Shumin Wang

Person

Naperville, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing slurry useful for copper substrates
- Patent number 7,381,648
- Issue date Jun 3, 2008
- Cabot Microelectronics Corporation
- Vlasta Brusic Kaufman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing systems and methods for their use
- Patent number 7,354,530
- Issue date Apr 8, 2008
- Shumin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coated metal oxide particles for CMP
- Patent number 7,044,836
- Issue date May 16, 2006
- Cabot Microelectronics Corporation
- Fred F. Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of polishing a substrate with a polishing system containing...
- Patent number 7,021,993
- Issue date Apr 4, 2006
- Cabot Microelectronics Corporation
- Jian Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Compositions for oxide CMP
- Patent number 6,984,588
- Issue date Jan 10, 2006
- Cabot Microelectronics Corporation
- Gautam S. Grover
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for polishing a memory or rigid disk with a phosphate ion-co...
- Patent number 6,976,905
- Issue date Dec 20, 2005
- Cabot Microelectronics Corporation
- Mingming Fang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of polishing a multi-layer substrate
- Patent number 6,867,140
- Issue date Mar 15, 2005
- Cabot Microelectronics Corporation
- Shumin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing system with stopping compound and method of its use
- Patent number 6,855,266
- Issue date Feb 15, 2005
- Cabot Microelectronics Corporation
- Shumin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of polishing a multi-layer substrate
- Patent number 6,852,632
- Issue date Feb 8, 2005
- Cabot Microelectronics Corporation
- Shumin Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing systems and methods for their use
- Patent number 6,840,971
- Issue date Jan 11, 2005
- Cabot Microelectronics Corporation
- Shumin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing composition containing conducting polymer
- Patent number 6,811,474
- Issue date Nov 2, 2004
- Cabot Microelectronics Corporation
- Isaac K. Cherian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for polishing rigid disks
- Patent number 6,793,559
- Issue date Sep 21, 2004
- Cabot Microelectronics Corporation
- Mingming Fang
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition for metal CMP
- Patent number 6,767,476
- Issue date Jul 27, 2004
- Cabot Microelectronics Corporation
- Shumin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition for oxide CMP
- Patent number 6,689,692
- Issue date Feb 10, 2004
- Cabot Microelectronics Corporation
- Gautam S. Grover
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silane containing polishing composition for CMP
- Patent number 6,646,348
- Issue date Nov 11, 2003
- Cabot Microelectronics Corporation
- Steven K. Grumbine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition for metal CMP
- Patent number 6,592,776
- Issue date Jul 15, 2003
- Cabot Microelectronics Corporation
- Shumin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP composition containing silane modified abrasive particles
- Patent number 6,582,623
- Issue date Jun 24, 2003
- Cabot Microelectronics Corporation
- Steven K. Grumbine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing slurry useful for copper substrates
- Patent number 6,569,350
- Issue date May 27, 2003
- Cabot Microelectronics Corporation
- Vlasta Brusic Kaufman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning solution for semiconductor surfaces following chemical-mec...
- Patent number 6,541,434
- Issue date Apr 1, 2003
- Cabot Microelectronics Corporation
- Shumin Wang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for polishing a memory or rigid disk with an amino acid-cont...
- Patent number 6,471,884
- Issue date Oct 29, 2002
- Cabot Microelectronics Corporation
- Mingming Fang
- B24 - GRINDING POLISHING
Information Patent Grant
Method for polishing a memory or rigid disk with an oxidized halide...
- Patent number 6,468,137
- Issue date Oct 22, 2002
- Cabot Microelectronics Corporation
- Mingming Fang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry useful for copper/tantalum sub...
- Patent number 6,447,371
- Issue date Sep 10, 2002
- Cabot Microelectronics Corporation
- Vlasta Brusic Kaufman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP polishing pad including a solid catalyst
- Patent number 6,435,947
- Issue date Aug 20, 2002
- Cabot Microelectronics Corporation
- Brian L. Mueller
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing slurry useful for copper substrates
- Patent number 6,432,828
- Issue date Aug 13, 2002
- Cabot Microelectronics Corporation
- Vlasta Brusic Kaufman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cleaning solution for semiconductor surfaces following chemical-mec...
- Patent number 6,395,693
- Issue date May 28, 2002
- Cabot Microelectronics Corporation
- Shumin Wang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for polishing a substrate using a CMP slurry
- Patent number 6,362,104
- Issue date Mar 26, 2002
- Cabot Microelectronics Corporation
- Shumin Wang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method useful for copper substrates
- Patent number 6,362,106
- Issue date Mar 26, 2002
- Cabot Microelectronics Corporation
- Vlasta Brusic Kaufman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and method for polishing rigid disks
- Patent number 6,347,978
- Issue date Feb 19, 2002
- Cabot Microelectronics Corporation
- Mingming Fang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical polishing method
- Patent number 6,316,365
- Issue date Nov 13, 2001
- Cabot Microelectronics Corporation
- Shumin Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of polishing using multi-oxidizer slurry
- Patent number 6,316,366
- Issue date Nov 13, 2001
- Cabot Microelectronics Corporation
- Vlasta Brusic Kaufman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
Chemical mechanical polishing systems and methods for their use
- Publication number 20050148187
- Publication date Jul 7, 2005
- Cabot Microelectronics Corporation
- Shumin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silane containing polishing composition for CMP
- Publication number 20040214443
- Publication date Oct 28, 2004
- Cabot Microelectronics Corporation
- Steven K. Grumbine
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Coated metal oxide particles for CMP
- Publication number 20040209555
- Publication date Oct 21, 2004
- Cabot Microelectronics Corporation
- Fred F. Sun
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compositions for oxide CMP
- Publication number 20040089634
- Publication date May 13, 2004
- Cabot Microelectronics Corporation
- Gautam S. Grover
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of polishing a substrate with a polishing system containing...
- Publication number 20040014398
- Publication date Jan 22, 2004
- Cabot Microelectronics Corporation
- Jian Zhang
- B24 - GRINDING POLISHING
Information Patent Application
Polishing composition containing conducting polymer
- Publication number 20040014400
- Publication date Jan 22, 2004
- Cabot Microelectronics Corporation
- Isaac K. Cherian
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing slurry useful for copper substrates
- Publication number 20040009671
- Publication date Jan 15, 2004
- Cabot Microelectronics Corporation
- Vlasta Brusic Kaufman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP composition containing silane-modified abrasive particles
- Publication number 20030209522
- Publication date Nov 13, 2003
- Cabot Microelectronics Corporation
- Steven K. Grumbine
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing composition for metal CMP
- Publication number 20030203635
- Publication date Oct 30, 2003
- Cabot Microelectronics Corporation
- Shumin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of polishing a multi-layer substrate
- Publication number 20030170991
- Publication date Sep 11, 2003
- Cabot Microelectronics Corporation
- Shumin Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing systems and methods for their use
- Publication number 20030166337
- Publication date Sep 4, 2003
- Cabot Microelectronics, Corp.
- Shumin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of polishing a multi-layer substrate
- Publication number 20030153184
- Publication date Aug 14, 2003
- Cabot Microelectronics Corporation
- Shumin Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composition and method for polishing rigid disks
- Publication number 20030027499
- Publication date Feb 6, 2003
- Cabot Microelectronics Corporation
- Mingming Fang
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing slurry useful for copper substrates
- Publication number 20020168923
- Publication date Nov 14, 2002
- Cabot Microelectronics Corp.
- Vlasta Brusic Kaufman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Cleaning solution for semiconductor surfaces following chemical-mec...
- Publication number 20020169088
- Publication date Nov 14, 2002
- Shumin Wang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Chemical mechanical polishing slurry useful for copper substrates
- Publication number 20020145127
- Publication date Oct 10, 2002
- Cabot Microelectronics Corp.
- Vlasta Brusic Kaufman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY USEFUL FOR COPPER SUBSTRATES
- Publication number 20010049910
- Publication date Dec 13, 2001
- VLASTA BRUSIC KAUFMAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical mechanical polishing slurry useful for copper/tantalum sub...
- Publication number 20010041507
- Publication date Nov 15, 2001
- Vlasta Brusic Kaufman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP polishing pad including a solid catalyst
- Publication number 20010036804
- Publication date Nov 1, 2001
- Brian L. Mueller
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Shumin Wang

Person

Patents Grantslast 30 patents

Chemical mechanical polishing slurry useful for copper substrates

Chemical mechanical polishing systems and methods for their use

Coated metal oxide particles for CMP

Method of polishing a substrate with a polishing system containing...

Compositions for oxide CMP

Method for polishing a memory or rigid disk with a phosphate ion-co...

Method of polishing a multi-layer substrate

Polishing system with stopping compound and method of its use

Method of polishing a multi-layer substrate

Chemical mechanical polishing systems and methods for their use

Polishing composition containing conducting polymer

Composition and method for polishing rigid disks

Polishing composition for metal CMP

Composition for oxide CMP

Silane containing polishing composition for CMP

Polishing composition for metal CMP

CMP composition containing silane modified abrasive particles

Chemical mechanical polishing slurry useful for copper substrates

Cleaning solution for semiconductor surfaces following chemical-mec...

Method for polishing a memory or rigid disk with an amino acid-cont...

Method for polishing a memory or rigid disk with an oxidized halide...

Chemical mechanical polishing slurry useful for copper/tantalum sub...

CMP polishing pad including a solid catalyst

Chemical mechanical polishing slurry useful for copper substrates

Cleaning solution for semiconductor surfaces following chemical-mec...

Method for polishing a substrate using a CMP slurry

Chemical mechanical polishing method useful for copper substrates

Composition and method for polishing rigid disks

Chemical-mechanical polishing method

Method of polishing using multi-oxidizer slurry

Patents Applicationslast 30 patents

Chemical mechanical polishing systems and methods for their use

Silane containing polishing composition for CMP

Coated metal oxide particles for CMP

Compositions for oxide CMP

Method of polishing a substrate with a polishing system containing...

Polishing composition containing conducting polymer

Chemical mechanical polishing slurry useful for copper substrates

CMP composition containing silane-modified abrasive particles

Polishing composition for metal CMP

Method of polishing a multi-layer substrate

Chemical mechanical polishing systems and methods for their use

Method of polishing a multi-layer substrate

Composition and method for polishing rigid disks

Chemical mechanical polishing slurry useful for copper substrates

Cleaning solution for semiconductor surfaces following chemical-mec...

Chemical mechanical polishing slurry useful for copper substrates

CHEMICAL MECHANICAL POLISHING SLURRY USEFUL FOR COPPER SUBSTRATES

Chemical mechanical polishing slurry useful for copper/tantalum sub...

CMP polishing pad including a solid catalyst