Shigeru Mizuno

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electrostatic chuck device
- Patent number 7,848,077
- Issue date Dec 7, 2010
- Canon Anelva Corporation
- Shigeru Mizuno
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Electrostatic chuck device
- Patent number 7,791,857
- Issue date Sep 7, 2010
- Canon Anelva Corporation
- Shigeru Mizuno
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Electrostatic chuck device
- Patent number 7,724,493
- Issue date May 25, 2010
- Canon Anelva Corporation
- Shigeru Mizuno
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Electrostatic chuck device
- Patent number 7,623,334
- Issue date Nov 24, 2009
- Canon Anelva Corporation
- Shigeru Mizuno
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Thin film fabrication method and thin film fabrication apparatus
- Patent number 6,872,289
- Issue date Mar 29, 2005
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD apparatus
- Patent number 6,663,714
- Issue date Dec 16, 2003
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film fabrication method and thin film fabrication apparatus
- Patent number 6,348,238
- Issue date Feb 19, 2002
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 6,199,505
- Issue date Mar 13, 2001
- Anelva Corporation
- Hisaaki Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 6,129,046
- Issue date Oct 10, 2000
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus
- Patent number 6,103,304
- Issue date Aug 15, 2000
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus
- Patent number 6,085,690
- Issue date Jul 11, 2000
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 6,070,552
- Issue date Jun 6, 2000
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing a substrate and apparatus for the method
- Patent number 6,059,985
- Issue date May 9, 2000
- Anelva Corporation
- Takanori Yoshimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing thin films by plasma-enhanced chemical vapor d...
- Patent number 5,956,616
- Issue date Sep 21, 1999
- Anelva Corporation
- Shigeru Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode unit for in-situ cleaning in thermal CVD apparatus
- Patent number 5,893,962
- Issue date Apr 13, 1999
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming thin film
- Patent number 5,840,366
- Issue date Nov 24, 1998
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heater for CVD apparatus
- Patent number 5,766,363
- Issue date Jun 16, 1998
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for preventing deposition on inner surfaces of CVD reactor
- Patent number 5,728,629
- Issue date Mar 17, 1998
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD apparatus
- Patent number 5,676,758
- Issue date Oct 14, 1997
- Anelva Corporation
- Shinya Hasegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD apparatus
- Patent number 5,624,499
- Issue date Apr 29, 1997
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated module multi-chamber CVD processing system and its metho...
- Patent number 5,534,072
- Issue date Jul 9, 1996
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated module multi-chamber CVD processing system and its metho...
- Patent number 5,505,779
- Issue date Apr 9, 1996
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated module multi-chamber CVD processing system and its metho...
- Patent number 5,494,494
- Issue date Feb 27, 1996
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating semiconductor substrate having very shallow i...
- Patent number 5,270,250
- Issue date Dec 14, 1993
- M. Setek Co., Ltd.
- Tsuyoshi Murai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low pressure vapor phase growth apparatus
- Patent number 5,033,407
- Issue date Jul 23, 1991
- Anelva Corporation
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SPUTTER DEVICE
- Publication number 20140346037
- Publication date Nov 27, 2014
- Shigeru MIZUNO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrostatic chuck device
- Publication number 20100046134
- Publication date Feb 25, 2010
- Canon ANELVA Corporation
- Shigeru Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck device
- Publication number 20090122459
- Publication date May 14, 2009
- ANELVA CORPORATION
- Shigeru Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck device
- Publication number 20090059462
- Publication date Mar 5, 2009
- ANELVA CORPORATION
- Shigeru Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck device
- Publication number 20060158823
- Publication date Jul 20, 2006
- ANELVA CORPORATION
- Shigeru Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method of deposition of magnetic multilayer film, method...
- Publication number 20040244684
- Publication date Dec 9, 2004
- ANELVA CORPORATION
- Takaaki Tsunoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrostatic chuck device
- Publication number 20040040665
- Publication date Mar 4, 2004
- ANELVA CORPORATION
- Shigeru Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CVD apparatus
- Publication number 20010042514
- Publication date Nov 22, 2001
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin film fabrication method and thin film fabrication apparatus
- Publication number 20010009220
- Publication date Jul 26, 2001
- Shigeru Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Shigeru Mizuno

Person

Patents Grantslast 30 patents

Electrostatic chuck device

Electrostatic chuck device

Electrostatic chuck device

Electrostatic chuck device

Thin film fabrication method and thin film fabrication apparatus

CVD apparatus

Thin film fabrication method and thin film fabrication apparatus

Plasma processing apparatus

Substrate processing apparatus

Chemical vapor deposition apparatus

Chemical vapor deposition apparatus

Substrate processing apparatus

Method of processing a substrate and apparatus for the method

Method of depositing thin films by plasma-enhanced chemical vapor d...

Electrode unit for in-situ cleaning in thermal CVD apparatus

Method of forming thin film

Heater for CVD apparatus

Process for preventing deposition on inner surfaces of CVD reactor

CVD apparatus

CVD apparatus

Integrated module multi-chamber CVD processing system and its metho...

Integrated module multi-chamber CVD processing system and its metho...

Integrated module multi-chamber CVD processing system and its metho...

Method of fabricating semiconductor substrate having very shallow i...

Low pressure vapor phase growth apparatus

Patents Applicationslast 30 patents

SPUTTER DEVICE

Electrostatic chuck device

Electrostatic chuck device

Electrostatic chuck device

Electrostatic chuck device

System and method of deposition of magnetic multilayer film, method...

Electrostatic chuck device

CVD apparatus

Thin film fabrication method and thin film fabrication apparatus