San-De Tzu

Person

Taipei, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Dual trench alternating phase shift mask fabrication
- Patent number 7,445,159
- Issue date Nov 4, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for fabricating semiconductor devices and method for designing...
- Patent number 7,434,194
- Issue date Oct 7, 2008
- Remarkable Limited
- San De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual trench alternating phase shift mask fabrication
- Patent number 7,033,947
- Issue date Apr 25, 2006
- Taiwan Seminconductor Manufacturing Co Ltd
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation correction method for electron beam lithography
- Patent number 6,872,507
- Issue date Mar 29, 2005
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chrome mask dry etching process to reduce loading effect and defects
- Patent number 6,830,853
- Issue date Dec 14, 2004
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single trench alternating phase shift mask fabrication
- Patent number 6,830,702
- Issue date Dec 14, 2004
- Taiwan Semiconductor Manufacturing Co. Ltd
- San-De Tzu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process flow and pellicle type for 157 nm mask making
- Patent number 6,720,116
- Issue date Apr 13, 2004
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual trench alternating phase shift mask fabrication
- Patent number 6,660,653
- Issue date Dec 9, 2003
- Taiwan Semiconductor Manufacturing Co. Ltd
- San-De Tzu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Enhance the process window of memory cell line/space dense pattern...
- Patent number 6,632,590
- Issue date Oct 14, 2003
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of logical operations in place of OPC software
- Patent number 6,631,307
- Issue date Oct 7, 2003
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self alignment process to fabricate attenuated shifting mask with c...
- Patent number 6,630,408
- Issue date Oct 7, 2003
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Type mask for combining off axis illumination and attenuating phase...
- Patent number 6,495,297
- Issue date Dec 17, 2002
- Taiwan Semiconductor Manufacturing Company
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming an improved attenuated phase-shifting photomask
- Patent number 6,432,588
- Issue date Aug 13, 2002
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fabricating a multiple masking layer photomask
- Patent number 6,423,455
- Issue date Jul 23, 2002
- Taiwan Semiconductor Manufacturing Company, Ltd
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for high transmittance attenuated phase-shifting mask fabric...
- Patent number 6,403,267
- Issue date Jun 11, 2002
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for creating the sub-resolution phase shifting pattern for o...
- Patent number 6,301,698
- Issue date Oct 9, 2001
- Taiwan Semiconductor Manufacturing Company
- Chia-Hui Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable transmittance phase shifter to compensate for side lobe pr...
- Patent number 6,294,295
- Issue date Sep 25, 2001
- Taiwan Semiconductor Manufacturing Company
- Chia-Hui Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to change transmittance of attenuated phase-shifting masks
- Patent number 6,277,528
- Issue date Aug 21, 2001
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase angle modulation of PSM by chemical treatment method
- Patent number 6,261,725
- Issue date Jul 17, 2001
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simplified process for making an outrigger type phase shift mask
- Patent number 6,251,547
- Issue date Jun 26, 2001
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam double exposure method for manufacturing ASPM mask with chro...
- Patent number 6,194,103
- Issue date Feb 27, 2001
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cost-effective method to fabricate a combined attenuated-alternatin...
- Patent number 6,190,809
- Issue date Feb 20, 2001
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam direct writing to pattern step profiles of dielectric layers...
- Patent number 6,174,801
- Issue date Jan 16, 2001
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Synchronized implant process to simplify NLDD/PLDD stage and N&#x00...
- Patent number 6,171,914
- Issue date Jan 9, 2001
- Taiwan Semiconductor Manufacturing Company
- Ni-Ko Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making attenuating phase-shifting mask using different ex...
- Patent number 6,150,058
- Issue date Nov 21, 2000
- Taiwan Semiconductor Manufacturing Company
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method of inspecting phase shift masks using comparis...
- Patent number 6,134,014
- Issue date Oct 17, 2000
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simplified process for fabricating levinson and chromeless type pha...
- Patent number 6,093,507
- Issue date Jul 25, 2000
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method of forming a mask for avoiding side lobe problems i...
- Patent number 6,077,633
- Issue date Jun 20, 2000
- Taiwan Semiconductor Manufacturing Company
- Chia-Hui Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Application of e-beam proximity over-correction to compensate optic...
- Patent number 6,051,347
- Issue date Apr 18, 2000
- Taiwan Semiconductor Manufacturing Company
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask containing subresolution line to minimize proximity effect of...
- Patent number 6,022,644
- Issue date Feb 8, 2000
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hui Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Dual trench alternating phase shift mask fabrication
- Publication number 20070190793
- Publication date Aug 16, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask for fabricating semiconductor devices and method for designing...
- Publication number 20060026550
- Publication date Feb 2, 2006
- REMARKABLE LIMITED
- San De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dual trench alternating phase shift mask fabrication
- Publication number 20040180548
- Publication date Sep 16, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd.
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation correction method for electron beam lithography
- Publication number 20040086786
- Publication date May 6, 2004
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Single trench alternating phase shift mask fabrication
- Publication number 20030226819
- Publication date Dec 11, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- San-De Tzu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL TRENCH ALTERNATING PHASE SHIFT MASK FABRICATION
- Publication number 20030219990
- Publication date Nov 27, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- San-De Tzu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming an improved attenuated phase-shifting photomask
- Publication number 20020102468
- Publication date Aug 1, 2002
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- San-De Tzu
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Dual trench alternating phase shift mask fabrication

Mask for fabricating semiconductor devices and method for designing...

Dual trench alternating phase shift mask fabrication

Radiation correction method for electron beam lithography

Chrome mask dry etching process to reduce loading effect and defects

Single trench alternating phase shift mask fabrication

Process flow and pellicle type for 157 nm mask making

Dual trench alternating phase shift mask fabrication

Enhance the process window of memory cell line/space dense pattern...

Use of logical operations in place of OPC software

Self alignment process to fabricate attenuated shifting mask with c...

Type mask for combining off axis illumination and attenuating phase...

Method of forming an improved attenuated phase-shifting photomask

Method for fabricating a multiple masking layer photomask

Method for high transmittance attenuated phase-shifting mask fabric...

Method for creating the sub-resolution phase shifting pattern for o...

Variable transmittance phase shifter to compensate for side lobe pr...

Method to change transmittance of attenuated phase-shifting masks

Phase angle modulation of PSM by chemical treatment method

Simplified process for making an outrigger type phase shift mask

E-beam double exposure method for manufacturing ASPM mask with chro...

Cost-effective method to fabricate a combined attenuated-alternatin...

E-beam direct writing to pattern step profiles of dielectric layers...

Synchronized implant process to simplify NLDD/PLDD stage and N&#x00...

Method of making attenuating phase-shifting mask using different ex...

Apparatus and method of inspecting phase shift masks using comparis...

Simplified process for fabricating levinson and chromeless type pha...

Mask and method of forming a mask for avoiding side lobe problems i...

Application of e-beam proximity over-correction to compensate optic...

Mask containing subresolution line to minimize proximity effect of...

Patents Applicationslast 30 patents

Dual trench alternating phase shift mask fabrication

Mask for fabricating semiconductor devices and method for designing...

Dual trench alternating phase shift mask fabrication

Radiation correction method for electron beam lithography

Single trench alternating phase shift mask fabrication

DUAL TRENCH ALTERNATING PHASE SHIFT MASK FABRICATION

Method of forming an improved attenuated phase-shifting photomask