damascene process
- Patent number 6,812,129
- Issue date Nov 2, 2004
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automated combi deposition apparatus and method
- Patent number 6,768,213
- Issue date Jul 27, 2004
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target design method to minimize impact of lens aberrations
- Patent number 6,756,167
- Issue date Jun 29, 2004
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle for creating resist-filled vias in a dual damascene process
- Patent number 6,639,320
- Issue date Oct 28, 2003
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for exposing semiconductor wafers in a manner...
- Patent number 6,580,493
- Issue date Jun 17, 2003
- Micron Technology, Inc.
- Richard D. Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay target exposure device utilizing pitch determination to min...
- Patent number 6,514,643
- Issue date Feb 4, 2003
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle for creating resist-filled vias in a dual damascene process
- Patent number 6,469,775
- Issue date Oct 22, 2002
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-line method of measuring effective three-leaf aberration coeffic...
- Patent number 6,461,778
- Issue date Oct 8, 2002
- Micron Technology, Inc.
- Richard D. Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing methods, semiconductor circuitry, and gate...
- Patent number 6,461,950
- Issue date Oct 8, 2002
- Micron Technology, Inc.
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-reflective coatings and methods regarding same
- Patent number 6,444,588
- Issue date Sep 3, 2002
- Micron Technology, Inc.
- Richard Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay target design method with pitch determination to minimize i...
- Patent number 6,432,591
- Issue date Aug 13, 2002
- Micron Technology, Inc.
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of DARC and BARC in flash memory processing
- Patent number 6,423,474
- Issue date Jul 23, 2002
- Micron Technology, Inc.
- Richard D. Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated combi deposition apparatus and method
- Patent number 6,417,076
- Issue date Jul 9, 2002
- Micron Technology, Inc.
- Richard D. Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing semiconductor wafers in a manner that promotes...
- Patent number 6,403,285
- Issue date Jun 11, 2002
- Micron Technology, Inc.
- Richard D. Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modification of resist and/or resist processing with fluorescence d...
- Patent number 6,335,531
- Issue date Jan 1, 2002
- Micron Technology, Inc.
- Linda K. Somerville
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
IMAGING SYSTEMS WITH IMAGE PIXELS HAVING VARYING LIGHT COLLECTING A...
- Publication number 20140078366
- Publication date Mar 20, 2014
- Aptina Imaging Corporation
- Alexandre G. Dokoutchaev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING SYSTEMS FOR INFRARED AND VISIBLE IMAGING
- Publication number 20130222603
- Publication date Aug 29, 2013
- Aptina Imaging Corporation
- Gennadiy Agranov
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
IMAGING SYSTEMS WITH COLOR FILTER BARRIERS
- Publication number 20130027577
- Publication date Jan 31, 2013
- Richard Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC BARRIERS FOR PIXEL ARRAYS
- Publication number 20120273906
- Publication date Nov 1, 2012
- Jeffrey Mackey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CFA RESIST SILYLATION FOR LIMITING COLOR INTERACTIONS AND IMPROVING...
- Publication number 20120273905
- Publication date Nov 1, 2012
- Aptina Imaging Corporation
- Brian Vaartstra
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
CIRCUITRY AND GATE STACKS
- Publication number 20090294878
- Publication date Dec 3, 2009
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A DUAL TONE RESIST TO FORM PHOTOMASKS AND INTERMEDIATE SEMIC...
- Publication number 20080251951
- Publication date Oct 16, 2008
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method, apparatus and system providing imaging device with color fi...
- Publication number 20080204580
- Publication date Aug 28, 2008
- MICRON TECHNOLOGY, INC.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus defining a color filter array for an image sensor
- Publication number 20070238035
- Publication date Oct 11, 2007
- Micron Technology, Inc.
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor constructions
- Publication number 20070238207
- Publication date Oct 11, 2007
- Richard Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Color filter array and imaging device containing such color filter...
- Publication number 20070238034
- Publication date Oct 11, 2007
- Micron Technology, Inc.
- Richard D. Holscher
- G02 - OPTICS
Information Patent Application
Semiconductor constructions
- Publication number 20060269699
- Publication date Nov 30, 2006
- Richard Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor constructions
- Publication number 20060220186
- Publication date Oct 5, 2006
- Micron Technology, Inc.
- Richard Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor processing methods
- Publication number 20060038262
- Publication date Feb 23, 2006
- Richard Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of forming openings, and methods of forming container capac...
- Publication number 20060009042
- Publication date Jan 12, 2006
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitor structures, and DRAM arrays
- Publication number 20050269620
- Publication date Dec 8, 2005
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Forming Openings, And Methods of Forming Container Capac...
- Publication number 20050186802
- Publication date Aug 25, 2005
- Brett W. Busch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing methods
- Publication number 20050020055
- Publication date Jan 27, 2005
- Richard Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Use of a dual-tone resist to form photomasks including alignment ma...
- Publication number 20040259320
- Publication date Dec 23, 2004
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reticle for creating resist-filled vias in a dual damascene process
- Publication number 20040038539
- Publication date Feb 26, 2004
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of a dual-tone resist to form photomasks including alignment ma...
- Publication number 20040032031
- Publication date Feb 19, 2004
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Overlay target design method minimize impact of lens aberrations
- Publication number 20030091916
- Publication date May 15, 2003
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor processing methods
- Publication number 20030054294
- Publication date Mar 20, 2003
- Richard Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Overlay target design method to minimize impact of lens aberrations
- Publication number 20020160284
- Publication date Oct 31, 2002
- Pary Baluswamy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
In-line method of measuring effective three-leaf aberration coeffic...
- Publication number 20020072131
- Publication date Jun 13, 2002
- Richard D. Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Automated combi deposition apparatus and method
- Publication number 20020052091
- Publication date May 2, 2002
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reticle for creating resist-filled vias in a dual damascene process
- Publication number 20020045107
- Publication date Apr 18, 2002
- Richard D. Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for exposing semiconductor wafers in a manner...
- Publication number 20020042023
- Publication date Apr 11, 2002
- Richard D. Holscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor processing methods
- Publication number 20010033997
- Publication date Oct 25, 2001
- Richard Holscher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor processing methods, semiconductor circuitry, and gate...
- Publication number 20010028095
- Publication date Oct 11, 2001
- Zhiping Yin
- H01 - BASIC ELECTRIC ELEMENTS

Richard Holscher

Person

Patents Grantslast 30 patents

CFA resist silylation for limiting color interactions and improving...

Imaging systems with image pixels having varying light collecting a...

Dielectric barriers for pixel arrays

Imaging systems with color filter barriers

Semiconductor constructions

Intermediate semiconductor device structures

Semiconductor constructions having antireflective portions

Semiconductor devices having antireflective material

Circuitry and gate stacks

Methods of forming openings, and methods of forming container capac...

Use of a dual-tone resist to form photomasks including alignment ma...

Capacitor structures, and DRAM arrays

Methods of forming openings, and methods of forming container capac...

Semiconductor processing methods

Use of a dual-tone resist to form photomasks including alignment ma...

Reticle for creating resist-filled vias in a dual damascene process

Automated combi deposition apparatus and method

Overlay target design method to minimize impact of lens aberrations

Reticle for creating resist-filled vias in a dual damascene process

Method and apparatus for exposing semiconductor wafers in a manner...

Overlay target exposure device utilizing pitch determination to min...

Reticle for creating resist-filled vias in a dual damascene process

In-line method of measuring effective three-leaf aberration coeffic...

Semiconductor processing methods, semiconductor circuitry, and gate...

Anti-reflective coatings and methods regarding same

Overlay target design method with pitch determination to minimize i...

Use of DARC and BARC in flash memory processing

Automated combi deposition apparatus and method

Method for exposing semiconductor wafers in a manner that promotes...

Modification of resist and/or resist processing with fluorescence d...

Patents Applicationslast 30 patents

IMAGING SYSTEMS WITH IMAGE PIXELS HAVING VARYING LIGHT COLLECTING A...

IMAGING SYSTEMS FOR INFRARED AND VISIBLE IMAGING

IMAGING SYSTEMS WITH COLOR FILTER BARRIERS

DIELECTRIC BARRIERS FOR PIXEL ARRAYS

CFA RESIST SILYLATION FOR LIMITING COLOR INTERACTIONS AND IMPROVING...

CIRCUITRY AND GATE STACKS

USE OF A DUAL TONE RESIST TO FORM PHOTOMASKS AND INTERMEDIATE SEMIC...

Method, apparatus and system providing imaging device with color fi...

Method and apparatus defining a color filter array for an image sensor

Semiconductor constructions

Color filter array and imaging device containing such color filter...

Semiconductor constructions

Semiconductor constructions

Semiconductor processing methods

Methods of forming openings, and methods of forming container capac...

Capacitor structures, and DRAM arrays

Methods of Forming Openings, And Methods of Forming Container Capac...

Semiconductor processing methods

Use of a dual-tone resist to form photomasks including alignment ma...

Reticle for creating resist-filled vias in a dual damascene process

Use of a dual-tone resist to form photomasks including alignment ma...

Overlay target design method minimize impact of lens aberrations

Semiconductor processing methods

Overlay target design method to minimize impact of lens aberrations

In-line method of measuring effective three-leaf aberration coeffic...

Automated combi deposition apparatus and method

Reticle for creating resist-filled vias in a dual damascene process

Method and apparatus for exposing semiconductor wafers in a manner...

Semiconductor processing methods

Semiconductor processing methods, semiconductor circuitry, and gate...