Sen-Hou Ko

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for post-chemical mechanical planarization su...
- Patent number 9,711,381
- Issue date Jul 18, 2017
- Applied Materials, Inc.
- Sen-Hou Ko
- B24 - GRINDING POLISHING
Information Patent Grant
Disk-brush cleaner module with fluid jet
- Patent number 9,646,859
- Issue date May 9, 2017
- Applied Materials, Inc.
- Hui Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disk/pad clean with wafer and wafer edge/bevel clean module for che...
- Patent number 9,508,575
- Issue date Nov 29, 2016
- Applied Materials, Inc.
- Hui Chen
- B08 - CLEANING
Information Patent Grant
Apparatus and methods for brush and pad conditioning
- Patent number 8,813,293
- Issue date Aug 26, 2014
- Applied Materials, Inc.
- Sen-Hou Ko
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad conditioner
- Patent number 8,550,879
- Issue date Oct 8, 2013
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for brush and pad conditioning
- Patent number 8,458,843
- Issue date Jun 11, 2013
- Applied Materials, Inc.
- Sen-Hou Ko
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatus for removal of films and flakes from the edge...
- Patent number 8,142,260
- Issue date Mar 27, 2012
- Applied Materials, Inc.
- Eashwer Kollata
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatus for measuring substrate edge thickness during...
- Patent number 8,125,654
- Issue date Feb 28, 2012
- Applied Materials, Inc.
- Dominic J. Benvegnu
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 7,993,485
- Issue date Aug 9, 2011
- Applied Materials, Inc.
- Erik C. Wasinger
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for conditioning processing pads
- Patent number 7,828,626
- Issue date Nov 9, 2010
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad conditioning process
- Patent number 7,749,048
- Issue date Jul 6, 2010
- Applied Materials, Inc.
- James C. Wang
- B24 - GRINDING POLISHING
Information Patent Grant
Method for conditioning processing pads
- Patent number 7,666,061
- Issue date Feb 23, 2010
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Grant
Conductive polishing article for electrochemical mechanical polishing
- Patent number 7,207,878
- Issue date Apr 24, 2007
- Applied Materials, Inc.
- Yongqi Hu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Low cost and low dishing slurry for polysilicon CMP
- Patent number 7,199,056
- Issue date Apr 3, 2007
- Applied Materials, Inc.
- Sen-Hou Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for conditioning processing pads
- Patent number 7,182,680
- Issue date Feb 27, 2007
- Applied Materials, Inc.
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Grant
Method for adjusting substrate processing times in a substrate poli...
- Patent number 7,175,505
- Issue date Feb 13, 2007
- Applied Materials, Inc.
- Sen-Hou Ko
- B24 - GRINDING POLISHING
Information Patent Grant
Profile control platen
- Patent number 7,115,024
- Issue date Oct 3, 2006
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Planarized copper cleaning for reduced defects
- Patent number 7,104,267
- Issue date Sep 12, 2006
- Applied Materials Inc.
- Ramin Emami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier head with a flexible membrane
- Patent number 7,040,971
- Issue date May 9, 2006
- Applied Materials Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Grant
Conductive polishing article for electrochemical mechanical polishing
- Patent number 6,991,528
- Issue date Jan 31, 2006
- Applied Materials, Inc.
- Yongqi Hu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Profile control platen
- Patent number 6,913,518
- Issue date Jul 5, 2005
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Method of controlling carrier head with multiple chambers
- Patent number 6,896,584
- Issue date May 24, 2005
- Applied Materials, Inc.
- Ilya Perlov
- B24 - GRINDING POLISHING
Information Patent Grant
Carrier head with a flexure
- Patent number 6,857,946
- Issue date Feb 22, 2005
- Applied Materials Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having a grooved pattern for use in a chemical mechan...
- Patent number 6,824,455
- Issue date Nov 30, 2004
- Applied Materials, Inc.
- Thomas H. Osterheld
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having a grooved pattern for use in a chemical mechan...
- Patent number 6,699,115
- Issue date Mar 2, 2004
- Applied Materials Inc.
- Thomas H Osterheld
- B24 - GRINDING POLISHING
Information Patent Grant
Pad cleaning for a CMP system
- Patent number 6,669,538
- Issue date Dec 30, 2003
- Applied Materials Inc.
- Shijian Li
- B24 - GRINDING POLISHING
Information Patent Grant
Barrier layer buffing after Cu CMP
- Patent number 6,656,842
- Issue date Dec 2, 2003
- Applied Materials, Inc.
- Shijian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier head with a flexible membrane to form multiple chambers
- Patent number 6,648,740
- Issue date Nov 18, 2003
- Applied Materials, Inc.
- Ilya Perlov
- B24 - GRINDING POLISHING
Information Patent Grant
Carrier head with a flexible membrane for a chemical mechanical pol...
- Patent number 6,540,594
- Issue date Apr 1, 2003
- Applied Materials, Inc.
- Steven M. Zuniga
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having a grooved pattern for use in chemical mechanic...
- Patent number 6,520,847
- Issue date Feb 18, 2003
- Applied Materials, Inc.
- Thomas H. Osterheld
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
DESIGN OF DISK/PAD CLEAN WITH WAFER AND WAFER EDGE/BEVEL CLEAN MODU...
- Publication number 20170040160
- Publication date Feb 9, 2017
- Applied Materials, Inc.
- Hui CHEN
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING
- Publication number 20140360976
- Publication date Dec 11, 2014
- Sen-Hou KO
- A46 - BRUSHWARE
Information Patent Application
DISK/PAD CLEAN WITH WAFER AND WAFER EDGE/BEVEL CLEAN MODULE FOR CHE...
- Publication number 20140261539
- Publication date Sep 18, 2014
- Hui Chen
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR POST-CHEMICAL MECHANICAL PLANARIZATION SU...
- Publication number 20140209239
- Publication date Jul 31, 2014
- Sen-Hou Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING
- Publication number 20130247314
- Publication date Sep 26, 2013
- Sen-Hou KO
- A46 - BRUSHWARE
Information Patent Application
CONDITIONING A PAD IN A CLEANING MODULE
- Publication number 20130196572
- Publication date Aug 1, 2013
- Sen-Hou Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING MODULE AND PROCESS FOR PARTICLE REDUCTION
- Publication number 20130185884
- Publication date Jul 25, 2013
- Sen-Hou Ko
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR SUBSTRATE CLEANING APPARATUS, SYSTEMS, AND METHODS
- Publication number 20130098395
- Publication date Apr 25, 2013
- Applied Materials, Inc.
- Yunshuang Ding
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISK-BRUSH CLEANER MODULE WITH FLUID JET
- Publication number 20110265816
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- Hui Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING
- Publication number 20110094537
- Publication date Apr 28, 2011
- APPLIED MATERIALS, INC.
- Sen-Hou Ko
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE
- Publication number 20100105291
- Publication date Apr 29, 2010
- Applied Materials, Inc.
- Gary C. Ettinger
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR POLISHING AN EDGE AND/OR NOTCH OF A SUBST...
- Publication number 20100105299
- Publication date Apr 29, 2010
- Applied Materials, Inc.
- Gary C. Ettinger
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD CONDITIONER
- Publication number 20100105302
- Publication date Apr 29, 2010
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR MEASURING SUBSTRATE EDGE THICKNESS DURING...
- Publication number 20090262353
- Publication date Oct 22, 2009
- Applied Materials, Inc.
- Dominic J. Benvegnu
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20090036033
- Publication date Feb 5, 2009
- Applied Materials, Inc.
- Erik C. Wasinger
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE
- Publication number 20090036039
- Publication date Feb 5, 2009
- APPLIED MATERIALS, INC.
- Ho Seon Shin
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE
- Publication number 20090036042
- Publication date Feb 5, 2009
- APPLIED MATERIALS, INC.
- Ho Seon Shin
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS FOR CONDITIONING PROCESSING PADS
- Publication number 20090036037
- Publication date Feb 5, 2009
- Paul D. Butterfield
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE
- Publication number 20090029629
- Publication date Jan 29, 2009
- APPLIED MATERIALS, INC.
- Ho Seon Shin
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20090017731
- Publication date Jan 15, 2009
- Applied Materials, Inc.
- Gary C. Ettinger
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS TO CONTROL SUBSTRATE BEVEL AND EDGE POLISHING...
- Publication number 20080293336
- Publication date Nov 27, 2008
- Applied Materials, Inc.
- Zhenhua Zhang
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR REMOVAL OF FILMS AND FLAKES FROM THE EDGE...
- Publication number 20080293340
- Publication date Nov 27, 2008
- Applied Materials, Inc.
- Eashwer Kollata
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR LOW COST AND HIGH PERFORMANCE POLISHING T...
- Publication number 20080293331
- Publication date Nov 27, 2008
- Applied Materials, Inc.
- Yufei Chen
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING THE SIZE OF AN EDGE EXCLUSION...
- Publication number 20080293333
- Publication date Nov 27, 2008
- Applied Materials, Inc.
- Zhenhua Zhang
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE BY SUBST...
- Publication number 20080293337
- Publication date Nov 27, 2008
- Applied Materials, Inc.
- Zhenhua Zhang
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR USING A BEVEL POLISHING HEAD WITH AN EFFI...
- Publication number 20080293334
- Publication date Nov 27, 2008
- Applied Materials, Inc.
- Eashwer Kollata
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR USING A ROLLING BACKING PAD FOR SUBSTRATE...
- Publication number 20080293341
- Publication date Nov 27, 2008
- Applied Materials, Inc.
- Eashwer Kollata
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR CLEANING A SUBSTRATE EDGE USING CHEMICAL...
- Publication number 20080207093
- Publication date Aug 28, 2008
- APPLIED MATERIALS, INC.
- Sen-Hou Ko
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD CONDITIONING PROCESS
- Publication number 20070298689
- Publication date Dec 27, 2007
- Applied Materials, Inc.
- James C. Wang
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE
- Publication number 20070238393
- Publication date Oct 11, 2007
- Ho Seon Shin
- B24 - GRINDING POLISHING

Person

Patents Grantslast 30 patents

Methods and apparatus for post-chemical mechanical planarization su...

Disk-brush cleaner module with fluid jet

Disk/pad clean with wafer and wafer edge/bevel clean module for che...

Apparatus and methods for brush and pad conditioning

Polishing pad conditioner

Apparatus and methods for brush and pad conditioning

Methods and apparatus for removal of films and flakes from the edge...

Methods and apparatus for measuring substrate edge thickness during...

Methods and apparatus for processing a substrate

Apparatus for conditioning processing pads

Polishing pad conditioning process

Method for conditioning processing pads

Conductive polishing article for electrochemical mechanical polishing

Low cost and low dishing slurry for polysilicon CMP

Apparatus for conditioning processing pads

Method for adjusting substrate processing times in a substrate poli...

Profile control platen

Planarized copper cleaning for reduced defects

Carrier head with a flexible membrane

Conductive polishing article for electrochemical mechanical polishing

Profile control platen

Method of controlling carrier head with multiple chambers

Carrier head with a flexure

Polishing pad having a grooved pattern for use in a chemical mechan...

Polishing pad having a grooved pattern for use in a chemical mechan...

Pad cleaning for a CMP system

Barrier layer buffing after Cu CMP

Carrier head with a flexible membrane to form multiple chambers

Carrier head with a flexible membrane for a chemical mechanical pol...

Polishing pad having a grooved pattern for use in chemical mechanic...

Patents Applicationslast 30 patents

DESIGN OF DISK/PAD CLEAN WITH WAFER AND WAFER EDGE/BEVEL CLEAN MODU...

APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING

DISK/PAD CLEAN WITH WAFER AND WAFER EDGE/BEVEL CLEAN MODULE FOR CHE...

METHODS AND APPARATUS FOR POST-CHEMICAL MECHANICAL PLANARIZATION SU...

APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING

CONDITIONING A PAD IN A CLEANING MODULE

CLEANING MODULE AND PROCESS FOR PARTICLE REDUCTION

SEMICONDUCTOR SUBSTRATE CLEANING APPARATUS, SYSTEMS, AND METHODS

DISK-BRUSH CLEANER MODULE WITH FLUID JET

APPARATUS AND METHODS FOR BRUSH AND PAD CONDITIONING

METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE

METHODS AND APPARATUS FOR POLISHING AN EDGE AND/OR NOTCH OF A SUBST...

POLISHING PAD CONDITIONER

METHODS AND APPARATUS FOR MEASURING SUBSTRATE EDGE THICKNESS DURING...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE

METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE

APPARATUS FOR CONDITIONING PROCESSING PADS

METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS TO CONTROL SUBSTRATE BEVEL AND EDGE POLISHING...

METHODS AND APPARATUS FOR REMOVAL OF FILMS AND FLAKES FROM THE EDGE...

METHODS AND APPARATUS FOR LOW COST AND HIGH PERFORMANCE POLISHING T...

METHODS AND APPARATUS FOR CONTROLLING THE SIZE OF AN EDGE EXCLUSION...

METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE BY SUBST...

METHODS AND APPARATUS FOR USING A BEVEL POLISHING HEAD WITH AN EFFI...

METHODS AND APPARATUS FOR USING A ROLLING BACKING PAD FOR SUBSTRATE...

METHODS AND APPARATUS FOR CLEANING A SUBSTRATE EDGE USING CHEMICAL...

POLISHING PAD CONDITIONING PROCESS

METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE