Number | Name | Date | Kind |
---|---|---|---|
3779806 | Gipstein et al. | Dec 1973 | A |
5096802 | Hu | Mar 1992 | A |
5573890 | Spence | Nov 1996 | A |
5858620 | Ishibashi et al. | Jan 1999 | A |
5955227 | Tsujita et al. | Sep 1999 | A |
5958656 | Nakao | Sep 1999 | A |
6284438 | Choi | Sep 2001 | B1 |
6319853 | Ishibashi | Nov 2001 | B1 |
6348301 | Lin | Feb 2002 | B1 |
6486058 | Chun | Nov 2002 | B1 |
6489085 | Huang et al. | Dec 2002 | B2 |
6566040 | Sugino et al. | May 2003 | B1 |
Entry |
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“0.1um Level Contact hole Pattern Formation with KrF Lithographyby RELACS”□□T.Toyshima et al.□□IEDM iEEE, 1998, p333-336. |